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Class Information
Number: 250/398
Name: Radiant energy > With charged particle beam deflection or focussing > With target means
Description: Subject matter having means to hold, position or accommodate an object to be irradiated by the beam, or such an object itself in combination with the lens.










Sub-classes under this class:

Class Number Class Name Patents
250/399 Secondary emissive type 110
250/400 With means to convey or guide the target 118


Patents under this class:
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Patent Number Title Of Patent Date Issued
5747814 Method for centering a lens in a charged-particle system May. 5, 1998
5747819 Charged particle beam transfer device exhibiting low aberration May. 5, 1998
5748360 Decelerating and focusing ion beam device May. 5, 1998
5729027 Ion implanter Mar. 17, 1998
5721432 Method of and system for charged particle beam exposure Feb. 24, 1998
5719402 Method of and system for charged particle beam exposure Feb. 17, 1998
5703376 Multi-level resolution lithography Dec. 30, 1997
5696382 Ion-implanter having variable ion beam angle control Dec. 9, 1997
5689117 Apparatus for image transfer with charged particle beam, and deflector and mask used with such apparatus Nov. 18, 1997
5663568 Apparatus for controlling a charged particle beam and a lithographic process in which the apparatus is used Sep. 2, 1997
5661307 Electron beam lithography system Aug. 26, 1997
5650628 Simultaneous deflections in charged-particle beams Jul. 22, 1997
5650631 Electron beam writing system Jul. 22, 1997
5647018 Method and apparatus for generating images Jul. 8, 1997
5633507 Electron beam lithography system with low brightness May. 27, 1997
5631113 Electron-beam exposure system for reduced distortion of electron beam spot May. 20, 1997
5631526 Hydrogen ion accelerator May. 20, 1997
5585642 Beamline control and security system for a radiation treatment facility Dec. 17, 1996
5578831 Method and apparatus for charged particle propagation Nov. 26, 1996
5576593 Apparatus for accelerating electrically charged particles Nov. 19, 1996
5563419 Electron beam exposure system capable of correcting proximity effect Oct. 8, 1996
5545902 Electron beam lithography system Aug. 13, 1996
5539203 Single ion implantation system Jul. 23, 1996
5530252 Inductively coupled dual-stage magnetic deflection yoke Jun. 25, 1996
5498874 Defect detecting apparatus and method Mar. 12, 1996
5486702 Scan technique to reduce transient wafer temperatures during ion implantation Jan. 23, 1996
5483077 System and method for magnetic scanning, accelerating, and implanting of an ion beam Jan. 9, 1996
5481164 Variable axis stigmator Jan. 2, 1996
5468965 Circular, confined distribution for charged particle beams Nov. 21, 1995
5459326 Method for surface treatment with extra-low-speed ion beam Oct. 17, 1995
5457324 Spectrum analyzer in an ion implanter Oct. 10, 1995
5449915 Electron beam exposure system capable of detecting failure of exposure Sep. 12, 1995
5449916 Electron radiation dose tailoring by variable beam pulse generation Sep. 12, 1995
5448075 Electron-beam exposure system having an improved rate of exposure throughput Sep. 5, 1995
5444256 Electrostatic lens and method for producing the same Aug. 22, 1995
5444257 Electron-beam exposure system for reduced distortion of electron beam spot Aug. 22, 1995
5442182 Electron lens Aug. 15, 1995
5438203 System and method for unipolar magnetic scanning of heavy ion beams Aug. 1, 1995
5436460 Ion-optical imaging system Jul. 25, 1995
5428552 Data compaction techniques for generation of a complex image Jun. 27, 1995
5424549 Scanning systems for high resolution e-beam and X-ray lithography Jun. 13, 1995
5422490 Focused ion beam implantation apparatus Jun. 6, 1995
5422491 Mask and charged particle beam exposure method using the mask Jun. 6, 1995
5420433 Charged particle beam exposure apparatus May. 30, 1995
5418378 Ion implant device with modulated scan output May. 23, 1995
5399872 Charged-particle beam exposure method Mar. 21, 1995
5393985 Apparatus for focusing an ion beam Feb. 28, 1995
5393988 Mask and charged particle beam exposure method using the mask Feb. 28, 1995
5391886 Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system Feb. 21, 1995
5389858 Variable axis stigmator Feb. 14, 1995

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