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Class Information
Number: 250/492.2
Name: Radiant energy > Irradiation of objects or material > Irradiation of semiconductor devices
Description: Subject matter wherein the object irradiated is made of, at least in part, a semiconductor material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7459705 |
Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure de |
Dec. 2, 2008 |
| 7459704 |
Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms |
Dec. 2, 2008 |
| 7459702 |
Apparatus and method for polishing gemstones and the like |
Dec. 2, 2008 |
| 7459701 |
Stage apparatus, lithographic apparatus and device manufacturing method |
Dec. 2, 2008 |
| 7459699 |
Method of determining processing position in charged particle beam apparatus, and infrared microscope used in the method |
Dec. 2, 2008 |
| 7459683 |
Charged particle beam device with DF-STEM image valuation method |
Dec. 2, 2008 |
| RE40586 |
Reduced striae extreme ultra violet elements |
Nov. 25, 2008 |
| 7456408 |
Illumination system particularly for microlithography |
Nov. 25, 2008 |
| 7453074 |
Ion implanter with ionization chamber electrode design |
Nov. 18, 2008 |
| 7453072 |
Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor |
Nov. 18, 2008 |
| 7453071 |
Contamination barrier and lithographic apparatus comprising same |
Nov. 18, 2008 |
| 7453063 |
Calibration substrate and method for calibrating a lithographic apparatus |
Nov. 18, 2008 |
| 7453059 |
Technique for monitoring and controlling a plasma process |
Nov. 18, 2008 |
| 7449700 |
Electron beam exposure apparatus, electron beam exposure method and method of manufacturing semiconductor device |
Nov. 11, 2008 |
| 7449699 |
Method and apparatus for creating a topography at a surface |
Nov. 11, 2008 |
| 7446325 |
Reflector for generating a neutral beam and substrate processing apparatus including the same |
Nov. 4, 2008 |
| 7442944 |
Ion beam implant current, spot width and position tuning |
Oct. 28, 2008 |
| 7442924 |
Repetitive circumferential milling for sample preparation |
Oct. 28, 2008 |
| 7439530 |
LPP EUV light source drive laser system |
Oct. 21, 2008 |
| 7439525 |
Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particl |
Oct. 21, 2008 |
| 7439502 |
Electron beam apparatus and device production method using the electron beam apparatus |
Oct. 21, 2008 |
| 7435978 |
System, method and a program for correcting conditions for controlling a charged particle beam for lithography and observation, and a program and method for manufacturing a semiconductor devic |
Oct. 14, 2008 |
| 7435977 |
Ion beam angle measurement systems and methods for ion implantation systems |
Oct. 14, 2008 |
| 7435973 |
Material processing system and method |
Oct. 14, 2008 |
| 7435960 |
Charged particle beam apparatus |
Oct. 14, 2008 |
| 7435956 |
Apparatus and method for inspection and testing of flat panel display substrates |
Oct. 14, 2008 |
| 7432513 |
Gas shower, lithographic apparatus and use of a gas shower |
Oct. 7, 2008 |
| 7429740 |
Electric-magnetic field-generating element and assembling method for same |
Sep. 30, 2008 |
| 7427765 |
Electron beam column for writing shaped electron beams |
Sep. 23, 2008 |
| 7427764 |
Laser crystallization apparatus and laser crystallization method |
Sep. 23, 2008 |
| 7425715 |
Digital parallel electron beam lithography stamp |
Sep. 16, 2008 |
| 7425714 |
Measurement method of electron beam current, electron beam writing system and electron beam detector |
Sep. 16, 2008 |
| 7425713 |
Synchronous raster scanning lithographic system |
Sep. 16, 2008 |
| 7423275 |
Erosion mitigation for collector optics using electric and magnetic fields |
Sep. 9, 2008 |
| 7423266 |
Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus |
Sep. 9, 2008 |
| 7420191 |
Discharge radiation source, in particular UV radiation |
Sep. 2, 2008 |
| 7420190 |
Length measurement pattern, semiconductor device, and method of manufacturing a semiconductor device |
Sep. 2, 2008 |
| 7420188 |
Exposure method and apparatus for immersion lithography |
Sep. 2, 2008 |
| 7417242 |
Method of measuring ion beam position |
Aug. 26, 2008 |
| 7417241 |
Ion implantation method and method for manufacturing semiconductor device |
Aug. 26, 2008 |
| 7417236 |
Sheet beam-type testing apparatus |
Aug. 26, 2008 |
| 7417234 |
Spatial-phase locking of energy beams for determining two-dimensional location and beam shape |
Aug. 26, 2008 |
| 7414700 |
Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithograph |
Aug. 19, 2008 |
| 7414251 |
Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system |
Aug. 19, 2008 |
| 7414240 |
Particle remover, exposure apparatus having the same, and device manufacturing method |
Aug. 19, 2008 |
| 7411651 |
PSM alignment method and device |
Aug. 12, 2008 |
| 7411201 |
Projection objective for a microlithographic projection exposure apparatus |
Aug. 12, 2008 |
| 7405809 |
Illumination system particularly for microlithography |
Jul. 29, 2008 |
| 7405416 |
Method and apparatus for EUV plasma source target delivery |
Jul. 29, 2008 |
| 7405414 |
Method and apparatus for patterning a workpiece |
Jul. 29, 2008 |
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