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Class Information
Number: 250/492.21
Name: Radiant energy > Irradiation of objects or material > Irradiation of semiconductor devices > Ion bombardment
Description: Subject matter comprising a means for irradiating a semiconductive object or material with at least one ion beam.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6580082 |
System and method for delivering cooling gas from atmospheric pressure to a high vacuum through a rotating seal in a batch ion implanter |
Jun. 17, 2003 |
| 6580072 |
Method for performing failure analysis on copper metallization |
Jun. 17, 2003 |
| 6576909 |
Ion generation chamber |
Jun. 10, 2003 |
| 6576913 |
Focused ion beam apparatus having a gas injector in which one of a plurality of nozzles can be selectively driven for elevation |
Jun. 10, 2003 |
| 6573518 |
Bi mode ion implantation with non-parallel ion beams |
Jun. 3, 2003 |
| 6573519 |
Electron beam exposure apparatus, adjusting method, and block mask for adjustment |
Jun. 3, 2003 |
| 6573516 |
Electron-beam lithography method and electron-beam lithography system |
Jun. 3, 2003 |
| 6573517 |
Ion implantation apparatus |
Jun. 3, 2003 |
| 6570171 |
Ion implanter |
May. 27, 2003 |
| 6570170 |
Total release method for sample extraction from a charged-particle instrument |
May. 27, 2003 |
| 6570169 |
Apparatus for manufacturing a semiconductor device and a method for manufacturing a semiconductor device |
May. 27, 2003 |
| 6566662 |
Charged beam exposure system |
May. 20, 2003 |
| 6565720 |
Substrate removal as a function of sputtered ions |
May. 20, 2003 |
| 6566661 |
Ion implanter with wafer angle and faraday alignment checking |
May. 20, 2003 |
| 6563125 |
Charged-particle-beam microlithography apparatus and methods for preventing coulomb effects using the hollow-beam technique |
May. 13, 2003 |
| 6559462 |
Method to reduce downtime while implanting GeF4 |
May. 6, 2003 |
| 6559461 |
Wafer scanning support unit of ion implantation apparatus |
May. 6, 2003 |
| 6554968 |
Method for measuring and controlling beam current in ion beam processing |
Apr. 29, 2003 |
| 6555830 |
Suppression of emission noise for microcolumn applications in electron beam inspection |
Apr. 29, 2003 |
| 6555832 |
Determining beam alignment in ion implantation using Rutherford Back Scattering |
Apr. 29, 2003 |
| 6555831 |
Ion implanting apparatus |
Apr. 29, 2003 |
| 6545283 |
Process of improving the whitening of a polymeric tampon applicator |
Apr. 8, 2003 |
| 6541781 |
Waveguide for microwave excitation of plasma in an ion beam guide |
Apr. 1, 2003 |
| 6534775 |
Electrostatic trap for particles entrained in an ion beam |
Mar. 18, 2003 |
| 6528804 |
Method and apparatus for low energy ion implantation |
Mar. 4, 2003 |
| 6527918 |
Method and apparatus for low voltage plasma doping using dual pulses |
Mar. 4, 2003 |
| 6526909 |
Biased ion beam deposition of high density carbon |
Mar. 4, 2003 |
| 6528805 |
Dose monitor for plasma doping system |
Mar. 4, 2003 |
| 6525327 |
Ion implanter and beam stop therefor |
Feb. 25, 2003 |
| 6525326 |
System and method for removing particles entrained in an ion beam |
Feb. 25, 2003 |
| 6521902 |
Process for minimizing electrostatic damage and pole tip recession of magnetoresistive magnetic recording head during pole tip trimming by focused ion beam milling |
Feb. 18, 2003 |
| 6518571 |
Through-the-substrate investigation of flip-chip IC's |
Feb. 11, 2003 |
| 6515290 |
Bulk gas delivery system for ion implanters |
Feb. 4, 2003 |
| 6515288 |
Vacuum bearing structure and a method of supporting a movable member |
Feb. 4, 2003 |
| 6507033 |
Versatile, high-sensitivity faraday cup array for ion implanters |
Jan. 14, 2003 |
| 6504159 |
SOI plasma source ion implantation |
Jan. 7, 2003 |
| 6501080 |
Ion implanting apparatus and sample processing apparatus |
Dec. 31, 2002 |
| 6501078 |
Ion extraction assembly |
Dec. 31, 2002 |
| 6501082 |
Plasma deposition apparatus and method with controller |
Dec. 31, 2002 |
| 6501081 |
Electron flood apparatus for neutralizing charge build up on a substrate during ion implantation |
Dec. 31, 2002 |
| 6495840 |
Ion-implanting method and ion-implanting apparatus |
Dec. 17, 2002 |
| 6489622 |
Apparatus for decelerating ion beams with minimal energy contamination |
Dec. 3, 2002 |
| 6486480 |
Plasma formed ion beam projection lithography system |
Nov. 26, 2002 |
| 6479830 |
Low-sputter-yield coating for hardware near laser-produced plasma |
Nov. 12, 2002 |
| 6479828 |
Method and system for icosaborane implantation |
Nov. 12, 2002 |
| 6476399 |
System and method for removing contaminant particles relative to an ion beam |
Nov. 5, 2002 |
| 6462331 |
Method for monitoring turbo pump operation in an ion implantation apparatus |
Oct. 8, 2002 |
| 6462347 |
Charge exchanger, ion implantation system comprising the charge exchanger, and method of controlling the rate at which the polarity of ions is changed |
Oct. 8, 2002 |
| 6462332 |
Particle optical apparatus |
Oct. 8, 2002 |
| 6458723 |
High temperature implant apparatus |
Oct. 1, 2002 |
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