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Class Information
Number: 250/426
Name: Radiant energy > Ion generation > Arc type
Description: Subject matter wherein the means to remove or add electrons comprises an electrical space discharge between at least two electrodes caused by an electrical potential difference between the electrodes in excess of the breakdown voltage of the space between them.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7459704 |
Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms |
Dec. 2, 2008 |
| 7442941 |
Ion generator |
Oct. 28, 2008 |
| 7439521 |
Ion source with removable anode assembly |
Oct. 21, 2008 |
| 7435982 |
Laser-driven light source |
Oct. 14, 2008 |
| 7425709 |
Modular ion source |
Sep. 16, 2008 |
| 7425711 |
Thermal control plate for ion source |
Sep. 16, 2008 |
| 7423261 |
Curved conduit ion sampling device and method |
Sep. 9, 2008 |
| 7420191 |
Discharge radiation source, in particular UV radiation |
Sep. 2, 2008 |
| 7405411 |
Ion source with multi-piece outer cathode |
Jul. 29, 2008 |
| 7397048 |
Technique for boron implantation |
Jul. 8, 2008 |
| 7388195 |
Apparatus and systems for processing samples for analysis via ion mobility spectrometry |
Jun. 17, 2008 |
| 7365339 |
Ion source |
Apr. 29, 2008 |
| 7342236 |
Fluid-cooled ion source |
Mar. 11, 2008 |
| 7339181 |
High flux, high energy photon source |
Mar. 4, 2008 |
| 7301160 |
Ion sources |
Nov. 27, 2007 |
| 7223984 |
Helium ion generation method and apparatus |
May. 29, 2007 |
| 7196337 |
Particle processing apparatus and methods |
Mar. 27, 2007 |
| 7170070 |
Ion implanters having an arc chamber that affects ion current density |
Jan. 30, 2007 |
| 7157704 |
Corona discharge electrode and method of operating the same |
Jan. 2, 2007 |
| 7102139 |
Source arc chamber for ion implanter having repeller electrode mounted to external insulator |
Sep. 5, 2006 |
| 7098462 |
Microfabricated device for selectively removing and analyzing airborne particulates from an air stream |
Aug. 29, 2006 |
| 7053333 |
Vacuum arc plasma thrusters with inductive energy storage driver |
May. 30, 2006 |
| 7022999 |
Ion implantation ion source, system and method |
Apr. 4, 2006 |
| 6998626 |
Method of producing a dopant gas species |
Feb. 14, 2006 |
| 6987364 |
Floating mode ion source |
Jan. 17, 2006 |
| 6906469 |
Radio frequency ion source with maneuverable electrode(s) |
Jun. 14, 2005 |
| 6878946 |
Indirectly heated button cathode for an ion source |
Apr. 12, 2005 |
| 6847043 |
Ion sources for ion implantation apparatus |
Jan. 25, 2005 |
| 6815690 |
Ion beam source with coated electrode(s) |
Nov. 9, 2004 |
| 6787781 |
Arc chamber filament for ion implanter |
Sep. 7, 2004 |
| 6756596 |
Filtered ion source |
Jun. 29, 2004 |
| 6686601 |
Ion sources for ion implantation apparatus |
Feb. 3, 2004 |
| 6661178 |
Metastable atom bombardment source |
Dec. 9, 2003 |
| 6639223 |
Gaseous ion source feed for oxygen ion implantation |
Oct. 28, 2003 |
| 6583427 |
Extended life source arc chamber liners |
Jun. 24, 2003 |
| 6576909 |
Ion generation chamber |
Jun. 10, 2003 |
| 6548817 |
Miniaturized cathodic arc plasma source |
Apr. 15, 2003 |
| 6465793 |
Arc initiation in cathodic arc plasma sources |
Oct. 15, 2002 |
| 6356026 |
Ion implant source with multiple indirectly-heated electron sources |
Mar. 12, 2002 |
| 6300636 |
Ion source head |
Oct. 9, 2001 |
| 6246059 |
Ion-beam source with virtual anode |
Jun. 12, 2001 |
| 6124675 |
Metastable atom bombardment source |
Sep. 26, 2000 |
| 5892232 |
Arc chamber for ion implanter |
Apr. 6, 1999 |
| 5886355 |
Ion implantation apparatus having increased source lifetime |
Mar. 23, 1999 |
| 5877593 |
Distorted field radio frequency ion source |
Mar. 2, 1999 |
| 5840163 |
Rectangular vacuum-arc plasma source |
Nov. 24, 1998 |
| 5640020 |
Ion generation device, ion irradiation device, and method of manufacturing a semiconductor device |
Jun. 17, 1997 |
| 5604350 |
Fitting for an ion source assembly |
Feb. 18, 1997 |
| 5554852 |
Ion implantation having increased source lifetime |
Sep. 10, 1996 |
| 5517077 |
Ion implantation having increased source lifetime |
May. 14, 1996 |
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