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Class Information
Number: 252/79.1
Name: Compositions > Etching or brightening compositions
Description: Compositions specialized and designed for the treatment of mineral substances (including metal) by surface removal with chemical agents.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7622049 |
Passivation for cleaning a material |
Nov. 24, 2009 |
| 7618897 |
Alkali etching liquid for silicon wafer and etching method using same |
Nov. 17, 2009 |
| 7604751 |
Polishing liquid composition |
Oct. 20, 2009 |
| 7601273 |
Polishing slurry composition and method of using the same |
Oct. 13, 2009 |
| 7597819 |
Redox buffered hydrofluoric acid etchant for the reduction of galvanic attack during release etching of MEMS devices having noble material films |
Oct. 6, 2009 |
| 7592264 |
Process for removing material from substrates |
Sep. 22, 2009 |
| 7582564 |
Process and composition for conductive material removal by electrochemical mechanical polishing |
Sep. 1, 2009 |
| 7582220 |
Etching method |
Sep. 1, 2009 |
| 7563383 |
CMP composition with a polymer additive for polishing noble metals |
Jul. 21, 2009 |
| 7563315 |
Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates |
Jul. 21, 2009 |
| 7553430 |
Polishing slurries and methods for chemical mechanical polishing |
Jun. 30, 2009 |
| 7550092 |
Chemical mechanical polishing composition |
Jun. 23, 2009 |
| 7547635 |
Process for etching dielectric films with improved resist and/or etch profile characteristics |
Jun. 16, 2009 |
| 7544307 |
Metal polishing liquid and polishing method using it |
Jun. 9, 2009 |
| 7537709 |
Method for isotropic etching of copper |
May. 26, 2009 |
| 7531105 |
Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios |
May. 12, 2009 |
| 7527742 |
Etchant, method of etching, laminate formed thereby, and device |
May. 5, 2009 |
| 7524801 |
Process for removing contaminant from a surface and composition useful therefor |
Apr. 28, 2009 |
| 7521408 |
Semiconductor cleaning solution |
Apr. 21, 2009 |
| 7507350 |
Etching liquid composition |
Mar. 24, 2009 |
| 7504044 |
Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios |
Mar. 17, 2009 |
| 7497967 |
Compositions and methods for polishing copper |
Mar. 3, 2009 |
| 7497966 |
Chemical mechanical polishing slurry composition for shallow trench isolation process of semiconductor |
Mar. 3, 2009 |
| 7485241 |
Chemical-mechanical polishing composition and method for using the same |
Feb. 3, 2009 |
| 7485162 |
Polishing composition |
Feb. 3, 2009 |
| 7481950 |
Polishing composition and polishing method using the same |
Jan. 27, 2009 |
| 7481949 |
Polishing composition and rinsing composition |
Jan. 27, 2009 |
| 7473380 |
Etching liquid |
Jan. 6, 2009 |
| 7470628 |
Etching methods |
Dec. 30, 2008 |
| 7470623 |
Method of forming a platinum pattern |
Dec. 30, 2008 |
| 7465408 |
Solutions for controlled, selective etching of copper |
Dec. 16, 2008 |
| 7456114 |
Microetching composition and method of using the same |
Nov. 25, 2008 |
| 7456107 |
Compositions and methods for CMP of low-k-dielectric materials |
Nov. 25, 2008 |
| 7452481 |
Polishing slurry and method of reclaiming wafers |
Nov. 18, 2008 |
| 7449415 |
Gas for plasma reaction and process for producing thereof |
Nov. 11, 2008 |
| 7449127 |
Cleaning method and solution for cleaning a wafer in a single wafer process |
Nov. 11, 2008 |
| 7442324 |
Etching reagent, and method for manufacturing electronic device substrate and electronic device |
Oct. 28, 2008 |
| 7442323 |
Potassium monopersulfate solutions |
Oct. 28, 2008 |
| 7435356 |
Abrasive-free chemical mechanical polishing compositions and methods relating thereto |
Oct. 14, 2008 |
| 7431861 |
Etchant, replenishment solution and method for producing copper wiring using the same |
Oct. 7, 2008 |
| 7429338 |
Surface modified colloidal abrasives, including stable bimetallic surface coated silica sols for chemical mechanical planarization |
Sep. 30, 2008 |
| 7427567 |
Polishing slurries for copper and associated materials |
Sep. 23, 2008 |
| 7427362 |
Corrosion-resistant barrier polishing solution |
Sep. 23, 2008 |
| 7427361 |
Particulate or particle-bound chelating agents |
Sep. 23, 2008 |
| 7419911 |
Compositions and methods for rapidly removing overfilled substrates |
Sep. 2, 2008 |
| 7419910 |
Slurry for CMP, polishing method and method of manufacturing semiconductor device |
Sep. 2, 2008 |
| 7416681 |
Etching solution for multiple layer of copper and molybdenum and etching method using the same |
Aug. 26, 2008 |
| 7416680 |
Self-cleaning colloidal slurry composition and process for finishing a surface of a substrate |
Aug. 26, 2008 |
| 7413990 |
Method of fabricating a dual damascene interconnect structure |
Aug. 19, 2008 |
| 7407601 |
Polymeric particle slurry system and method to reduce feature sidewall erosion |
Aug. 5, 2008 |
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