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Class Information
Number: 250/492.22
Name: Radiant energy > Irradiation of objects or material > Irradiation of semiconductor devices > Pattern control
Description: Subject matter having means (e.g., template, program) representing information necessary to variably expose the semiconductor object or material and means or steps responsive to the representing means to irradiate or re-irradiate the object or material accordingly.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7459705 |
Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure de |
Dec. 2, 2008 |
| 7456408 |
Illumination system particularly for microlithography |
Nov. 25, 2008 |
| 7453073 |
Method and equipment for specimen preparation |
Nov. 18, 2008 |
| 7453075 |
Charged particle beam exposure system |
Nov. 18, 2008 |
| 7449699 |
Method and apparatus for creating a topography at a surface |
Nov. 11, 2008 |
| 7449700 |
Electron beam exposure apparatus, electron beam exposure method and method of manufacturing semiconductor device |
Nov. 11, 2008 |
| 7442947 |
Electron-beam exposure system and electron-beam exposure method |
Oct. 28, 2008 |
| 7442930 |
Method for correcting distortions in electron backscatter diffraction patterns |
Oct. 28, 2008 |
| 7442924 |
Repetitive circumferential milling for sample preparation |
Oct. 28, 2008 |
| 7439525 |
Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particl |
Oct. 21, 2008 |
| 7439503 |
Charged particle beam irradiation method, method of manufacturing semiconductor device and charged particle beam apparatus |
Oct. 21, 2008 |
| 7435978 |
System, method and a program for correcting conditions for controlling a charged particle beam for lithography and observation, and a program and method for manufacturing a semiconductor devic |
Oct. 14, 2008 |
| 7435979 |
Optical device and method of manufacture |
Oct. 14, 2008 |
| 7432514 |
Method and apparatus for surface potential reflection electron mask lithography |
Oct. 7, 2008 |
| 7432515 |
Charged particle beam lithography apparatus and method |
Oct. 7, 2008 |
| 7425714 |
Measurement method of electron beam current, electron beam writing system and electron beam detector |
Sep. 16, 2008 |
| 7425713 |
Synchronous raster scanning lithographic system |
Sep. 16, 2008 |
| 7425715 |
Digital parallel electron beam lithography stamp |
Sep. 16, 2008 |
| 7423274 |
Electron beam writing system and electron beam writing method |
Sep. 9, 2008 |
| 7420190 |
Length measurement pattern, semiconductor device, and method of manufacturing a semiconductor device |
Sep. 2, 2008 |
| 7417242 |
Method of measuring ion beam position |
Aug. 26, 2008 |
| 7417233 |
Beam exposure correction system and method |
Aug. 26, 2008 |
| 7410508 |
Apparatus for crystallizing semiconductor with laser beams |
Aug. 12, 2008 |
| 7405414 |
Method and apparatus for patterning a workpiece |
Jul. 29, 2008 |
| 7405413 |
Arrangement for providing target material for the generation of short-wavelength electromagnetic radiation |
Jul. 29, 2008 |
| 7401319 |
Method and system for reticle-wide hierarchy management for representational and computational reuse in integrated circuit layout design |
Jul. 15, 2008 |
| 7397047 |
Technique for tuning an ion implanter system |
Jul. 8, 2008 |
| 7397053 |
Electron beam control method, electron beam drawing apparatus and method of fabricating a semiconductor device |
Jul. 8, 2008 |
| 7394080 |
Mask superposition for multiple exposures |
Jul. 1, 2008 |
| 7391034 |
Electron imaging beam with reduced space charge defocusing |
Jun. 24, 2008 |
| 7388217 |
Particle-optical projection system |
Jun. 17, 2008 |
| 7388216 |
Pattern writing and forming method |
Jun. 17, 2008 |
| 7388215 |
Pattern drawing method, stamper manufacturing method, and pattern drawing apparatus |
Jun. 17, 2008 |
| 7388214 |
Charged-particle beam exposure apparatus and method |
Jun. 17, 2008 |
| 7384710 |
Method of forming exposure mask pattern, exposure mask pattern, and method of producing semiconductor device |
Jun. 10, 2008 |
| 7381978 |
Contact opening metrology |
Jun. 3, 2008 |
| 7381943 |
Neutral particle beam processing apparatus |
Jun. 3, 2008 |
| 7378668 |
Method and apparatus for applying charged particle beam |
May. 27, 2008 |
| 7378671 |
Aberration measuring apparatus for charged particle beam optical system, charged particle beam lithography machine having the aberration measuring apparatus, and device fabrication method usin |
May. 27, 2008 |
| 7377228 |
System for and method of gas cluster ion beam processing |
May. 27, 2008 |
| 7375356 |
Electron-beam exposure system |
May. 20, 2008 |
| 7372049 |
Lithographic apparatus including a cleaning device and method for cleaning an optical element |
May. 13, 2008 |
| 7372048 |
Source multiplexing in lithography |
May. 13, 2008 |
| 7368738 |
Advanced pattern definition for particle-beam exposure |
May. 6, 2008 |
| 7368737 |
Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method |
May. 6, 2008 |
| 7368736 |
Charged beam exposure apparatus and method for manufacturing mask and semiconductor device |
May. 6, 2008 |
| 7368735 |
Charged beam drawing data creation method, charged beam drawing method, charged beam drawing apparatus and semiconductor device manufacturing method |
May. 6, 2008 |
| 7368744 |
Photon sieve for optical systems in micro-lithography |
May. 6, 2008 |
| 7361913 |
Methods and apparatus for glitch recovery in stationary-beam ion implantation process using fast ion beam control |
Apr. 22, 2008 |
| 7358512 |
Dynamic pattern generator for controllably reflecting charged-particles |
Apr. 15, 2008 |
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