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Class Information
Number: 250/398
Name: Radiant energy > With charged particle beam deflection or focussing > With target means
Description: Subject matter having means to hold, position or accommodate an object to be irradiated by the beam, or such an object itself in combination with the lens.










Sub-classes under this class:

Class Number Class Name Patents
250/399 Secondary emissive type 110
250/400 With means to convey or guide the target 118


Patents under this class:
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Patent Number Title Of Patent Date Issued
5214289 Charged particle beam deflector May. 25, 1993
5214291 Pattern forming method May. 25, 1993
5198676 Ion beam profiling method and apparatus Mar. 30, 1993
5196706 Extractor and deceleration lens for ion beam deposition apparatus Mar. 23, 1993
5196707 Low Aberration field emission electron gun Mar. 23, 1993
5194748 Method and apparatus relating to ion implantation Mar. 16, 1993
5189306 Grey-splice algorithm for electron beam lithography post-processor Feb. 23, 1993
5187371 Charged particle beam apparatus Feb. 16, 1993
5185530 Electron beam instrument Feb. 9, 1993
5180919 Electron beam exposure system having the capability of checking the pattern of an electron mask used for shaping an electron beam Jan. 19, 1993
5180920 Method and apparatus for making charged particle beam exposure Jan. 19, 1993
5177365 Charged particle beam exposure device for improving the heating state of block mask Jan. 5, 1993
5177366 Ion beam implanter for providing cross plane focusing Jan. 5, 1993
5177367 Method of exposure using an electron beam to provide uniform dosage and apparatus therefor Jan. 5, 1993
5175435 Electron beam exposure system with increased efficiency of exposure operation Dec. 29, 1992
5160845 Alignment technique for masked ion beam lithography Nov. 3, 1992
5160846 Method and apparatus for reducing tilt angle variations in an ion implanter Nov. 3, 1992
5155368 Ion beam blanking apparatus and method Oct. 13, 1992
5153441 Electron-beam exposure apparatus Oct. 6, 1992
5151605 Method of irradiating an object by means of a charged particle beam, and device for performing the method Sep. 29, 1992
5149975 Pattern fabrication method using a charged particle beam and apparatus for realizing same Sep. 22, 1992
5148033 Electron beam exposure device and exposure method using the same Sep. 15, 1992
5148034 Ion implantation method Sep. 15, 1992
5144142 Blanking aperture array, method for producing blanking aperture array, charged particle beam exposure apparatus and charged particle beam exposure method Sep. 1, 1992
5138169 Method and apparatus for irradiating low-energy electrons Aug. 11, 1992
5136167 Electron beam lens and deflection system for plural-level telecentric deflection Aug. 4, 1992
5136171 Charge neutralization apparatus for ion implantation system Aug. 4, 1992
5134299 Ion beam implantation method and apparatus for particulate control Jul. 28, 1992
5132544 System for irradiating a surface with atomic and molecular ions using two dimensional magnetic scanning Jul. 21, 1992
5132545 Ion implantation apparatus Jul. 21, 1992
5130547 Charged-particle beam exposure method and apparatus Jul. 14, 1992
5130552 Improved ion implantation using a variable mass resolving system Jul. 14, 1992
5126220 Reticle for photolithographic patterning Jun. 30, 1992
5126575 Method and apparatus for broad beam ion implantation Jun. 30, 1992
5124556 Charged particle beam apparatus Jun. 23, 1992
5124560 Electron beam exposure system having an improved data transfer efficiency Jun. 23, 1992
5120972 Method of and apparatus for improved nitrogen inerting of surfaces to be electron beam irradiated Jun. 9, 1992
5118949 Process for the protection of a diaphragm during the generation of electron beam pulses Jun. 2, 1992
5105089 Electron beam exposure system Apr. 14, 1992
5102516 Method for producing a monatomic beam of ground-state atoms Apr. 7, 1992
5103101 Multiphase printing for E-beam lithography Apr. 7, 1992
5099130 Apparatus and methods relating to scanning ion beams Mar. 24, 1992
5099133 Charged particle beam exposure method and apparatus Mar. 24, 1992
5097138 Electron beam lithography system and method Mar. 17, 1992
5093577 Contamination monitor for measuring a degree of contamination in an evacuatable charged particle beam system Mar. 3, 1992
5091655 Reduced path ion beam implanter Feb. 25, 1992
5085957 Method of repairing a mask Feb. 4, 1992
5086230 Apparatus for forming, correcting pattern Feb. 4, 1992
5086398 Electron beam exposure method Feb. 4, 1992
5083032 Electron beam exposure apparatus Jan. 21, 1992

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