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Class Information
Number: 250/398
Name: Radiant energy > With charged particle beam deflection or focussing > With target means
Description: Subject matter having means to hold, position or accommodate an object to be irradiated by the beam, or such an object itself in combination with the lens.










Sub-classes under this class:

Class Number Class Name Patents
250/399 Secondary emissive type 110
250/400 With means to convey or guide the target 118


Patents under this class:
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Patent Number Title Of Patent Date Issued
4757208 Masked ion beam lithography system and method Jul. 12, 1988
4746803 Method of forming a single crystal semiconductor layer from a non-single-crystalline material and apparatus for forming the same May. 24, 1988
4743570 Method of thermal treatment of a wafer in an evacuated environment May. 10, 1988
4743766 Method of drawing a desired pattern on a target through exposure thereof with an electron beam May. 10, 1988
4743767 Systems and methods for ion implantation May. 10, 1988
4742234 Charged-particle-beam lithography May. 3, 1988
4737644 Conductive coated semiconductor electrostatic deflection plates Apr. 12, 1988
4731537 Electron beam gun Mar. 15, 1988
4724328 Lithographic apparatus for the production of microstructures Feb. 9, 1988
4718019 Election beam exposure system and an apparatus for carrying out a pattern unwinder Jan. 5, 1988
4713543 Scanning particle microscope Dec. 15, 1987
4710632 Ion microbeam apparatus Dec. 1, 1987
4710639 Ion beam lithography system Dec. 1, 1987
4701620 Electron beam exposure apparatus Oct. 20, 1987
4701623 Charged particle beam apparatus Oct. 20, 1987
4698509 High speed pattern generator for electron beam lithography Oct. 6, 1987
4694170 Instrument for very high resolution ionic micro-analysis of a solid sample Sep. 15, 1987
4694178 Multiple channel electron beam optical column lithography system and method of operation Sep. 15, 1987
4692579 Electron beam lithography apparatus Sep. 8, 1987
4690744 Method of ion beam generation and an apparatus based on such method Sep. 1, 1987
4687931 Scanning electron microscope Aug. 18, 1987
4687940 Hybrid focused-flood ion beam system and method Aug. 18, 1987
4684809 Method of adjusting optical column in energy beam exposure system Aug. 4, 1987
4680061 Method of thermal treatment of a wafer in an evacuated environment Jul. 14, 1987
4680469 Focusing device for a television electron microscope Jul. 14, 1987
4677296 Apparatus and method for measuring lengths in a scanning particle microscope Jun. 30, 1987
4667108 Impedance matched and thermally cooled deflection amplifiers for charged particle beam apparatus employing deflectors May. 19, 1987
4663559 Field emission device May. 5, 1987
4661709 Modular all-electrostatic electron-optical column and assembly of said columns into an array and method of manufacture Apr. 28, 1987
4661712 Apparatus for scanning a high current ion beam with a constant angle of incidence Apr. 28, 1987
4661968 Beam exposure apparatus comprising a diaphragm drive for an object carrier Apr. 28, 1987
4652357 Apparatus for and a method of modifying the properties of a material Mar. 24, 1987
4647782 Charged particle beam exposure apparatus Mar. 3, 1987
4646253 Method for imaging electrical barrier layers such as pn-junctions in semiconductors by means of processing particle-beam-induced signals in a scanning corpuscular microscope Feb. 24, 1987
4644168 Electron beam deflecting magnet assembly for a scanning electron beam computed tomography scanner Feb. 17, 1987
4644170 Method of electron beam exposure Feb. 17, 1987
4641034 Ion implantation apparatus and method for maskless processing Feb. 3, 1987
4639301 Focused ion beam processing Jan. 27, 1987
4634871 Method and apparatus for spot shaping and blanking a focused beam Jan. 6, 1987
4634874 Electron lithography apparatus Jan. 6, 1987
4633090 Method and apparatus for particle irradiation of a target Dec. 30, 1986
4629898 Electron and ion beam apparatus and passivation milling Dec. 16, 1986
4626690 Apparatus for chopping a charged particle beam Dec. 2, 1986
4607333 Electron beam exposure apparatus Aug. 19, 1986
4595837 Method for preventing arcing in a device during ion-implantation Jun. 17, 1986
4593200 Scan controller for ion implanter device Jun. 3, 1986
4586141 Method and apparatus for an electron beam exposure system Apr. 29, 1986
4577111 Apparatus for electron beam lithography Mar. 18, 1986
4568833 Charged-particle beam exposure device incorporating beam splitting Feb. 4, 1986
4560878 Electron and ion beam-shaping apparatus Dec. 24, 1985

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