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Class Information
Number: 252/79.4
Name: Compositions > Etching or brightening compositions > Inorganic acid containing > With organic material
Description: Compositions which contain an organic material in addition to the acid.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7601273 |
Polishing slurry composition and method of using the same |
Oct. 13, 2009 |
| 7572758 |
Cleaning liquid and cleaning method |
Aug. 11, 2009 |
| 7563315 |
Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates |
Jul. 21, 2009 |
| 7563383 |
CMP composition with a polymer additive for polishing noble metals |
Jul. 21, 2009 |
| 7553430 |
Polishing slurries and methods for chemical mechanical polishing |
Jun. 30, 2009 |
| 7544307 |
Metal polishing liquid and polishing method using it |
Jun. 9, 2009 |
| 7514363 |
Chemical-mechanical planarization composition having benzenesulfonic acid and per-compound oxidizing agents, and associated method for use |
Apr. 7, 2009 |
| 7507350 |
Etching liquid composition |
Mar. 24, 2009 |
| 7497966 |
Chemical mechanical polishing slurry composition for shallow trench isolation process of semiconductor |
Mar. 3, 2009 |
| 7481949 |
Polishing composition and rinsing composition |
Jan. 27, 2009 |
| 7481950 |
Polishing composition and polishing method using the same |
Jan. 27, 2009 |
| 7473380 |
Etching liquid |
Jan. 6, 2009 |
| 7456107 |
Compositions and methods for CMP of low-k-dielectric materials |
Nov. 25, 2008 |
| 7456114 |
Microetching composition and method of using the same |
Nov. 25, 2008 |
| 7452481 |
Polishing slurry and method of reclaiming wafers |
Nov. 18, 2008 |
| 7449127 |
Cleaning method and solution for cleaning a wafer in a single wafer process |
Nov. 11, 2008 |
| 7435356 |
Abrasive-free chemical mechanical polishing compositions and methods relating thereto |
Oct. 14, 2008 |
| 7427362 |
Corrosion-resistant barrier polishing solution |
Sep. 23, 2008 |
| 7422700 |
Compositions and methods of electrochemical removal of material from a barrier layer of a wafer |
Sep. 9, 2008 |
| 7407601 |
Polymeric particle slurry system and method to reduce feature sidewall erosion |
Aug. 5, 2008 |
| 7399424 |
Compositions for dissolution of low-k dielectric films, and methods of use |
Jul. 15, 2008 |
| 7390429 |
Method and composition for electrochemical mechanical polishing processing |
Jun. 24, 2008 |
| 7384534 |
Electrolyte with good planarization capability, high removal rate and smooth surface finish for electrochemically controlled copper CMP |
Jun. 10, 2008 |
| 7368064 |
Cleaning solution and manufacturing method for semiconductor device |
May. 6, 2008 |
| 7347951 |
Method of manufacturing electronic device |
Mar. 25, 2008 |
| 7332436 |
Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition |
Feb. 19, 2008 |
| 7316603 |
Compositions and methods for tantalum CMP |
Jan. 8, 2008 |
| 7314578 |
Slurry compositions and CMP methods using the same |
Jan. 1, 2008 |
| 7311855 |
Polishing slurry for chemical mechanical polishing and method for polishing substrate |
Dec. 25, 2007 |
| 7311856 |
Polymeric inhibitors for enhanced planarization |
Dec. 25, 2007 |
| 7311857 |
Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor device |
Dec. 25, 2007 |
| 7306747 |
Use of fluorinated additives in the etching or polishing of integrated circuits |
Dec. 11, 2007 |
| 7300601 |
Passivative chemical mechanical polishing composition for copper film planarization |
Nov. 27, 2007 |
| 7300602 |
Selective barrier metal polishing solution |
Nov. 27, 2007 |
| 7297633 |
Compositions for chemical mechanical polishing silica and silicon nitride having improved endpoint detection |
Nov. 20, 2007 |
| 7294044 |
Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
Nov. 13, 2007 |
| 7288212 |
Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition |
Oct. 30, 2007 |
| 7279119 |
Silica and silica-based slurry |
Oct. 9, 2007 |
| 7276180 |
Chemical mechanical polishing composition and process |
Oct. 2, 2007 |
| 7273566 |
Gas compositions |
Sep. 25, 2007 |
| 7262409 |
Chemical etch solution and technique for imaging a device's shallow junction profile |
Aug. 28, 2007 |
| 7255810 |
Polishing system comprising a highly branched polymer |
Aug. 14, 2007 |
| 7255809 |
Polishing slurry for texturing |
Aug. 14, 2007 |
| 7253111 |
Barrier polishing solution |
Aug. 7, 2007 |
| 7252782 |
Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method |
Aug. 7, 2007 |
| 7241920 |
Filterable surfactant composition |
Jul. 10, 2007 |
| 7235188 |
Aqueous phosphoric acid compositions for cleaning semiconductor devices |
Jun. 26, 2007 |
| 7232528 |
Surface treatment agent for copper and copper alloy |
Jun. 19, 2007 |
| 7232529 |
Polishing compound for chemimechanical polishing and polishing method |
Jun. 19, 2007 |
| 7229929 |
Multi-layer gate stack |
Jun. 12, 2007 |
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