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Class Information
Number: 250/400
Name: Radiant energy > With charged particle beam deflection or focussing > With target means > With means to convey or guide the target
Description: Subject matter combined with means to move the material irradiated to, through, within or from the beam path or to cause a moving material to move to, through, within or from the beam path.










Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8674318 Particle beam irradiation apparatus and particle beam therapy system Mar. 18, 2014
8610093 Direct write lithography system Dec. 17, 2013
8575563 Compact isocentric gantry Nov. 5, 2013
8481959 Apparatus and method for multi-directionally scanning a beam of charged particles Jul. 9, 2013
8481964 Charged particle beam drawing apparatus and method Jul. 9, 2013
8466428 Particle beam irradiation apparatus and particle beam therapy system Jun. 18, 2013
8410440 Specimen observation method Apr. 2, 2013
8399851 Systems and methods for scanning a beam of charged particles Mar. 19, 2013
8193511 Method of calibrating beam position in charged-particle beam system Jun. 5, 2012
8193512 Irradiation field forming device Jun. 5, 2012
8168962 Method and apparatus for uniformly implanting a wafer with an ion beam May. 1, 2012
8164058 Specimen observation method Apr. 24, 2012
8153991 Direct write lithography system Apr. 10, 2012
8039813 Charged particle-optical systems, methods and components Oct. 18, 2011
7800084 System and method for charged-particle beam lithography Sep. 21, 2010
7741614 Lithography system and lithography method using the same Jun. 22, 2010
7737423 Central dryer for electron beam curing Jun. 15, 2010
7732786 Coupling energy in a plasmon wave to an electron beam Jun. 8, 2010
7700930 Lithographic apparatus with rotation filter device Apr. 20, 2010
7688942 Element analysis device Mar. 30, 2010
7679068 Method of calculating deflection aberration correcting voltage and charged particle beam writing method Mar. 16, 2010
7667208 Technique for confining secondary electrons in plasma-based ion implantation Feb. 23, 2010
7663124 Beam recording method and device Feb. 16, 2010
7655923 Spherical aberration corrected electrostatic lens, input lens, electron spectrometer, photoemission electron microscope and measuring system Feb. 2, 2010
7626179 Electron beam induced resonance Dec. 1, 2009
7608838 Electron optical component Oct. 27, 2009
7598504 Writing error diagnosis method for charged particle beam photolithography apparatus and charged particle beam photolithography apparatus Oct. 6, 2009
7579604 Beam stop and beam tuning methods Aug. 25, 2009
7573053 Polarized pulsed front-end beam source for electron microscope Aug. 11, 2009
7573030 Specimen observation method Aug. 11, 2009
7569836 Transmission of data between microchips using a particle beam Aug. 4, 2009
7566882 Reflection lithography using rotating platter Jul. 28, 2009
7547898 Particulate prevention in ion implantation Jun. 16, 2009
7547899 Charged beam dump and particle attractor Jun. 16, 2009
7528392 Techniques for low-temperature ion implantation May. 5, 2009
7528393 Charged particle beam processing apparatus May. 5, 2009
7521674 Method for trapping uncharged multi-pole particles Apr. 21, 2009
7511288 Ion implantation device Mar. 31, 2009
7504642 Photoluminescence imaging with preferential detection of photoluminescence signals emitted from a specified material layer of a wafer or other workpiece Mar. 17, 2009
7501625 Electron microscope application apparatus and sample inspection method Mar. 10, 2009
7491933 Electron beam apparatus Feb. 17, 2009
7485874 Apparatus for manufacturing semiconductor substrates Feb. 3, 2009
7473909 Use of ion induced luminescence (IIL) as feedback control for ion implantation Jan. 6, 2009
7459692 Electron confinement inside magnet of ion implanter Dec. 2, 2008
7435969 Method of manufacturing electrostatic deflector, and electrostatic deflector Oct. 14, 2008
7423276 Irradiation system with ion beam/charged particle beam Sep. 9, 2008
7397026 Efficient electron transfer dissociation for mass spectrometry Jul. 8, 2008
7397039 Real-time compensation of mechanical position error in pattern generation or imaging applications Jul. 8, 2008
7385185 Molecular activation for tandem mass spectroscopy Jun. 10, 2008
7385203 Charged particle beam extraction system and method Jun. 10, 2008

1 2 3










 
 
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