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Class Information
Number: 250/492.21
Name: Radiant energy > Irradiation of objects or material > Irradiation of semiconductor devices > Ion bombardment
Description: Subject matter comprising a means for irradiating a semiconductive object or material with at least one ion beam.


Patents under this class:
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Patent Number Title Of Patent Date Issued
5434423 System and method for optimizing placement of dopant upon semiconductor surface Jul. 18, 1995
5432352 Ion beam scan control Jul. 11, 1995
5422490 Focused ion beam implantation apparatus Jun. 6, 1995
5420415 Structure for alignment of an ion source aperture with a predetermined ion beam path May. 30, 1995
5420435 Ion implantation machine with photonic pressure particle filter May. 30, 1995
5418378 Ion implant device with modulated scan output May. 23, 1995
5406072 Method for microbeam ion radiation testing of photonic devices Apr. 11, 1995
5406088 Scan and tilt apparatus for an ion implanter Apr. 11, 1995
5399871 Plasma flood system for the reduction of charging of wafers during ion implantation Mar. 21, 1995
5396076 Ion implantation system with protective plates of silicon in mass analyzing region Mar. 7, 1995
5393984 Magnetic deflection system for ion beam implanters Feb. 28, 1995
5393985 Apparatus for focusing an ion beam Feb. 28, 1995
5393986 Ion implantation apparatus Feb. 28, 1995
5389793 Apparatus and methods for ion implantation Feb. 14, 1995
5384465 Spectrum analyzer in an ion implanter Jan. 24, 1995
5382803 Ion injection device Jan. 17, 1995
5378899 Ion implantation target charge control system Jan. 3, 1995
5378917 Particle-beam imaging system Jan. 3, 1995
5376791 Secondary ion mass spectometry system Dec. 27, 1994
5373164 Ion beam conical scanning system Dec. 13, 1994
5357116 Focused ion beam processing with charge control Oct. 18, 1994
5357115 Processing method for wafers Oct. 18, 1994
5354986 Ion implantation apparatus Oct. 11, 1994
5352899 Method and apparatus for fabricating a device/circuit pattern by a converging atomic beam Oct. 4, 1994
5350920 Ion beam analyzing apparatus Sep. 27, 1994
5350926 Compact high current broad beam ion implanter Sep. 27, 1994
5349196 Ion implanting apparatus Sep. 20, 1994
5343047 Ion implantation system Aug. 30, 1994
5338940 Apparatus for ion implantation including contactless cooling and beam current measurement means Aug. 16, 1994
5333495 Method and apparatus for processing a minute portion of a specimen Aug. 2, 1994
5331172 Ionized metal cluster beam systems and methods Jul. 19, 1994
5326980 Ion implanter with plural surface potential sensors Jul. 5, 1994
5326981 Electron beam excited ion irradiation apparatus Jul. 5, 1994
5319212 Method of monitoring ion beam current in ion implantation apparatus for use in manufacturing semiconductors Jun. 7, 1994
5315121 Metal ion source and a method of producing metal ions May. 24, 1994
5315118 Dual ion injector for tandem accelerators May. 24, 1994
5313067 Ion processing apparatus including plasma ion source and mass spectrometer for ion deposition, ion implantation, or isotope separation May. 17, 1994
5311028 System and method for producing oscillating magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions May. 10, 1994
5308989 Fluid flow control method and apparatus for an ion implanter May. 3, 1994
5306921 Ion implantation system using optimum magnetic field for concentrating ions Apr. 26, 1994
5306920 Ion implanter with beam resolving apparatus and method for implanting ions Apr. 26, 1994
5306922 Production of high beam currents at low energies for use in ion implantation systems Apr. 26, 1994
5300891 Ion accelerator Apr. 5, 1994
5293508 Ion implanter and controlling method therefor Mar. 8, 1994
5289010 Ion purification for plasma ion implantation Feb. 22, 1994
5286978 Method of removing electric charge accumulated on a semiconductor substrate in ion implantation Feb. 15, 1994
5278420 Scanning control system involved in an ion-implantation apparatus Jan. 11, 1994
5270552 Method for separating specimen and method for analyzing the specimen separated by the specimen separating method Dec. 14, 1993
5256854 Tunable plasma method and apparatus using radio frequency heating and electron beam irradiation Oct. 26, 1993
5248886 Processing system Sep. 28, 1993

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