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Class Information
Number: 250/492.21
Name: Radiant energy > Irradiation of objects or material > Irradiation of semiconductor devices > Ion bombardment
Description: Subject matter comprising a means for irradiating a semiconductive object or material with at least one ion beam.


Patents under this class:

Patent Number Title Of Patent Date Issued
7619229 Technique for matching performance of ion implantation devices using an in-situ mask Nov. 17, 2009
7619228 Technique for improved ion beam transport Nov. 17, 2009
7619224 Generation, acceleration, focusing and collection of a high-brightness, space-charge-dominated circular charged-particle beam Nov. 17, 2009
7619223 Beam current measuring instrument and beam current measuring method using same Nov. 17, 2009
7615764 Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method, and cross section working apparatus Nov. 10, 2009
7615763 System for magnetic scanning and correction of an ion beam Nov. 10, 2009
7612351 Ion implanter with function of compensating wafer cut angle and ion implantation method using the same Nov. 3, 2009
7612337 Focused ion beam system and a method of sample preparation and observation Nov. 3, 2009
7611975 Method of implanting a substrate and an ion implanter for performing the method Nov. 3, 2009
7608843 Method and apparatus for scanning a workpiece through an ion beam Oct. 27, 2009
7605382 Ion implanter Oct. 20, 2009
7601976 Dual beam system Oct. 13, 2009
7598505 Multichannel ion gun Oct. 6, 2009
7598499 Charged-particle exposure apparatus Oct. 6, 2009
7598495 Methods and systems for trapping ion beam particles and focusing an ion beam Oct. 6, 2009
7592606 Manufacturing equipment using ION beam or electron beam Sep. 22, 2009
7592604 Charged particle beam apparatus Sep. 22, 2009
7590966 Data path for high performance pattern generator Sep. 15, 2009
7589334 Ion beam delivery equipment and an ion beam delivery method Sep. 15, 2009
7589333 Methods for rapidly switching off an ion beam Sep. 15, 2009
7589328 Gas field ION source for multiple applications Sep. 15, 2009
7586111 Ion implanter having combined hybrid and double mechanical scan architecture Sep. 8, 2009
7586110 Techniques for detecting ion beam contamination in an ion implantation system and interlocking same Sep. 8, 2009
7586109 Technique for improving the performance and extending the lifetime of an ion source with gas dilution Sep. 8, 2009
7586101 Ion sources for ion implantation apparatus Sep. 8, 2009
7582883 Method of scanning a substrate in an ion implanter Sep. 1, 2009
7579605 Multi-purpose electrostatic lens for an ion implanter system Aug. 25, 2009
7579604 Beam stop and beam tuning methods Aug. 25, 2009
7579602 Ion implantation with a collimator magnet and a neutral filter magnet Aug. 25, 2009
7579590 Method of measuring thin layers using SIMS Aug. 25, 2009
7576342 Ion beam delivery equipment and ion beam delivery method Aug. 18, 2009
7576340 Focused ion beam processing method Aug. 18, 2009
7576339 Ion implantation apparatus and method for obtaining non-uniform ion implantation energy Aug. 18, 2009
7573051 Ion beam guide tube Aug. 11, 2009
7573047 Wafer holder and sample producing apparatus using it Aug. 11, 2009
7566887 Method of reducing particle contamination for ion implanters Jul. 28, 2009
7566886 Throughput enhancement for scanned beam ion implanters Jul. 28, 2009
7566882 Reflection lithography using rotating platter Jul. 28, 2009
7564048 Automated faraday sensor test system Jul. 21, 2009
7564042 Ion beam apparatus having plasma sheath controller Jul. 21, 2009
7560712 Ion implanter with etch prevention member(s) Jul. 14, 2009
7560705 Workpiece handling scan arm for ion implantation system Jul. 14, 2009
7559557 Sealing between vacuum chambers Jul. 14, 2009
7557364 Charge neutralizing device Jul. 7, 2009
7557363 Closed loop dose control for ion implantation Jul. 7, 2009
7557361 Ion sources, systems and methods Jul. 7, 2009
7557360 Ion sources, systems and methods Jul. 7, 2009
7557359 Ion sources, systems and methods Jul. 7, 2009
7557358 Ion sources, systems and methods Jul. 7, 2009
7554108 Forming a semiconductor device feature using acquired parameters Jun. 30, 2009



 
 
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