| |
 |
|
Class Information
Number: 257/369
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Field effect device > Having insulated electrode (e.g., mosfet, mos diode) > Insulated gate field effect transistor in integrated circuit > Complementary insulated gate field effect transistors
Description: Subject matter wherein the device is made up of IGFETs that have opposite conductivity channels (p-type and n-type).
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7619285 |
Method of fabricating CMOS transistor and CMOS transistor fabricated thereby |
Nov. 17, 2009 |
| 7615831 |
Structure and method for fabricating self-aligned metal contacts |
Nov. 10, 2009 |
| 7615433 |
Double anneal with improved reliability for dual contact etch stop liner scheme |
Nov. 10, 2009 |
| 7612414 |
Overlapped stressed liners for improved contacts |
Nov. 3, 2009 |
| 7612413 |
Semiconductor device and manufacturing method thereof |
Nov. 3, 2009 |
| 7608912 |
Technique for creating different mechanical strain in different CPU regions by forming an etch stop layer having differently modified intrinsic stress |
Oct. 27, 2009 |
| 7608897 |
Sub-surface region with diagonal gap regions |
Oct. 27, 2009 |
| 7608896 |
Semiconductor device |
Oct. 27, 2009 |
| 7608891 |
Thin film transistor, circuit apparatus and liquid crystal display |
Oct. 27, 2009 |
| 7608873 |
Buried-gated photodiode device and method for configuring and operating same |
Oct. 27, 2009 |
| 7608499 |
Semiconductor structure comprising field effect transistors with stressed channel regions and method of forming the same |
Oct. 27, 2009 |
| 7605414 |
MOS transistors having low-resistance salicide gates and a self-aligned contact between them |
Oct. 20, 2009 |
| 7602031 |
Method of fabricating semiconductor device, and semiconductor device |
Oct. 13, 2009 |
| 7598573 |
Systems and methods for voltage distribution via multiple epitaxial layers |
Oct. 6, 2009 |
| 7598540 |
High performance CMOS devices comprising gapped dual stressors with dielectric gap fillers, and methods of fabricating the same |
Oct. 6, 2009 |
| 7592674 |
Semiconductor device with silicide-containing gate electrode and method of fabricating the same |
Sep. 22, 2009 |
| 7589386 |
Semiconductor device and manufacturing method thereof |
Sep. 15, 2009 |
| 7589385 |
Semiconductor CMOS transistors and method of manufacturing the same |
Sep. 15, 2009 |
| 7586160 |
Method of manufacturing a semiconductor integrated circuit and semiconductor integrated circuit |
Sep. 8, 2009 |
| 7586159 |
Semiconductor devices having different gate dielectrics and methods for manufacturing the same |
Sep. 8, 2009 |
| 7586158 |
Piezoelectric stress liner for bulk and SOI |
Sep. 8, 2009 |
| 7582927 |
Flash EEPROM cell and method of fabricating the same |
Sep. 1, 2009 |
| 7579660 |
Semiconductor device and manufacturing method thereof |
Aug. 25, 2009 |
| 7579655 |
Transistor structure having interconnect to side of diffusion and related method |
Aug. 25, 2009 |
| 7577040 |
Dual port memory device with reduced coupling effect |
Aug. 18, 2009 |
| 7576397 |
Semiconductor device |
Aug. 18, 2009 |
| 7575975 |
Method for forming a planar and vertical semiconductor structure having a strained semiconductor layer |
Aug. 18, 2009 |
| 7569893 |
Method of fabricating semiconductor device and semiconductor device fabricated thereby |
Aug. 4, 2009 |
| 7569892 |
Method and structure for forming self-aligned, dual stress liner for CMOS devices |
Aug. 4, 2009 |
| 7569891 |
Semiconductor device with reduced contact resistance and method for manufacturing the same |
Aug. 4, 2009 |
| 7569890 |
Manufacturing method of CMOS type semiconductor device, and CMOS type semiconductor device |
Aug. 4, 2009 |
| 7569889 |
Memory integrated circuit, in particular an SRAM memory integrated circuit, and corresponding fabrication process |
Aug. 4, 2009 |
| 7569888 |
Semiconductor device with close stress liner film and method of manufacturing the same |
Aug. 4, 2009 |
| 7569466 |
Dual metal gate self-aligned integration |
Aug. 4, 2009 |
| 7566936 |
Complementary MIS device |
Jul. 28, 2009 |
| 7564102 |
Semiconductor device and its manufacturing method |
Jul. 21, 2009 |
| 7564073 |
CMOS and HCMOS semiconductor integrated circuit |
Jul. 21, 2009 |
| 7560781 |
Semiconductor device and fabrication method thereof |
Jul. 14, 2009 |
| 7560780 |
Active region spacer for semiconductor devices and method to form the same |
Jul. 14, 2009 |
| 7560779 |
Method for forming a mixed voltage circuit having complementary devices |
Jul. 14, 2009 |
| 7557414 |
Semiconductor device and method for manufacturing the same |
Jul. 7, 2009 |
| 7547947 |
SRAM cell |
Jun. 16, 2009 |
| 7545005 |
Semiconductor device capable of avoiding latchup breakdown resulting from negative variation of floating offset voltage |
Jun. 9, 2009 |
| 7545004 |
Method and structure for forming strained devices |
Jun. 9, 2009 |
| 7545002 |
Low noise and high performance LSI device, layout and manufacturing method |
Jun. 9, 2009 |
| 7544555 |
Method of manufacturing semiconductor device |
Jun. 9, 2009 |
| 7541650 |
Gate electrode structures |
Jun. 2, 2009 |
| 7535064 |
Semiconductor device having a fin and method of manufacturing the same |
May. 19, 2009 |
| 7534676 |
Method of forming enhanced device via transverse stress |
May. 19, 2009 |
| 7531881 |
Semiconductor devices having transistors with different gate structures and methods of fabricating the same |
May. 12, 2009 |
|
|
|
