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Class Information
Number: 250/491.1
Name: Radiant energy > Means to align or position an object relative to a source or detector
Description: Subject matter wherein means are provided to relatively immobilize the object in at least one direction or to provide an indication of the location of the object relative to the source or detector or their support.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7459701 |
Stage apparatus, lithographic apparatus and device manufacturing method |
Dec. 2, 2008 |
| 7459699 |
Method of determining processing position in charged particle beam apparatus, and infrared microscope used in the method |
Dec. 2, 2008 |
| 7456414 |
Beam re-registration system and method |
Nov. 25, 2008 |
| 7453070 |
Methods and apparatus for beam density measurement in two dimensions |
Nov. 18, 2008 |
| 7453077 |
EUV light source |
Nov. 18, 2008 |
| 7449699 |
Method and apparatus for creating a topography at a surface |
Nov. 11, 2008 |
| 7446328 |
Patient alignment system with external measurement and object coordination for radiation therapy system |
Nov. 4, 2008 |
| 7442946 |
Nonuniform ion implantation apparatus and method using a wide beam |
Oct. 28, 2008 |
| 7439525 |
Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particl |
Oct. 21, 2008 |
| 7439527 |
Ion beam irradiation apparatus |
Oct. 21, 2008 |
| 7439505 |
Scanning electron microscope |
Oct. 21, 2008 |
| 7435959 |
Microstructured pattern inspection method |
Oct. 14, 2008 |
| 7432515 |
Charged particle beam lithography apparatus and method |
Oct. 7, 2008 |
| 7429733 |
Method and sample for radiation microscopy including a particle beam channel formed in the sample source |
Sep. 30, 2008 |
| 7425713 |
Synchronous raster scanning lithographic system |
Sep. 16, 2008 |
| 7423266 |
Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus |
Sep. 9, 2008 |
| 7423274 |
Electron beam writing system and electron beam writing method |
Sep. 9, 2008 |
| 7417242 |
Method of measuring ion beam position |
Aug. 26, 2008 |
| 7417234 |
Spatial-phase locking of energy beams for determining two-dimensional location and beam shape |
Aug. 26, 2008 |
| 7406263 |
Combined wavefront sensor and data detector for a free space optical communications system with adaptive optics |
Jul. 29, 2008 |
| 7402816 |
Electron injection in ion implanter magnets |
Jul. 22, 2008 |
| 7397049 |
Determining ion beam parallelism using refraction method |
Jul. 8, 2008 |
| 7394080 |
Mask superposition for multiple exposures |
Jul. 1, 2008 |
| 7394073 |
Methods and apparatus for ion beam angle measurement in two dimensions |
Jul. 1, 2008 |
| 7390124 |
Device for contact-free measurement of temperature |
Jun. 24, 2008 |
| 7391038 |
Technique for isocentric ion beam scanning |
Jun. 24, 2008 |
| 7391039 |
Semiconductor processing method and system |
Jun. 24, 2008 |
| 7388213 |
Method of registering a blank substrate to a pattern generating particle beam apparatus and of correcting alignment during pattern generation |
Jun. 17, 2008 |
| 7385205 |
Method and device for aligning a charged particle beam column |
Jun. 10, 2008 |
| 7382914 |
Method for aligning two objects, method for detecting superimposing state of two objects, and apparatus for aligning two objects |
Jun. 3, 2008 |
| 7381975 |
In plane drift compensation |
Jun. 3, 2008 |
| 7381949 |
Method and apparatus for simultaneously depositing and observing materials on a target |
Jun. 3, 2008 |
| 7379153 |
Lithographic apparatus and device manufacturing method |
May. 27, 2008 |
| 7372049 |
Lithographic apparatus including a cleaning device and method for cleaning an optical element |
May. 13, 2008 |
| 7372047 |
Charged particle system and a method for measuring image magnification |
May. 13, 2008 |
| 7372016 |
Calibration standard for a dual beam (FIB/SEM) machine |
May. 13, 2008 |
| 7365325 |
Method and apparatus for observing a specimen |
Apr. 29, 2008 |
| 7361909 |
Method and apparatus for correcting drift during automated FIB processing |
Apr. 22, 2008 |
| 7361898 |
Scanning electron microscope and CD measurement calibration standard specimen |
Apr. 22, 2008 |
| 7358495 |
Standard reference for metrology and calibration method of electron-beam metrology system using the same |
Apr. 15, 2008 |
| 7355187 |
Position detection apparatus, position detection method, exposure apparatus, device manufacturing method, and substrate |
Apr. 8, 2008 |
| 7351374 |
Surface plasmon enhanced illumination apparatus having non-periodic resonance configurations |
Apr. 1, 2008 |
| 7348574 |
Position measurement system and lithographic apparatus |
Mar. 25, 2008 |
| 7345289 |
Sample support prepared by semiconductor silicon process technique |
Mar. 18, 2008 |
| 7337685 |
Adjustable device |
Mar. 4, 2008 |
| 7335893 |
Method and device for aligning a charged particle beam column |
Feb. 26, 2008 |
| 7332729 |
System and method for multiple electron, ion, and photon beam alignment |
Feb. 19, 2008 |
| 7332730 |
Device and method for imaging a multiple particle beam on a substrate |
Feb. 19, 2008 |
| 7329881 |
Charged-particle beam system |
Feb. 12, 2008 |
| 7326940 |
Exposure apparatus, exposure method and semiconductor device production method |
Feb. 5, 2008 |
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