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Class Information
Number: 252/79.2
Name: Compositions > Etching or brightening compositions > Inorganic acid containing
Description: Compositions containing an inorganic acid.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7601273 |
Polishing slurry composition and method of using the same |
Oct. 13, 2009 |
| 7563315 |
Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates |
Jul. 21, 2009 |
| 7563383 |
CMP composition with a polymer additive for polishing noble metals |
Jul. 21, 2009 |
| 7553430 |
Polishing slurries and methods for chemical mechanical polishing |
Jun. 30, 2009 |
| 7544307 |
Metal polishing liquid and polishing method using it |
Jun. 9, 2009 |
| 7514363 |
Chemical-mechanical planarization composition having benzenesulfonic acid and per-compound oxidizing agents, and associated method for use |
Apr. 7, 2009 |
| 7507350 |
Etching liquid composition |
Mar. 24, 2009 |
| 7485241 |
Chemical-mechanical polishing composition and method for using the same |
Feb. 3, 2009 |
| 7481950 |
Polishing composition and polishing method using the same |
Jan. 27, 2009 |
| 7456107 |
Compositions and methods for CMP of low-k-dielectric materials |
Nov. 25, 2008 |
| 7456114 |
Microetching composition and method of using the same |
Nov. 25, 2008 |
| 7442324 |
Etching reagent, and method for manufacturing electronic device substrate and electronic device |
Oct. 28, 2008 |
| 7442323 |
Potassium monopersulfate solutions |
Oct. 28, 2008 |
| 7435356 |
Abrasive-free chemical mechanical polishing compositions and methods relating thereto |
Oct. 14, 2008 |
| 7427362 |
Corrosion-resistant barrier polishing solution |
Sep. 23, 2008 |
| 7416680 |
Self-cleaning colloidal slurry composition and process for finishing a surface of a substrate |
Aug. 26, 2008 |
| 7407601 |
Polymeric particle slurry system and method to reduce feature sidewall erosion |
Aug. 5, 2008 |
| 7404910 |
Etching solution, etched article and method for etched article |
Jul. 29, 2008 |
| 7402261 |
Slurry compositions, methods of preparing slurry compositions, and methods of polishing an object using slurry compositions |
Jul. 22, 2008 |
| 7399424 |
Compositions for dissolution of low-k dielectric films, and methods of use |
Jul. 15, 2008 |
| 7390429 |
Method and composition for electrochemical mechanical polishing processing |
Jun. 24, 2008 |
| 7368387 |
Polishing composition and polishing method |
May. 6, 2008 |
| 7357879 |
Etching solution, method of etching and printed wiring board |
Apr. 15, 2008 |
| 7351354 |
Tungsten metal removing solution and method for removing tungsten metal by use thereof |
Apr. 1, 2008 |
| 7344988 |
Alumina abrasive for chemical mechanical polishing |
Mar. 18, 2008 |
| 7332104 |
Slurry for CMP, polishing method and method of manufacturing semiconductor device |
Feb. 19, 2008 |
| 7332436 |
Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition |
Feb. 19, 2008 |
| 7314578 |
Slurry compositions and CMP methods using the same |
Jan. 1, 2008 |
| 7311857 |
Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor device |
Dec. 25, 2007 |
| 7306747 |
Use of fluorinated additives in the etching or polishing of integrated circuits |
Dec. 11, 2007 |
| 7300601 |
Passivative chemical mechanical polishing composition for copper film planarization |
Nov. 27, 2007 |
| 7300602 |
Selective barrier metal polishing solution |
Nov. 27, 2007 |
| 7285229 |
Etchant and replenishment solution therefor, and etching method and method for producing wiring board using the same |
Oct. 23, 2007 |
| 7279119 |
Silica and silica-based slurry |
Oct. 9, 2007 |
| 7276180 |
Chemical mechanical polishing composition and process |
Oct. 2, 2007 |
| 7267784 |
Chemical-mechanical polishing (CMP) slurry and method of planarizing computer memory disk surfaces |
Sep. 11, 2007 |
| 7262409 |
Chemical etch solution and technique for imaging a device's shallow junction profile |
Aug. 28, 2007 |
| 7261835 |
Acid blend for removing etch residue |
Aug. 28, 2007 |
| 7261828 |
Bumping process |
Aug. 28, 2007 |
| 7253111 |
Barrier polishing solution |
Aug. 7, 2007 |
| 7241920 |
Filterable surfactant composition |
Jul. 10, 2007 |
| 7235188 |
Aqueous phosphoric acid compositions for cleaning semiconductor devices |
Jun. 26, 2007 |
| 7232478 |
Adhesion promotion in printed circuit boards |
Jun. 19, 2007 |
| 7232529 |
Polishing compound for chemimechanical polishing and polishing method |
Jun. 19, 2007 |
| 7223352 |
Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal |
May. 29, 2007 |
| 7211200 |
Manufacture and cleaning of a semiconductor |
May. 1, 2007 |
| 7204936 |
Polishing composition |
Apr. 17, 2007 |
| 7198729 |
CMP slurry and method of manufacturing semiconductor device |
Apr. 3, 2007 |
| 7179398 |
Etchant for wires, a method for manufacturing the wires using the etchant, a thin film transistor array substrate and a method for manufacturing the same including the method |
Feb. 20, 2007 |
| 7172976 |
Extrusion-free wet cleaning process for copper-dual damascene structures |
Feb. 6, 2007 |
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