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Class Information
Number: 250/398
Name: Radiant energy > With charged particle beam deflection or focussing > With target means
Description: Subject matter having means to hold, position or accommodate an object to be irradiated by the beam, or such an object itself in combination with the lens.

Sub-classes under this class:

Class Number Class Name Patents
250/399 Secondary emissive type 110
250/400 With means to convey or guide the target 118

Patents under this class:

Patent Number Title Of Patent Date Issued
6900443 Charged particle beam device for inspecting or structuring a specimen May. 31, 2005
6900444 Adjustable implantation angle workpiece support structure for an ion beam implanter May. 31, 2005
6897454 Energy beam exposure method and exposure apparatus May. 24, 2005
6897457 Apparatus and method for monitoring and tuning an ion beam in ion implantation apparatus May. 24, 2005
6897458 Electron beam exposure system May. 24, 2005
6894435 Method and device for rastering source redundancy May. 17, 2005
6891169 Electron beam array write head system and method May. 10, 2005
6888138 Absorption current image apparatus in electron microscope May. 3, 2005
6888139 Electron microscope May. 3, 2005
6888146 Maskless micro-ion-beam reduction lithography system May. 3, 2005
6885012 Convergent charged particle beam apparatus and inspection method using same Apr. 26, 2005
6885014 Symmetric beamline and methods for generating a mass-analyzed ribbon ion beam Apr. 26, 2005
6881970 Charged particle beam irradiation equipment and control method thereof Apr. 19, 2005
6872942 High-speed inspection of flat substrates with underlying visible topology Mar. 29, 2005
6870171 Exposure apparatus Mar. 22, 2005
6867414 Electric sector time-of-flight mass spectrometer with adjustable ion optical elements Mar. 15, 2005
6861651 Electron-optical corrector for eliminating third-order aberations Mar. 1, 2005
6858843 Immersion objective lens for e-beam inspection Feb. 22, 2005
6855481 Apparatus and a method for forming a pattern using a crystal structure of material Feb. 15, 2005
6855926 Instrument and method for combined surface topography and spectroscopic analysis Feb. 15, 2005
6855931 Scanning electron microscope and sample observation method using the same Feb. 15, 2005
6855938 Objective lens for an electron microscopy system and electron microscopy system Feb. 15, 2005
6855939 Particle beam system having a mirror corrector Feb. 15, 2005
6852984 Advanced ion beam measurement tool for an ion implantation apparatus Feb. 8, 2005
6849856 Electron beam duplication lithography method and apparatus Feb. 1, 2005
6841789 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam Jan. 11, 2005
6835941 Stage unit and its making method, and exposure apparatus and its making method Dec. 28, 2004
6833552 System and method for implanting a wafer with an ion beam Dec. 21, 2004
6831282 Methods and devices for evaluating beam blur in a charged-particle-beam microlithography apparatus Dec. 14, 2004
6831284 Large area source for uniform electron beam generation Dec. 14, 2004
6825476 Column for a charged particle beam device Nov. 30, 2004
6825480 Charged particle beam apparatus and automatic astigmatism adjustment method Nov. 30, 2004
6822241 Emitter device with focusing columns Nov. 23, 2004
6822248 Spatial phase locking with shaped electron beam lithography Nov. 23, 2004
6818906 Electron beam position reference system Nov. 16, 2004
6815689 Mass spectrometry with enhanced particle flux range Nov. 9, 2004
6815693 Charged-particle-beam microlithography apparatus and methods including proximity-effect correction Nov. 9, 2004
6803582 One dimensional beam blanker array Oct. 12, 2004
6803584 Electron beam control device Oct. 12, 2004
6803591 Medical particle irradiation apparatus Oct. 12, 2004
6800863 Method for monitoring an ion implanter and ion implanter having a shadow jig for performing the same Oct. 5, 2004
6800866 Accelerator system and medical accelerator facility Oct. 5, 2004
6797962 Electrostatic corrector for eliminating the chromatic aberration of particle lenses Sep. 28, 2004
6791094 Method and apparatus for determining beam parallelism and direction Sep. 14, 2004
6787780 Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method of a semiconductor device Sep. 7, 2004
6784426 Electron beam irradiation apparatus, electron beam exposure apparatus, and defect detection method Aug. 31, 2004
6784442 Exposure apparatus, control method thereof, and device manufacturing method Aug. 31, 2004
6781140 Method of and machine for pattern writing by an electron beam Aug. 24, 2004
6781141 Method and structure for detection and measurement of electrical and mechanical resonance associated with an E-beam lithography tool Aug. 24, 2004
6774372 Electron-optical lens arrangement with an axis that can be largely displaced Aug. 10, 2004

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