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Class Information
Number: 250/492.21
Name: Radiant energy > Irradiation of objects or material > Irradiation of semiconductor devices > Ion bombardment
Description: Subject matter comprising a means for irradiating a semiconductive object or material with at least one ion beam.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5661308 |
Method and apparatus for ion formation in an ion implanter |
Aug. 26, 1997 |
| 5656820 |
Ion generation device, ion irradiation device, and method of manufacturing a semiconductor device |
Aug. 12, 1997 |
| 5656811 |
Method for making specimen and apparatus thereof |
Aug. 12, 1997 |
| 5641969 |
Ion implantation apparatus |
Jun. 24, 1997 |
| 5640020 |
Ion generation device, ion irradiation device, and method of manufacturing a semiconductor device |
Jun. 17, 1997 |
| 5637879 |
Focused ion beam column with electrically variable blanking aperture |
Jun. 10, 1997 |
| 5633506 |
Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses |
May. 27, 1997 |
| 5629528 |
Charged particle beam system having beam-defining slit formed by rotating cyclinders |
May. 13, 1997 |
| 5625195 |
High-energy implantation process using an ion implanter of the low-or medium-current type and corresponding devices |
Apr. 29, 1997 |
| 5616921 |
Self-masking FIB milling |
Apr. 1, 1997 |
| 5608223 |
Ion implantation device |
Mar. 4, 1997 |
| 5591970 |
Charged beam apparatus |
Jan. 7, 1997 |
| 5587587 |
Ion implanting apparatus and ion implanting method |
Dec. 24, 1996 |
| 5583344 |
Process method and apparatus using focused ion beam generating means |
Dec. 10, 1996 |
| 5578831 |
Method and apparatus for charged particle propagation |
Nov. 26, 1996 |
| 5574280 |
Focused ion beam apparatus and method |
Nov. 12, 1996 |
| 5572038 |
Charge monitor for high potential pulse current dose measurement apparatus and method |
Nov. 5, 1996 |
| 5563418 |
Broad beam ion implanter |
Oct. 8, 1996 |
| 5554852 |
Ion implantation having increased source lifetime |
Sep. 10, 1996 |
| 5554857 |
Method and apparatus for ion beam formation in an ion implanter |
Sep. 10, 1996 |
| 5554854 |
In situ removal of contaminants from the interior surfaces of an ion beam implanter |
Sep. 10, 1996 |
| 5554853 |
Producing ion beams suitable for ion implantation and improved ion implantation apparatus and techniques |
Sep. 10, 1996 |
| 5545257 |
Magnetic filter apparatus and method for generating cold plasma in semicoductor processing |
Aug. 13, 1996 |
| 5539203 |
Single ion implantation system |
Jul. 23, 1996 |
| 5532494 |
Treatment and observation apparatus using scanning probe |
Jul. 2, 1996 |
| 5532495 |
Methods and apparatus for altering material using ion beams |
Jul. 2, 1996 |
| 5525806 |
Focused charged beam apparatus, and its processing and observation method |
Jun. 11, 1996 |
| 5525807 |
Ion implantation device |
Jun. 11, 1996 |
| 5508519 |
Mainshaft shield |
Apr. 16, 1996 |
| 5504340 |
Process method and apparatus using focused ion beam generating means |
Apr. 2, 1996 |
| 5504339 |
Method of repairing a pattern using a photomask pattern repair device |
Apr. 2, 1996 |
| 5504341 |
Producing RF electric fields suitable for accelerating atomic and molecular ions in an ion implantation system |
Apr. 2, 1996 |
| 5497006 |
Ion generating source for use in an ion implanter |
Mar. 5, 1996 |
| 5486702 |
Scan technique to reduce transient wafer temperatures during ion implantation |
Jan. 23, 1996 |
| 5481116 |
Magnetic system and method for uniformly scanning heavy ion beams |
Jan. 2, 1996 |
| 5473165 |
Method and apparatus for altering material |
Dec. 5, 1995 |
| 5466929 |
Apparatus and method for suppressing electrification of sample in charged beam irradiation apparatus |
Nov. 14, 1995 |
| 5466942 |
Charged beam irradiating apparatus having a cleaning means and a method of cleaning a charged beam irradiating apparatus |
Nov. 14, 1995 |
| 5466942 |
Charged beam irradiating apparatus having a cleaning means and a method of cleaning a charged beam irradiating apparatus |
Nov. 14, 1995 |
| 5466929 |
Apparatus and method for suppressing electrification of sample in charged beam irradiation apparatus |
Nov. 14, 1995 |
| 5457324 |
Spectrum analyzer in an ion implanter |
Oct. 10, 1995 |
| 5455426 |
Target chamber shielding |
Oct. 3, 1995 |
| 5451784 |
Composite diagnostic wafer for semiconductor wafer processing systems |
Sep. 19, 1995 |
| 5449920 |
Large area ion implantation process and apparatus |
Sep. 12, 1995 |
| 5444259 |
Plasma processing apparatus |
Aug. 22, 1995 |
| 5442185 |
Large area ion implantation process and apparatus |
Aug. 15, 1995 |
| 5440123 |
Method for preparation of transmission electron microscope sample material utilizing sheet mesh |
Aug. 8, 1995 |
| 5440132 |
Systems and methods for controlling the temperature and uniformity of a wafer during a SIMOX implantation process |
Aug. 8, 1995 |
| 5438203 |
System and method for unipolar magnetic scanning of heavy ion beams |
Aug. 1, 1995 |
| 5436460 |
Ion-optical imaging system |
Jul. 25, 1995 |
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