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Class Information
Number: 252/79.3
Name: Compositions > Etching or brightening compositions > Inorganic acid containing > Fluorine compound containing
Description: Compositions which contain a fluorine compound.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7601273 |
Polishing slurry composition and method of using the same |
Oct. 13, 2009 |
| 7578947 |
Method for etching non-conductive substrate surfaces |
Aug. 25, 2009 |
| 7563383 |
CMP composition with a polymer additive for polishing noble metals |
Jul. 21, 2009 |
| 7553430 |
Polishing slurries and methods for chemical mechanical polishing |
Jun. 30, 2009 |
| 7544307 |
Metal polishing liquid and polishing method using it |
Jun. 9, 2009 |
| 7507350 |
Etching liquid composition |
Mar. 24, 2009 |
| 7485241 |
Chemical-mechanical polishing composition and method for using the same |
Feb. 3, 2009 |
| 7481950 |
Polishing composition and polishing method using the same |
Jan. 27, 2009 |
| 7456114 |
Microetching composition and method of using the same |
Nov. 25, 2008 |
| 7456107 |
Compositions and methods for CMP of low-k-dielectric materials |
Nov. 25, 2008 |
| 7442324 |
Etching reagent, and method for manufacturing electronic device substrate and electronic device |
Oct. 28, 2008 |
| 7435356 |
Abrasive-free chemical mechanical polishing compositions and methods relating thereto |
Oct. 14, 2008 |
| 7427362 |
Corrosion-resistant barrier polishing solution |
Sep. 23, 2008 |
| 7407601 |
Polymeric particle slurry system and method to reduce feature sidewall erosion |
Aug. 5, 2008 |
| 7399424 |
Compositions for dissolution of low-k dielectric films, and methods of use |
Jul. 15, 2008 |
| 7368064 |
Cleaning solution and manufacturing method for semiconductor device |
May. 6, 2008 |
| 7361631 |
Compositions for the removal of organic and inorganic residues |
Apr. 22, 2008 |
| 7351354 |
Tungsten metal removing solution and method for removing tungsten metal by use thereof |
Apr. 1, 2008 |
| 7347951 |
Method of manufacturing electronic device |
Mar. 25, 2008 |
| 7332436 |
Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition |
Feb. 19, 2008 |
| 7314578 |
Slurry compositions and CMP methods using the same |
Jan. 1, 2008 |
| 7311857 |
Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor device |
Dec. 25, 2007 |
| 7309449 |
Substrate processing method |
Dec. 18, 2007 |
| 7306747 |
Use of fluorinated additives in the etching or polishing of integrated circuits |
Dec. 11, 2007 |
| 7279119 |
Silica and silica-based slurry |
Oct. 9, 2007 |
| 7276181 |
Method for preparing decorative glass using glass etching composition |
Oct. 2, 2007 |
| 7261835 |
Acid blend for removing etch residue |
Aug. 28, 2007 |
| 7253111 |
Barrier polishing solution |
Aug. 7, 2007 |
| 7241920 |
Filterable surfactant composition |
Jul. 10, 2007 |
| 7235188 |
Aqueous phosphoric acid compositions for cleaning semiconductor devices |
Jun. 26, 2007 |
| 7223352 |
Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal |
May. 29, 2007 |
| 7192860 |
Highly selective silicon oxide etching compositions |
Mar. 20, 2007 |
| 7168436 |
Gas for removing deposit and removal method using same |
Jan. 30, 2007 |
| 7153449 |
Acidic treatment liquid and method of treating copper surfaces |
Dec. 26, 2006 |
| 7138342 |
Process of maintaining hybrid etch |
Nov. 21, 2006 |
| 7138364 |
Cleaning gas and etching gas |
Nov. 21, 2006 |
| 7132058 |
Tungsten polishing solution |
Nov. 7, 2006 |
| 7097783 |
Method for inspecting a titanium-based component |
Aug. 29, 2006 |
| 7083741 |
Process and device for the wet-chemical treatment of silicon |
Aug. 1, 2006 |
| 7052627 |
Etching solution, etched article and method for etched article |
May. 30, 2006 |
| 7022254 |
Chromate-free method for surface etching of titanium |
Apr. 4, 2006 |
| 7018924 |
CMP slurry compositions for oxide films and methods for forming metal line contact plugs using the same |
Mar. 28, 2006 |
| 7018560 |
Composition for polishing semiconductor layers |
Mar. 28, 2006 |
| 7001533 |
Chromate-free method for surface etching of aluminum and aluminum alloys |
Feb. 21, 2006 |
| 6908569 |
Ruthenium silicide wet etch |
Jun. 21, 2005 |
| 6905632 |
Dispersion for chemical mechanical polishing |
Jun. 14, 2005 |
| 6902626 |
Method for roughening copper surface |
Jun. 7, 2005 |
| 6899865 |
Oral composition comprising water and cyclic carbonate in two phase state |
May. 31, 2005 |
| 6896826 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
May. 24, 2005 |
| 6890452 |
Fluorinated surfactants for aqueous acid etch solutions |
May. 10, 2005 |
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