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Class Information
Number: 250/398
Name: Radiant energy > With charged particle beam deflection or focussing > With target means
Description: Subject matter having means to hold, position or accommodate an object to be irradiated by the beam, or such an object itself in combination with the lens.










Sub-classes under this class:

Class Number Class Name Patents
250/399 Secondary emissive type 110
250/400 With means to convey or guide the target 118


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 Next

Patent Number Title Of Patent Date Issued
5981962 Distributed direct write lithography system using multiple variable shaped electron beams Nov. 9, 1999
5977548 Charged particle beam exposure system and method Nov. 2, 1999
5977551 Method capable of accurately simulating ion implantation at a high speed Nov. 2, 1999
5977553 Mechanism for preventing metallic ion contamination of a wafer in ion implantation equipment Nov. 2, 1999
5973332 Electron beam exposure method, and device manufacturing method using same Oct. 26, 1999
5973333 Charged-particle-beam pattern-transfer apparatus and methods Oct. 26, 1999
5969362 High-throughput direct-write electron-beam exposure system and method Oct. 19, 1999
5962859 Multiple variable shaped electron beam system with lithographic structure Oct. 5, 1999
5949078 Charged-particle-beam exposure device and charged-particle-beam exposure method Sep. 7, 1999
5945677 Focused ion beam system Aug. 31, 1999
5945682 Space-saving ion-implantation system installed both in and adjacent to a semiconductor manufacturing line Aug. 31, 1999
5932882 Ion implanter with post mass selection deceleration Aug. 3, 1999
5929457 Charged particle beam transfer apparatus Jul. 27, 1999
5912468 Charged particle beam exposure system Jun. 15, 1999
5912469 Charged-particle-beam microlithography apparatus Jun. 15, 1999
5910658 Method and system for changed particle beam exposure Jun. 8, 1999
5898279 Cyclotron monitoring system and method Apr. 27, 1999
5895924 Charged particle beam exposure method and apparatus Apr. 20, 1999
5895925 Mask used in charged particle beam projecting apparatus and method for dividing pattern Apr. 20, 1999
5895926 Beamline control and security system for a radiation treatment facility Apr. 20, 1999
5892231 Virtual mask digital electron beam lithography Apr. 6, 1999
5892235 Apparatus and method for doping Apr. 6, 1999
5883466 Electron tube Mar. 16, 1999
5854531 Storage ring system and method for high-yield nuclear production Dec. 29, 1998
5847402 Charged particle beam pattern transfer apparatus and method Dec. 8, 1998
5843603 Method of evaluating shaped beam of charged beam writer and method of forming pattern Dec. 1, 1998
5834783 Electron beam exposure apparatus and method, and device manufacturing method Nov. 10, 1998
5834785 Method and apparatus to compensate for thermal expansion in a lithographic process Nov. 10, 1998
5834786 High current ribbon beam ion implanter Nov. 10, 1998
5831272 Low energy electron beam lithography Nov. 3, 1998
5825034 Method of compensation for electron beam dose Oct. 20, 1998
5825039 Digitally stepped deflection raster system and method of use thereof Oct. 20, 1998
5825040 Bright beam method for super-resolution in e-beam lithography Oct. 20, 1998
5821542 Particle beam imaging system having hollow beam illumination Oct. 13, 1998
5808313 Charged particle beam exposure method and charged particle beam exposure apparatus Sep. 15, 1998
5801387 Method of and apparatus for the electron beam treatment of powders and aggregates in pneumatic transfer Sep. 1, 1998
5801388 Particle beam, in particular ionic optic imaging system Sep. 1, 1998
5798528 Correction of pattern dependent position errors in electron beam lithography Aug. 25, 1998
5793048 Curvilinear variable axis lens correction with shifted dipoles Aug. 11, 1998
5780853 Scanning electron microscope Jul. 14, 1998
5780863 Accelerator-decelerator electrostatic lens for variably focusing and mass resolving an ion beam in an ion implanter Jul. 14, 1998
5780913 Photoelectric tube using electron beam irradiation diode as anode Jul. 14, 1998
5773837 Apparatus for image transfer with charged particle beam, and deflector and mask used with such apparatus Jun. 30, 1998
5773838 Apparatus for image transfer with charged particle beam, and deflector and mask used with such apparatus Jun. 30, 1998
5770862 Charged particle exposure apparatus, and a charged particle exposure method Jun. 23, 1998
5767521 Electron-beam lithography system and method for drawing nanometer-order pattern Jun. 16, 1998
5767522 Ion-implantation system using split ion beams Jun. 16, 1998
5760410 Electron beam lithography apparatus and method Jun. 2, 1998
5757009 Charged particle beam expander May. 26, 1998
5751002 Ion implantation apparatus May. 12, 1998

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