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Class Information
Number: 257/390
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Field effect device > Having insulated electrode (e.g., mosfet, mos diode) > Insulated gate field effect transistor in integrated circuit > Matrix or array of field effect transistors (e.g., array of fets only some of which are completed, or structure for mask programmed read-only memory (rom))
Description: Subject matter wherein the integrated circuit contains a two dimensional array of IGFETs, only some of which are completed devices, or the integrated circuit contains structure for a mask programmed read-only memory device.


Sub-classes under this class:

Class Number Class Name Patents
257/391 Selected groups of complete field effect devices having different threshold voltages (e.g., different channel dopant concentrations) 347


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17

Patent Number Title Of Patent Date Issued
5754467 Semiconductor integrated circuit device and process for manufacturing the same May. 19, 1998
5751038 Electrically erasable and programmable read only memory (EEPROM) having multiple overlapping metallization layers May. 12, 1998
5751031 Memory and other integrated circuitry having a conductive interconnect line pitch of less than 0.6 micron May. 12, 1998
5751040 Self-aligned source/drain mask ROM memory cell using trench etched channel May. 12, 1998
5747856 Vertical channel masked ROM memory cell with epitaxy May. 5, 1998
5742078 Integrated circuit SRAM cell layouts Apr. 21, 1998
5736751 Field effect transistor having thick source and drain regions Apr. 7, 1998
5736771 Mask ROM cell structure with multi-level data selection by code Apr. 7, 1998
5734188 Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same Mar. 31, 1998
5734177 Semiconductor device, active-matrix substrate and method for fabricating the same Mar. 31, 1998
5731606 Reliable edge cell array design Mar. 24, 1998
5721698 Read only memory device and manufacturing method Feb. 24, 1998
5703744 Circuit substrate including anodization control means Dec. 30, 1997
5698876 Memory standard cell macro for semiconductor device Dec. 16, 1997
5698879 Nonvolatile semiconductor memory device Dec. 16, 1997
5691574 Semiconductor device capable of high speed operation and being integrated with high density Nov. 25, 1997
5691551 Semiconductor memory device Nov. 25, 1997
5691562 Through glass ROM code implant to reduce product delivering time Nov. 25, 1997
5682323 System and method for performing optical proximity correction on macrocell libraries Oct. 28, 1997
5672891 Semiconductor memory apparatus for a dynamic RAM and method for manufacturing the same Sep. 30, 1997
5665995 Post passivation programmed mask ROM Sep. 9, 1997
5663589 Current regulating semiconductor integrated circuit device and fabrication method of the same Sep. 2, 1997
5654572 Static random access memory device Aug. 5, 1997
5654563 Microelectronic integrated circuit including triangular semiconductor "or" g Aug. 5, 1997
5654577 Semiconductor integrated circuit device Aug. 5, 1997
5654576 Post-titanium nitride mask ROM programming method and device manufactured thereby Aug. 5, 1997
5650956 Current amplification type mask-ROM Jul. 22, 1997
5648672 Semiconductor device with outer diffusion layer Jul. 15, 1997
5646429 Segmented non-volatile memory array having multiple sources Jul. 8, 1997
5646436 Read only memory (ROM) device produced by self-aligned implantation Jul. 8, 1997
5644154 MOS read-only semiconductor memory with selected source/drain regions spaced away from edges of overlying gate electrode regions and method therefor Jul. 1, 1997
5643816 High-density programmable read-only memory and the process for its fabrication Jul. 1, 1997
5637895 Non-volatile semiconductor memory device Jun. 10, 1997
5635748 NAND ROM with transistor strings located at trench bottoms as well as between trenches Jun. 3, 1997
5633519 Non-volatile floating gate semiconductor device May. 27, 1997
5631486 Read-only-memory having both bipolar and channel transistors May. 20, 1997
5631484 Method of manufacturing a semiconductor device and termination structure May. 20, 1997
5631481 Flat-cell mask ROM integrated circuit May. 20, 1997
5621233 Electrically programmable read-only memory cell Apr. 15, 1997
5616946 VLSI ROM programmed by selective diode formation Apr. 1, 1997
5610429 Differential analog transistors constructed from digital transistors Mar. 11, 1997
5608241 Semiconductor device having a memory cell portion and a logic portion Mar. 4, 1997
5606193 DRAM and MROM cells with similar structure Feb. 25, 1997
5600163 Semiconductor element and semiconductor memory device using the same Feb. 4, 1997
5600171 Mask ROM device Feb. 4, 1997
5576573 Stacked CVD oxide architecture multi-state memory cell for mask read-only memories Nov. 19, 1996
5572056 High density ROM Nov. 5, 1996
5567970 Post metal mask ROM with thin glass dielectric layer formed over word lines Oct. 22, 1996
5563437 Semiconductor device having a large sense voltage Oct. 8, 1996
5561623 High speed DRAM with novel wiring structure Oct. 1, 1996

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