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Class Information
Number: 250/398
Name: Radiant energy > With charged particle beam deflection or focussing > With target means
Description: Subject matter having means to hold, position or accommodate an object to be irradiated by the beam, or such an object itself in combination with the lens.










Sub-classes under this class:

Class Number Class Name Patents
250/399 Secondary emissive type 110
250/400 With means to convey or guide the target 118


Patents under this class:

Patent Number Title Of Patent Date Issued
4559096 Method of precisely modifying predetermined surface layers of a workpiece by cluster ion impact therewith Dec. 17, 1985
4551599 Combined electrostatic objective and emission lens Nov. 5, 1985
4546258 Charged particle beam apparatus Oct. 8, 1985
4544846 Variable axis immersion lens electron beam projection system Oct. 1, 1985
4544847 Multi-gap magnetic imaging lens for charged particle beams Oct. 1, 1985
4536239 Multi-layer circuit board inspection system Aug. 20, 1985
4532598 Electron beam exposure system Jul. 30, 1985
4524278 Charged particle beam exposure device incorporating beam splitting Jun. 18, 1985
4520264 Electron microscope May. 28, 1985
4514638 Electron-optical system with variable-shaped beam for generating and measuring microstructures Apr. 30, 1985
4511980 Electron beam exposure apparatus Apr. 16, 1985
4500789 Electron beam exposing method Feb. 19, 1985
4494004 Electron beam system Jan. 15, 1985
4492870 Angular limitation device in a charged particle beam system Jan. 8, 1985
4493097 Electron gun assembly Jan. 8, 1985
4484077 Exposure system and method using an electron beam Nov. 20, 1984
4479060 Apparatus for irradiation with charged particle beams Oct. 23, 1984
4476393 Ion implantation apparatus Oct. 9, 1984
4472636 Method of and device for corpuscular projection Sep. 18, 1984
4469950 Charged particle beam exposure system utilizing variable line scan Sep. 4, 1984
4465934 Parallel charged particle beam exposure system Aug. 14, 1984
4463265 Electron beam proximity effect correction by reverse field pattern exposure Jul. 31, 1984
4455489 Quadrupole singlet focusing for achromatic parallel-to-parallel devices Jun. 19, 1984
4445039 High throughput/high resolution particle beam system Apr. 24, 1984
4445041 Electron beam blanker Apr. 24, 1984
4442352 Scanning system for charged and neutral particle beams Apr. 10, 1984
4439685 Corpuscular beam blanking system Mar. 27, 1984
4438336 Corpuscular radiation device for producing an irradiation pattern on a workpiece Mar. 20, 1984
4433247 Beam sharing method and apparatus for ion implantation Feb. 21, 1984
4426583 Electron beam potential switching apparatus Jan. 17, 1984
4421988 Beam scanning method and apparatus for ion implantation Dec. 20, 1983
4418283 Microlithographic system using a charged particle beam Nov. 29, 1983
4410801 Ion implantation equipment Oct. 18, 1983
4409487 Electrode arrangement for electrostatic deflection system Oct. 11, 1983
4393310 Method of and device for adjusting a shaped-electron-beam working device Jul. 12, 1983
4392058 Electron beam lithography Jul. 5, 1983
4383180 Particle beam accelerator May. 10, 1983
4381453 System and method for deflecting and focusing a broad ion beam Apr. 26, 1983
4381280 Method and device for producing nuclear fusion Apr. 26, 1983
4376249 Variable axis electron beam projection system Mar. 8, 1983
4366383 Electron beam type pattern transfer apparatus Dec. 28, 1982
4362942 Electron beam exposure system and an apparatus for carrying out the same Dec. 7, 1982
4346301 Ion implantation system Aug. 24, 1982
4335309 Method and device for the rapid deflection of a particle beam Jun. 15, 1982
4331875 Shadow casting electron-beam system May. 25, 1982
4327292 Alignment process using serial detection of repetitively patterned alignment marks Apr. 27, 1982
4321470 Electron flood exposure apparatus Mar. 23, 1982
4315152 Electron beam apparatus Feb. 9, 1982
4315153 Focusing ExB mass separator for space-charge dominated ion beams Feb. 9, 1982
4298803 Process and apparatus for making fine-scale patterns Nov. 3, 1981











 
 
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