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Class Information
Number: 250/492.21
Name: Radiant energy > Irradiation of objects or material > Irradiation of semiconductor devices > Ion bombardment
Description: Subject matter comprising a means for irradiating a semiconductive object or material with at least one ion beam.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6653029 |
Dual-focused ion beams for semiconductor image scanning and mask repair |
Nov. 25, 2003 |
| 6653803 |
Integrated resonator and amplifier system |
Nov. 25, 2003 |
| 6653644 |
Pattern exposure method and apparatus |
Nov. 25, 2003 |
| 6653643 |
Method and apparatus for improved ion acceleration in an ion implantation system |
Nov. 25, 2003 |
| 6646259 |
Method of sample preparation for transmission electron microscope analysis |
Nov. 11, 2003 |
| 6646268 |
Ion generation method and filament for ion generation apparatus |
Nov. 11, 2003 |
| 6646274 |
Lithographic projection apparatus |
Nov. 11, 2003 |
| 6646276 |
Ion implantation beam monitor |
Nov. 11, 2003 |
| 6646277 |
Charging control and dosimetry system for gas cluster ion beam |
Nov. 11, 2003 |
| 6639233 |
Apparatus for implanting an ion on a target and method for the same |
Oct. 28, 2003 |
| 6639223 |
Gaseous ion source feed for oxygen ion implantation |
Oct. 28, 2003 |
| 6639231 |
Method of obtaining a performance parameter for an ion implanter and an ion implanter employing the method |
Oct. 28, 2003 |
| 6639230 |
High-energy ion implanter for fabricating a semiconductor device |
Oct. 28, 2003 |
| 6639228 |
Method for molecular nitrogen implantation dosage monitoring |
Oct. 28, 2003 |
| 6639234 |
Method for checking beam steering in an ion beam therapy system |
Oct. 28, 2003 |
| 6639229 |
Aluminum implantation method |
Oct. 28, 2003 |
| 6635890 |
Slit double gap buncher and method for improved ion bunching in an ion implantation system |
Oct. 21, 2003 |
| 6635883 |
Gas cluster ion beam low mass ion filter |
Oct. 21, 2003 |
| 6633046 |
Method and apparatus for detecting that two moveable members are correctly positioned relatively to one another |
Oct. 14, 2003 |
| 6633047 |
Apparatus and method for introducing impurity |
Oct. 14, 2003 |
| 6630677 |
Electrostatic lens having glassy graphite electrodes |
Oct. 7, 2003 |
| 6627904 |
Ion implantation apparatus |
Sep. 30, 2003 |
| 6627363 |
Utilizing vacuum ultraviolet (VUV) exposure to remove halos of carbon deposition in clear reticle repair |
Sep. 30, 2003 |
| 6627874 |
Pressure measurement using ion beam current in a mass spectrometer |
Sep. 30, 2003 |
| 6624584 |
Particle source for producing excited particles |
Sep. 23, 2003 |
| 6621085 |
Device for the precision rotation of samples |
Sep. 16, 2003 |
| 6617593 |
Ion implantation system |
Sep. 9, 2003 |
| 6617594 |
Method and device for ion implanting |
Sep. 9, 2003 |
| 6617592 |
Charged particle beam system and chamber of charged particle beam system |
Sep. 9, 2003 |
| 6614190 |
Ion implanter |
Sep. 2, 2003 |
| 6614034 |
Charged-particle-beam microlithography apparatus and methods including shielding of the beam from extraneous magnetic fields |
Sep. 2, 2003 |
| 6614033 |
Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes |
Sep. 2, 2003 |
| 6610989 |
Proximity effect correction method for charged particle beam exposure |
Aug. 26, 2003 |
| 6610988 |
Charged particle beam drawing apparatus and charged particle beam drawing method |
Aug. 26, 2003 |
| 6610987 |
Apparatus and method of ion beam processing |
Aug. 26, 2003 |
| 6608313 |
Methods and devices for achieving alignment of a beam-propagation axis with a center of an aperture in a charged-particle-beam optical system |
Aug. 19, 2003 |
| 6608315 |
Mechanism for prevention of neutron radiation in ion implanter beamline |
Aug. 19, 2003 |
| 6608316 |
Ion implantation beam monitor |
Aug. 19, 2003 |
| 6605812 |
Method reducing the effects of N2 gas contamination in an ion implanter |
Aug. 12, 2003 |
| 6603130 |
Gas bearings for use with vacuum chambers and their application in lithographic projection apparatuses |
Aug. 5, 2003 |
| 6600164 |
Method of operating an ion beam therapy system with monitoring of beam position |
Jul. 29, 2003 |
| 6600163 |
In-process wafer charge monitor and control system for ion implanter |
Jul. 29, 2003 |
| 6597001 |
Method of electron-beam exposure and mask and electron-beam exposure system used therein |
Jul. 22, 2003 |
| 6593583 |
Ion beam processing position correction method |
Jul. 15, 2003 |
| 6586755 |
Feed-forward control of TCI doping for improving mass-production-wise statistical distribution of critical performance parameters in semiconductor devices |
Jul. 1, 2003 |
| 6583429 |
Method and apparatus for improved ion bunching in an ion implantation system |
Jun. 24, 2003 |
| 6583426 |
Projection ion beam machining apparatus |
Jun. 24, 2003 |
| 6583427 |
Extended life source arc chamber liners |
Jun. 24, 2003 |
| 6583428 |
Apparatus for the backside gas cooling of a wafer in a batch ion implantation system |
Jun. 24, 2003 |
| 6580083 |
High efficiency scanning in ion implanters |
Jun. 17, 2003 |
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