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Class Information
Number: 250/398
Name: Radiant energy > With charged particle beam deflection or focussing > With target means
Description: Subject matter having means to hold, position or accommodate an object to be irradiated by the beam, or such an object itself in combination with the lens.

Sub-classes under this class:

Class Number Class Name Patents
250/399 Secondary emissive type 110
250/400 With means to convey or guide the target 118

Patents under this class:

Patent Number Title Of Patent Date Issued
7282702 Ion neutralizer Oct. 16, 2007
7276707 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus Oct. 2, 2007
7276690 Method and system for e-beam scanning Oct. 2, 2007
7271399 Manipulator assembly in ion implanter Sep. 18, 2007
7267520 Wafer scanning system with reciprocating rotary motion utilizing springs and counterweights Sep. 11, 2007
7262424 Particle beam therapy system Aug. 28, 2007
7253423 Technique for uniformity tuning in an ion implanter system Aug. 7, 2007
7247846 Electric sector time-of-flight mass spectrometer with adjustable ion optical elements Jul. 24, 2007
7244932 Electron beam apparatus and device fabrication method using the electron beam apparatus Jul. 17, 2007
7238956 Device for controlling an apparatus generating a charged particle beam Jul. 3, 2007
7235798 Focused ion beam apparatus Jun. 26, 2007
7235797 Method of implanting a substrate and an ion implanter for performing the method Jun. 26, 2007
7235784 Transmission electron microscope and image observation method using it Jun. 26, 2007
7230257 Electron beam exposure apparatus Jun. 12, 2007
7230240 Enhanced scanning control of charged particle beam systems Jun. 12, 2007
7223983 Charged particle beam column May. 29, 2007
7220973 Modular manipulation system for manipulating a sample under study with a microscope May. 22, 2007
7220971 Multi-pixel electron microbeam irradiator systems and methods for selectively irradiating predetermined locations May. 22, 2007
7217934 Wafer scanning device May. 15, 2007
7211811 Method for preventing wafer surface from bombardment by micro-dust particles during the ion implantation process May. 1, 2007
7205559 Electron beam apparatus and device manufacturing method using same Apr. 17, 2007
7205540 Electron beam apparatus and device manufacturing method using same Apr. 17, 2007
7196336 Apparatus for injecting plasma gas in atmosphere Mar. 27, 2007
7189979 Electron gun Mar. 13, 2007
7176470 Technique for high-efficiency ion implantation Feb. 13, 2007
7173264 Particle beam therapy system Feb. 6, 2007
7173263 Optical switching in lithography system Feb. 6, 2007
7173253 Object-moving method, object-moving apparatus, production process and produced apparatus Feb. 6, 2007
7170068 Method and system for discharging a sample Jan. 30, 2007
7166854 Uniformity control multiple tilt axes, rotating wafer and variable scan velocity Jan. 23, 2007
7161161 Uniformity control using multiple fixed wafer orientations and variable scan velocity Jan. 9, 2007
7151268 Field emission gun and electron beam instruments Dec. 19, 2006
7148479 Defect inspection apparatus, program, and manufacturing method of semiconductor device Dec. 12, 2006
7129502 Apparatus for generating a plurality of beamlets Oct. 31, 2006
7126138 Electron flood apparatus and ion implantation system Oct. 24, 2006
7122796 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same Oct. 17, 2006
7109502 Device for irradiating a target with a hadron-charged beam, use in hadrontherapy Sep. 19, 2006
7109494 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector Sep. 19, 2006
7109486 Layered electron beam column and method of use thereof Sep. 19, 2006
7109481 Matrix-assisted laser desorption and ionization (MALDI) sample plate releasably coupled to a sample plate adapter Sep. 19, 2006
7105833 Deflection system for a particle beam device Sep. 12, 2006
7091504 Electron beam exposure system Aug. 15, 2006
7087913 Ion implanter electrodes Aug. 8, 2006
7084411 Pattern-definition device for maskless particle-beam exposure apparatus Aug. 1, 2006
7081621 Laminated lens for focusing ions from atmospheric pressure Jul. 25, 2006
7081630 Compact microcolumn for automated assembly Jul. 25, 2006
7078714 Ion implanting apparatus Jul. 18, 2006
7075092 Charged particle beam microscope with minicolumn Jul. 11, 2006
7067807 Charged particle beam column and method of its operation Jun. 27, 2006
7067820 Particle-optical apparatus with a permanent-magnetic lens and an electrostatic lens Jun. 27, 2006

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