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Class Information
Number: 250/398
Name: Radiant energy > With charged particle beam deflection or focussing > With target means
Description: Subject matter having means to hold, position or accommodate an object to be irradiated by the beam, or such an object itself in combination with the lens.










Sub-classes under this class:

Class Number Class Name Patents
250/399 Secondary emissive type 110
250/400 With means to convey or guide the target 118


Patents under this class:
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Patent Number Title Of Patent Date Issued
6262420 Detection of alpha radiation in a beta radiation field Jul. 17, 2001
6259105 System and method for cleaning silicon-coated surfaces in an ion implanter Jul. 10, 2001
6242750 Ion implantation device Jun. 5, 2001
6232601 Dynamically compensated objective lens-detection device and method May. 15, 2001
6222196 Rotatable workpiece support including cyclindrical workpiece support surfaces for an ion beam implanter Apr. 24, 2001
6218671 On-line dynamic corrections adjustment method Apr. 17, 2001
6218675 Charged particle beam irradiation apparatus Apr. 17, 2001
6215127 Method of using critical dimension mapping to qualify a new integrated circuit fabrication tool set Apr. 10, 2001
6215128 Compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography Apr. 10, 2001
6207117 Charged particle beam apparatus and gas supply and exhaustion method employed in the apparatus Mar. 27, 2001
6204509 Projection-microlithography apparatus, masks, and related methods incorporating reticle-distortion measurement and correction Mar. 20, 2001
6204511 Electron beam image picturing method and image picturing device Mar. 20, 2001
6198221 Electron tube Mar. 6, 2001
6191427 Ion implantation system and method suitable for low energy ion beam implantation Feb. 20, 2001
6183523 Apparatus for thermal control of variously sized articles in vacuum Feb. 6, 2001
6184525 Environmental SEM with a multiple fields for improved secondary electron detection Feb. 6, 2001
6175122 Method for writing a pattern using multiple variable shaped electron beams Jan. 16, 2001
6172364 Charged particle beam irradiation apparatus Jan. 9, 2001
6160262 Method and apparatus for deflecting charged particles Dec. 12, 2000
6124596 Charged-particle-beam projection apparatus and transfer methods Sep. 26, 2000
6118129 Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements Sep. 12, 2000
6107629 Method to determine depth profiles in an area of thin coating Aug. 22, 2000
6107636 Electron beam exposure apparatus and its control method Aug. 22, 2000
6093931 Pattern-forming method and lithographic system Jul. 25, 2000
6087668 Charged-particle-beam projection method and apparatus Jul. 11, 2000
6087670 Synchrotron type accelerator and medical treatment system employing the same Jul. 11, 2000
6066853 Electron-optical system exhibiting reduced aberration May. 23, 2000
6064071 Charged-particle-beam optical systems May. 16, 2000
6060711 Charged-particle optical systems and pattern transfer apparatus comprising same May. 9, 2000
6055719 Method for manufacturing an electrostatic deflector May. 2, 2000
6054713 Electron beam exposure apparatus Apr. 25, 2000
6046457 Charged particle beam apparatus having anticontamination means Apr. 4, 2000
6039000 Focused particle beam systems and methods using a tilt column Mar. 21, 2000
6040582 Ion beam focuser for an ion implanter analyzer Mar. 21, 2000
6040583 Electron beam exposure method using a moving stage Mar. 21, 2000
6037601 Electron beam illumination device, and exposure apparatus with electron beam illumination device Mar. 14, 2000
6034377 Charged particle beam irradiation apparatus and method of irradiation with charged particle beam Mar. 7, 2000
6031239 Filtered cathodic arc source Feb. 29, 2000
6023067 Blanking system for electron beam projection system Feb. 8, 2000
6014203 Digital electron lithography with field emission array (FEA) Jan. 11, 2000
6011268 Demagnifying projection-optical system for electron beam lithography with aberration control Jan. 4, 2000
6008495 Electron beam exposure device Dec. 28, 1999
6005250 Illumination deflection system for E-beam projection Dec. 21, 1999
6005253 Scanning energy implantation Dec. 21, 1999
5998795 Electron beam pattern-writing column Dec. 7, 1999
5994708 Demagnifying charged-particle lithography apparatus Nov. 30, 1999
5994709 Charged-particle-beam exposure apparatus exhibiting aberration control Nov. 30, 1999
5981954 Electron beam exposure apparatus Nov. 9, 1999
5981960 Charged particle beam exposure method and apparatus therefor Nov. 9, 1999
5981961 Apparatus and method for improved scanning efficiency in an ion implanter Nov. 9, 1999

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