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Class Information
Number: 250/492.21
Name: Radiant energy > Irradiation of objects or material > Irradiation of semiconductor devices > Ion bombardment
Description: Subject matter comprising a means for irradiating a semiconductive object or material with at least one ion beam.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6020592 |
Dose monitor for plasma doping system |
Feb. 1, 2000 |
| 6005253 |
Scanning energy implantation |
Dec. 21, 1999 |
| 5998097 |
Fabrication method employing energy beam source |
Dec. 7, 1999 |
| 5998798 |
Ion dosage measurement apparatus for an ion beam implanter and method |
Dec. 7, 1999 |
| 5986274 |
Charged particle irradiation apparatus and an operating method thereof |
Nov. 16, 1999 |
| 5986264 |
Ion beam preparation device for electron microscopy |
Nov. 16, 1999 |
| 5981961 |
Apparatus and method for improved scanning efficiency in an ion implanter |
Nov. 9, 1999 |
| 5977551 |
Method capable of accurately simulating ion implantation at a high speed |
Nov. 2, 1999 |
| 5977552 |
Boron ion sources for ion implantation apparatus |
Nov. 2, 1999 |
| 5977553 |
Mechanism for preventing metallic ion contamination of a wafer in ion implantation equipment |
Nov. 2, 1999 |
| 5969366 |
Ion implanter with post mass selection deceleration |
Oct. 19, 1999 |
| 5969364 |
Wafer fixing unit for focused ion beam apparatus |
Oct. 19, 1999 |
| 5962858 |
Method of implanting low doses of ions into a substrate |
Oct. 5, 1999 |
| 5959305 |
Method and apparatus for monitoring charge neutralization operation |
Sep. 28, 1999 |
| 5952658 |
Method and system for judging milling end point for use in charged particle beam milling system |
Sep. 14, 1999 |
| 5947053 |
Wear-through detector for multilayered parts and methods of using same |
Sep. 7, 1999 |
| 5945682 |
Space-saving ion-implantation system installed both in and adjacent to a semiconductor manufacturing line |
Aug. 31, 1999 |
| 5945681 |
Ion implanting apparatus capable of preventing discharge flaw production on reverse side surface of wafer |
Aug. 31, 1999 |
| 5932881 |
Simulation method for high resolution deep impurity profile |
Aug. 3, 1999 |
| 5932882 |
Ion implanter with post mass selection deceleration |
Aug. 3, 1999 |
| 5932883 |
Ion implanter for implanting ion on wafer with low contamination |
Aug. 3, 1999 |
| 5929456 |
Ion implantation system and method adapted for serial wafer processing |
Jul. 27, 1999 |
| 5925886 |
Ion source and an ion implanting apparatus using it |
Jul. 20, 1999 |
| 5920076 |
Ion beam apparatus |
Jul. 6, 1999 |
| 5917186 |
Focused ion beam optical axis adjustment method and focused ion beam apparatus |
Jun. 29, 1999 |
| 5916424 |
Thin film magnetic recording heads and systems and methods for manufacturing the same |
Jun. 29, 1999 |
| 5918151 |
Method of manufacturing a semiconductor substrate and an apparatus for manufacturing the same |
Jun. 29, 1999 |
| 5914494 |
Arc chamber for an ion implantation system |
Jun. 22, 1999 |
| 5909031 |
Ion implanter electron shower having enhanced secondary electron emission |
Jun. 1, 1999 |
| 5907158 |
Broad range ion implanter |
May. 25, 1999 |
| 5905266 |
Charged particle beam system with optical microscope |
May. 18, 1999 |
| 5903009 |
Biased and serrated extension tube for ion implanter electron shower |
May. 11, 1999 |
| 5900443 |
Polymer surface treatment with particle beams |
May. 4, 1999 |
| 5898179 |
Method and apparatus for controlling a workpiece in a vacuum chamber |
Apr. 27, 1999 |
| 5895923 |
Ion beam shield for implantation systems |
Apr. 20, 1999 |
| 5894131 |
Exhaust apparatus in ion implantation system |
Apr. 13, 1999 |
| 5892236 |
Part for ion implantation device |
Apr. 6, 1999 |
| 5892235 |
Apparatus and method for doping |
Apr. 6, 1999 |
| 5886355 |
Ion implantation apparatus having increased source lifetime |
Mar. 23, 1999 |
| 5886356 |
Automatic supervision system on the ion beam map for ion implantation process |
Mar. 23, 1999 |
| 5883393 |
Source inner shield for eaton NV-10 high current implanter |
Mar. 16, 1999 |
| 5883391 |
Ion implantation apparatus and a method of monitoring high energy neutral contamination in an ion implantation process |
Mar. 16, 1999 |
| 5864143 |
High current ion implanter and method of ion implant by the implanter |
Jan. 26, 1999 |
| 5861226 |
Method of fabricating a resonant micromesh filter |
Jan. 19, 1999 |
| 5861632 |
Method for monitoring the performance of an ion implanter using reusable wafers |
Jan. 19, 1999 |
| 5859437 |
Intelligent supervision system with expert system for ion implantation process |
Jan. 12, 1999 |
| 5858623 |
Method for attenuating photoresist layer outgassing |
Jan. 12, 1999 |
| 5856676 |
Water-removing exhaust system for an ion implanter and a method for using the same |
Jan. 5, 1999 |
| 5856674 |
Filament for ion implanter plasma shower |
Jan. 5, 1999 |
| 5852297 |
Focused ion beam apparatus and method for irradiating focused ion beam |
Dec. 22, 1998 |
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