Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Browse by Category: Main > Electrical & Energy
Class Information
Number: 250/398
Name: Radiant energy > With charged particle beam deflection or focussing > With target means
Description: Subject matter having means to hold, position or accommodate an object to be irradiated by the beam, or such an object itself in combination with the lens.










Sub-classes under this class:

Class Number Class Name Patents
250/399 Secondary emissive type 110
250/400 With means to convey or guide the target 118


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 Next

Patent Number Title Of Patent Date Issued
5079428 Electron microscope with an asymmetrical immersion lens Jan. 7, 1992
5072125 Ion implanter Dec. 10, 1991
5068539 Ion implantation apparatus Nov. 26, 1991
5063296 Electron-optical system for making a pseudoparallel micro electron-beam Nov. 5, 1991
5059792 Thermal field emission electron gun Oct. 22, 1991
5053627 Apparatus for ion implantation Oct. 1, 1991
5051600 Particle beam generator Sep. 24, 1991
5047647 Electron beam lithography apparatus Sep. 10, 1991
5045705 Charged particle beam apparatus with charge-up compensation Sep. 3, 1991
5046148 Ion implantation apparatus Sep. 3, 1991
5038044 Method and device for the deflection of a beam Aug. 6, 1991
5036209 Fabrication method for semiconductor devices and transparent mask for charged particle beam Jul. 30, 1991
5028795 Ion implantation apparatus Jul. 2, 1991
5025167 Ion implantation apparatus Jun. 18, 1991
5023462 Photo-cathode image projection apparatus for patterning a semiconductor device Jun. 11, 1991
5017789 Raster scan control system for a charged-particle beam May. 21, 1991
5012105 Multiple-imaging charged particle-beam exposure system Apr. 30, 1991
5008830 Method of preparing drawing data for charged beam exposure system Apr. 16, 1991
5006759 Two piece apparatus for accelerating and transporting a charged particle beam Apr. 9, 1991
5003183 Ion implantation apparatus and method of controlling the same Mar. 26, 1991
5001349 Charged-particle beam apparatus Mar. 19, 1991
4998020 Electron beam exposure evaluation method Mar. 5, 1991
4996441 Lithographic apparatus for structuring a subject Feb. 26, 1991
4994674 Ion implantation apparatus capable of avoiding electrification of a substrate Feb. 19, 1991
4992668 Electron beam pattern generator control Feb. 12, 1991
4985634 Ion beam lithography Jan. 15, 1991
4983850 Ion implantation device Jan. 8, 1991
4982099 Aperture diaphragm for a lithography apparatus Jan. 1, 1991
4980562 Method and apparatus for high efficiency scanning in an ion implanter Dec. 25, 1990
4980567 Charged particle beam exposure system using line beams Dec. 25, 1990
4975572 Apparatus for producing a monatomic beam of ground-state atoms Dec. 4, 1990
4968893 Scanning electron beam exposure system Nov. 6, 1990
4968894 Electrical field enhanced electron image projector Nov. 6, 1990
4967088 Method and apparatus for image alignment in ion lithography Oct. 30, 1990
4963748 Composite multipurpose multipole electrostatic optical structure and a synthesis method for minimizing aberrations Oct. 16, 1990
4962308 Charged particle apparatus comprising a beam discriminator Oct. 9, 1990
4962317 Confined energy distribution for charged particle beams Oct. 9, 1990
4961003 Scanning electron beam apparatus Oct. 2, 1990
4950910 Electron beam exposure method and apparatus Aug. 21, 1990
4945246 Tri-deflection electron beam system Jul. 31, 1990
4943729 Electron beam lithography system Jul. 24, 1990
4943730 Charged particle beam lithography method Jul. 24, 1990
4939360 Particle beam irradiating apparatus having charge suppressing device which applies a bias voltage between a change suppressing particle beam source and the specimen Jul. 3, 1990
4939373 Electron image projector Jul. 3, 1990
4937458 Electron beam lithography apparatus including a beam blanking device utilizing a reference comparator Jun. 26, 1990
4930439 Mask-repairing device Jun. 5, 1990
4929838 Magnetic object lens for an electron beam exposure apparatus which processes a wafer carried on a continuously moving stage May. 29, 1990
4929839 Focused ion beam column May. 29, 1990
4929840 Wafer rotation control for an ion implanter May. 29, 1990
4926055 Field emission electron gun May. 15, 1990

1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 Next










 
 
  Recently Added Patents
(4932
Acceleration based mode switch
Flash memory apparatus and method for generating read voltage thereof
Web development environment that enables a developer to interact with run-time output presentation of a page
Method of patterning color conversion layer and method of manufacturing organic EL display using the patterning method
Maesa japonica extracts and methods of use
Systems and methods for implementing multi-application tabs and tab sets
  Randomly Featured Patents
Microporous peek membranes and the preparation thereof
Pulse tube refrigerator
Multichannel information processing device
Clothing rack
Concealed object detection
Combination foldable ruler and level
Hybrid Schottky infrared focal plane array
Allocating access across shared communications medium to user classes
Movement actuator/sensor systems
Quality assurance of image-customization of computer-based value-bearing items