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Class Information
Number: 250/492.21
Name: Radiant energy > Irradiation of objects or material > Irradiation of semiconductor devices > Ion bombardment
Description: Subject matter comprising a means for irradiating a semiconductive object or material with at least one ion beam.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7126138 |
Electron flood apparatus and ion implantation system |
Oct. 24, 2006 |
| 7122966 |
Ion source apparatus and method |
Oct. 17, 2006 |
| 7119333 |
Ion detector for ion beam applications |
Oct. 10, 2006 |
| 7119347 |
Ion implantation apparatus and method |
Oct. 10, 2006 |
| 7112809 |
Electrostatic lens for ion beams |
Sep. 26, 2006 |
| 7112789 |
High aspect ratio, high mass resolution analyzer magnet and system for ribbon ion beams |
Sep. 26, 2006 |
| 7112808 |
Wafer 2D scan mechanism |
Sep. 26, 2006 |
| 7109499 |
Apparatus and methods for two-dimensional ion beam profiling |
Sep. 19, 2006 |
| 7109501 |
Charged particle beam lithography system, pattern drawing method, and method of manufacturing semiconductor device |
Sep. 19, 2006 |
| 7105840 |
Ion source for use in an ion implanter |
Sep. 12, 2006 |
| 7105839 |
Method and fine-control collimator for accurate collimation and precise parallel alignment of scanned ion beams |
Sep. 12, 2006 |
| 7105838 |
Multi directional mechanical scanning in an ion implanter |
Sep. 12, 2006 |
| 7102146 |
Dose cup located near bend in final energy filter of serial implanter for closed loop dose control |
Sep. 5, 2006 |
| 7098614 |
Electrostatic accelerator and ion implanting apparatus with the same |
Aug. 29, 2006 |
| 7095024 |
TEM sample equipped with an identifying function, focused ion beam device for processing TEM sample, and transmission electron microscope |
Aug. 22, 2006 |
| 7091503 |
Measuring plasma uniformity in-situ at wafer level |
Aug. 15, 2006 |
| 7091484 |
Method and apparatus for crystal analysis |
Aug. 15, 2006 |
| 7087912 |
Ion beam irradiation apparatus for suppressing charge up of substrate and method for the same |
Aug. 8, 2006 |
| 7087913 |
Ion implanter electrodes |
Aug. 8, 2006 |
| 7084399 |
Ion beam apparatus and sample processing method |
Aug. 1, 2006 |
| 7084408 |
Vaporization and ionization of metals for use in semiconductor processing |
Aug. 1, 2006 |
| 7081633 |
Apparatus, method and program for ion implantation simulation, and computer readable storage medium having stored therein the program |
Jul. 25, 2006 |
| 7078713 |
Electromagnetic regulator assembly for adjusting and controlling the current uniformity of continuous ion beams |
Jul. 18, 2006 |
| 7078707 |
Ion beam scanning control methods and systems for ion implantation uniformity |
Jul. 18, 2006 |
| 7078711 |
Matching dose and energy of multiple ion implanters |
Jul. 18, 2006 |
| 7078712 |
In-situ monitoring on an ion implanter |
Jul. 18, 2006 |
| 7078714 |
Ion implanting apparatus |
Jul. 18, 2006 |
| 7078710 |
Ion beam system |
Jul. 18, 2006 |
| 7075095 |
Plasma accelerator system |
Jul. 11, 2006 |
| 7075094 |
System, method, and apparatus for ion beam etching process stability using a reference for time scaling subsequent steps |
Jul. 11, 2006 |
| 7067829 |
Power sag detection and control in ion implanting system |
Jun. 27, 2006 |
| 7067828 |
Method of and apparatus for measurement and control of a gas cluster ion beam |
Jun. 27, 2006 |
| 7067821 |
Flood gun for charge neutralization |
Jun. 27, 2006 |
| 7064340 |
Method and apparatus for ion beam profiling |
Jun. 20, 2006 |
| 7060995 |
Ion-implantation machine, control method thereof, and process for manufacturing integrated devices |
Jun. 13, 2006 |
| 7057192 |
Radial scan arm and collimator for serial processing of semiconductor wafers with ribbon beams |
Jun. 6, 2006 |
| 7057191 |
Method of controlling implant dosage and pressure compensation factor in-situ |
Jun. 6, 2006 |
| 7053386 |
Method and apparatus for implanting semiconductor wafer substrates |
May. 30, 2006 |
| 7049607 |
Electron beam writing equipment and electron beam writing method |
May. 23, 2006 |
| 7045799 |
Weakening focusing effect of acceleration-deceleration column of ion implanter |
May. 16, 2006 |
| 7041990 |
Apparatus for monitoring ion-implantation input parameter in semiconductor fabricating devices and monitoring method thereof |
May. 9, 2006 |
| 7038223 |
Controlled charge neutralization of ion-implanted articles |
May. 2, 2006 |
| 7034322 |
Fluid jet electric discharge source |
Apr. 25, 2006 |
| 7034297 |
Method and system for use in the monitoring of samples with a charged particle beam |
Apr. 25, 2006 |
| 7030395 |
Workpiece support structure for an ion beam implanter featuring spherical sliding seal vacuum feedthrough |
Apr. 18, 2006 |
| 7026628 |
Advanced ion beam detector for ion implantation tools |
Apr. 11, 2006 |
| 7026633 |
Ion implantation system with an interlock function |
Apr. 11, 2006 |
| 7023003 |
Ion implanter and method of preventing undesirable ions from implanting a target wafer |
Apr. 4, 2006 |
| 7022999 |
Ion implantation ion source, system and method |
Apr. 4, 2006 |
| 7019313 |
Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus |
Mar. 28, 2006 |
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