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Class Information
Number: 252/79.1
Name: Compositions > Etching or brightening compositions
Description: Compositions specialized and designed for the treatment of mineral substances (including metal) by surface removal with chemical agents.










Sub-classes under this class:

Class Number Class Name Patents
252/79.5 Alkali metal hydroxide containing 265
252/79.2 Inorganic acid containing 603


Patents under this class:

Patent Number Title Of Patent Date Issued
8709278 Polishing composition Apr. 29, 2014
8709277 Etching composition Apr. 29, 2014
8703007 Polishing composition and polishing method using the same Apr. 22, 2014
8703005 Methods for removing dielectric materials Apr. 22, 2014
8691019 Process for cleaning a compound semiconductor wafer Apr. 8, 2014
8685857 Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device Apr. 1, 2014
8685272 Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor device Apr. 1, 2014
8684793 Oxidizing particles based slurry for nobel metal including ruthenium chemical mechanical planarization Apr. 1, 2014
8679980 Aqueous metal polishing agent comprising a polymeric abrasiv containing pendant functional groups and its use in a CMP process Mar. 25, 2014
8658053 Etching composition for metal material and method for manufacturing semiconductor device by using same Feb. 25, 2014
8652967 Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same Feb. 18, 2014
8652350 Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method using the same, and method of recycling chemical mechanical polishing aqueous dispersion Feb. 18, 2014
8647527 Polishing composition and polishing method using the same Feb. 11, 2014
8647526 Two component etching Feb. 11, 2014
8647523 Etching composition Feb. 11, 2014
8642526 Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon Feb. 4, 2014
8641920 Polishing composition for planarizing metal layer Feb. 4, 2014
8636917 Solution for forming polishing slurry, polishing slurry and related methods Jan. 28, 2014
8633111 Composition for polishing surfaces of silicon dioxide Jan. 21, 2014
8632693 Wetting agent for semiconductors, and polishing composition and polishing method employing it Jan. 21, 2014
8632692 Compositions for use in semiconductor devices Jan. 21, 2014
8628682 Compositions comprising a fluorosurfactant and a hydrotrope Jan. 14, 2014
8628673 Resin composition for pattern formation, pattern formation method and process for producing light-emitting element Jan. 14, 2014
8623767 Method for polishing aluminum/copper and titanium in damascene structures Jan. 7, 2014
8623273 Methods for prevention and reduction of scale formation Jan. 7, 2014
8623236 Titanium nitride-stripping liquid, and method for stripping titanium nitride coating film Jan. 7, 2014
8617418 Conductive film removal agent and conductive film removal method Dec. 31, 2013
8617417 Cleaning composition, method for producing semiconductor device, and cleaning method Dec. 31, 2013
8617275 Polishing agent and method for polishing substrate using the polishing agent Dec. 31, 2013
8603867 Composition for removing a photoresist and method of manufacturing a thin-film transistor substrate using the composition Dec. 10, 2013
8597540 Compositions for polishing silicon-containing substrates Dec. 3, 2013
8597539 Chemical mechanical polishing (CMP) polishing solution with enhanced performance Dec. 3, 2013
8592317 Polishing solution for CMP and polishing method using the polishing solution Nov. 26, 2013
8592314 Polishing composition and polishing method Nov. 26, 2013
8591763 Halide anions for metal removal rate control Nov. 26, 2013
8591612 Cerium oxide slurry, cerium oxide polishing slurry and method for polishing substrate using the same Nov. 26, 2013
8585920 Polishing composition and method using same Nov. 19, 2013
8585917 Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods Nov. 19, 2013
8580656 Process for inhibiting corrosion and removing contaminant from a surface during wafer dicing and composition useful therefor Nov. 12, 2013
8568610 Stabilized, concentratable chemical mechanical polishing composition and method of polishing a substrate Oct. 29, 2013
8562855 Silicon etching liquid and etching method Oct. 22, 2013
8557137 Polishing composition for nickel phosphorous memory disks Oct. 15, 2013
8551887 Method for chemical mechanical planarization of a copper-containing substrate Oct. 8, 2013
8551202 Iodate-containing chemical-mechanical polishing compositions and methods Oct. 8, 2013
8546261 Slurry for polishing and planarization method of insulating layer using the same Oct. 1, 2013
8540894 Polishing composition Sep. 24, 2013
8540893 Chemical mechanical polishing composition and methods relating thereto Sep. 24, 2013
8535552 Method of evaluating center segregation of continuous cast slab Sep. 17, 2013
8529787 Colloidal silica containing silica secondary particles having bent structure and/or branched structure, and method for producing same Sep. 10, 2013
8524112 Process for the production of microelectromechanical systems Sep. 3, 2013











 
 
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