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Class Information
Number: 250/492.2
Name: Radiant energy > Irradiation of objects or material > Irradiation of semiconductor devices
Description: Subject matter wherein the object irradiated is made of, at least in part, a semiconductor material.










Sub-classes under this class:

Class Number Class Name Patents
250/492.21 Ion bombardment 1,492
250/492.22 Pattern control 1,095
250/492.24 Photocathode projection 55
250/492.23 Variable beam 408


Patents under this class:
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Patent Number Title Of Patent Date Issued
7449700 Electron beam exposure apparatus, electron beam exposure method and method of manufacturing semiconductor device Nov. 11, 2008
7449699 Method and apparatus for creating a topography at a surface Nov. 11, 2008
7446325 Reflector for generating a neutral beam and substrate processing apparatus including the same Nov. 4, 2008
7442944 Ion beam implant current, spot width and position tuning Oct. 28, 2008
7442924 Repetitive circumferential milling for sample preparation Oct. 28, 2008
7439530 LPP EUV light source drive laser system Oct. 21, 2008
7439525 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particl Oct. 21, 2008
7439502 Electron beam apparatus and device production method using the electron beam apparatus Oct. 21, 2008
7435978 System, method and a program for correcting conditions for controlling a charged particle beam for lithography and observation, and a program and method for manufacturing a semiconductor devic Oct. 14, 2008
7435977 Ion beam angle measurement systems and methods for ion implantation systems Oct. 14, 2008
7435973 Material processing system and method Oct. 14, 2008
7435960 Charged particle beam apparatus Oct. 14, 2008
7435956 Apparatus and method for inspection and testing of flat panel display substrates Oct. 14, 2008
7432513 Gas shower, lithographic apparatus and use of a gas shower Oct. 7, 2008
7429740 Electric-magnetic field-generating element and assembling method for same Sep. 30, 2008
7427765 Electron beam column for writing shaped electron beams Sep. 23, 2008
7427764 Laser crystallization apparatus and laser crystallization method Sep. 23, 2008
7425715 Digital parallel electron beam lithography stamp Sep. 16, 2008
7425714 Measurement method of electron beam current, electron beam writing system and electron beam detector Sep. 16, 2008
7425713 Synchronous raster scanning lithographic system Sep. 16, 2008
7423275 Erosion mitigation for collector optics using electric and magnetic fields Sep. 9, 2008
7423266 Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus Sep. 9, 2008
7420191 Discharge radiation source, in particular UV radiation Sep. 2, 2008
7420190 Length measurement pattern, semiconductor device, and method of manufacturing a semiconductor device Sep. 2, 2008
7420188 Exposure method and apparatus for immersion lithography Sep. 2, 2008
7417242 Method of measuring ion beam position Aug. 26, 2008
7417241 Ion implantation method and method for manufacturing semiconductor device Aug. 26, 2008
7417236 Sheet beam-type testing apparatus Aug. 26, 2008
7417234 Spatial-phase locking of energy beams for determining two-dimensional location and beam shape Aug. 26, 2008
7414700 Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithograph Aug. 19, 2008
7414251 Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system Aug. 19, 2008
7414240 Particle remover, exposure apparatus having the same, and device manufacturing method Aug. 19, 2008
7411651 PSM alignment method and device Aug. 12, 2008
7411201 Projection objective for a microlithographic projection exposure apparatus Aug. 12, 2008
7405809 Illumination system particularly for microlithography Jul. 29, 2008
7405416 Method and apparatus for EUV plasma source target delivery Jul. 29, 2008
7405414 Method and apparatus for patterning a workpiece Jul. 29, 2008
7405413 Arrangement for providing target material for the generation of short-wavelength electromagnetic radiation Jul. 29, 2008
7402821 Application of digital frequency and phase synthesis for control of electrode voltage phase in a high-energy ion implantation machine, and a means for accurate calibration of electrode voltage Jul. 22, 2008
7400699 Illumination system with raster elements of different sizes Jul. 15, 2008
7400383 Environmental control in a reticle SMIF pod Jul. 15, 2008
7399979 Exposure method, exposure apparatus, and method for producing device Jul. 15, 2008
7397538 Radiation system and lithographic apparatus Jul. 8, 2008
7397056 Lithographic apparatus, contaminant trap, and device manufacturing method Jul. 8, 2008
7397049 Determining ion beam parallelism using refraction method Jul. 8, 2008
7397047 Technique for tuning an ion implanter system Jul. 8, 2008
7397045 Exposure apparatus and method thereof Jul. 8, 2008
7394080 Mask superposition for multiple exposures Jul. 1, 2008
7394078 Technique for ion beam angle spread control for advanced applications Jul. 1, 2008
7394070 Method and apparatus for inspecting patterns Jul. 1, 2008

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