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Class Information
Number: 250/492.22
Name: Radiant energy > Irradiation of objects or material > Irradiation of semiconductor devices > Pattern control
Description: Subject matter having means (e.g., template, program) representing information necessary to variably expose the semiconductor object or material and means or steps responsive to the representing means to irradiate or re-irradiate the object or material accordingly.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7626163 |
Defect review method and device for semiconductor device |
Dec. 1, 2009 |
| 7626185 |
Patterning compositions, masks, and methods |
Dec. 1, 2009 |
| 7622724 |
High voltage insulator for preventing instability in an ion implanter due to triple-junction breakdown |
Nov. 24, 2009 |
| 7619230 |
Charged particle beam writing method and apparatus and readable storage medium |
Nov. 17, 2009 |
| 7618751 |
RET for optical maskless lithography |
Nov. 17, 2009 |
| 7612337 |
Focused ion beam system and a method of sample preparation and observation |
Nov. 3, 2009 |
| 7608844 |
Charged particle beam drawing apparatus |
Oct. 27, 2009 |
| 7608845 |
Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect |
Oct. 27, 2009 |
| 7608528 |
Substrate cover, and charged particle beam writing apparatus and method |
Oct. 27, 2009 |
| 7605383 |
Pattern writing apparatus using charged particle beam, and program-recorded readable recording medium |
Oct. 20, 2009 |
| 7605385 |
Electro-less discharge extreme ultraviolet light source |
Oct. 20, 2009 |
| 7601968 |
Charged particle beam writing method and apparatus |
Oct. 13, 2009 |
| 7598504 |
Writing error diagnosis method for charged particle beam photolithography apparatus and charged particle beam photolithography apparatus |
Oct. 6, 2009 |
| 7598499 |
Charged-particle exposure apparatus |
Oct. 6, 2009 |
| 7595496 |
Optimized correction of wafer thermal deformations in a lithographic process |
Sep. 29, 2009 |
| 7592598 |
Illumination system particularly for microlithography |
Sep. 22, 2009 |
| 7592604 |
Charged particle beam apparatus |
Sep. 22, 2009 |
| 7592612 |
Method and apparatus for surface potential reflection electron mask lithography |
Sep. 22, 2009 |
| 7592611 |
Creation method and conversion method of charged particle beam writing data, and writing method of charged particle beam |
Sep. 22, 2009 |
| 7589334 |
Ion beam delivery equipment and an ion beam delivery method |
Sep. 15, 2009 |
| 7589335 |
Charged-particle beam pattern writing method and apparatus and software program for use therein |
Sep. 15, 2009 |
| 7589332 |
Via-hole processing method |
Sep. 15, 2009 |
| 7590280 |
Position detection apparatus and exposure apparatus |
Sep. 15, 2009 |
| 7590966 |
Data path for high performance pattern generator |
Sep. 15, 2009 |
| 7586103 |
High refractive index fluids for immersion lithography |
Sep. 8, 2009 |
| 7582886 |
Gantry for medical particle therapy facility |
Sep. 1, 2009 |
| 7582884 |
Charged particle beam exposure method and charged particle beam exposure device |
Sep. 1, 2009 |
| 7582883 |
Method of scanning a substrate in an ion implanter |
Sep. 1, 2009 |
| 7579606 |
Method and system for logic design for cell projection particle beam lithography |
Aug. 25, 2009 |
| 7579604 |
Beam stop and beam tuning methods |
Aug. 25, 2009 |
| 7580110 |
Exposure apparatus and exposure method |
Aug. 25, 2009 |
| 7576341 |
Lithography systems and methods for operating the same |
Aug. 18, 2009 |
| 7576337 |
Power supply for an ion implantation system |
Aug. 18, 2009 |
| 7573052 |
Exposure apparatus, exposure method, and device manufacturing method |
Aug. 11, 2009 |
| 7569307 |
Laser mask and crystallization method using the same |
Aug. 4, 2009 |
| 7569841 |
Deflection signal compensation for charged particle beam |
Aug. 4, 2009 |
| 7569842 |
Method for correcting electron beam exposure data |
Aug. 4, 2009 |
| 7566886 |
Throughput enhancement for scanned beam ion implanters |
Jul. 28, 2009 |
| 7566882 |
Reflection lithography using rotating platter |
Jul. 28, 2009 |
| 7564049 |
Pattern drawing system, electrically charged beam drawing method, photomask manufacturing method, and semiconductor device manufacturing method |
Jul. 21, 2009 |
| 7560713 |
Correction lens system for a particle beam projection device |
Jul. 14, 2009 |
| 7557364 |
Charge neutralizing device |
Jul. 7, 2009 |
| 7557365 |
Structures and methods for coupling energy from an electromagnetic wave |
Jul. 7, 2009 |
| 7554107 |
Writing method and writing apparatus of charged particle beam, positional deviation measuring method, and position measuring apparatus |
Jun. 30, 2009 |
| 7554108 |
Forming a semiconductor device feature using acquired parameters |
Jun. 30, 2009 |
| 7554094 |
Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
Jun. 30, 2009 |
| 7550740 |
Focused ION beam apparatus |
Jun. 23, 2009 |
| 7550747 |
Parallel electron beam lithography stamp (PEBLS) |
Jun. 23, 2009 |
| 7547898 |
Particulate prevention in ion implantation |
Jun. 16, 2009 |
| 7547899 |
Charged beam dump and particle attractor |
Jun. 16, 2009 |
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