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Class Information
Number: 250/398
Name: Radiant energy > With charged particle beam deflection or focussing > With target means
Description: Subject matter having means to hold, position or accommodate an object to be irradiated by the beam, or such an object itself in combination with the lens.










Sub-classes under this class:

Class Number Class Name Patents
250/399 Secondary emissive type 110
250/400 With means to convey or guide the target 118


Patents under this class:
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Patent Number Title Of Patent Date Issued
6512235 Nanotube-based electron emission device and systems using the same Jan. 28, 2003
6507027 Apparatus and methods for charged-particle-beam microlithography exhibiting reduced four-fold aberrations Jan. 14, 2003
6507029 Sample processing apparatus and method for removing charge on sample through light irradiation Jan. 14, 2003
6498349 Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy Dec. 24, 2002
6497194 Focused particle beam systems and methods using a tilt column Dec. 24, 2002
6495826 Monochrometer for electron beam Dec. 17, 2002
6495841 Charged beam drawing apparatus Dec. 17, 2002
6486479 Charged particle beam exposure system and method Nov. 26, 2002
6476387 Method and apparatus for observing or processing and analyzing using a charged beam Nov. 5, 2002
6476399 System and method for removing contaminant particles relative to an ion beam Nov. 5, 2002
6476401 Moving photocathode with continuous regeneration for image conversion in electron beam lithography Nov. 5, 2002
6476403 Gantry with an ion-optical system Nov. 5, 2002
6472672 Electron beam exposure apparatus and its control method Oct. 29, 2002
6472673 Lithographic method for producing an exposure pattern on a substrate Oct. 29, 2002
6472674 Electron beam exposure system and method of manufacturing devices using the same Oct. 29, 2002
6455863 Apparatus and method for forming a charged particle beam of arbitrary shape Sep. 24, 2002
6444990 Multiple target, multiple energy radioisotope production Sep. 3, 2002
6437347 Target locking system for electron beam lithography Aug. 20, 2002
6437351 Method and apparatus for controlling a workpiece in a vacuum chamber Aug. 20, 2002
6437352 Charged particle beam projection lithography with variable beam shaping Aug. 20, 2002
6437353 Particle-optical apparatus and process for the particle-optical production of microstructures Aug. 20, 2002
6433347 Charged-particle-beam projection-exposure methods and apparatus that selectively expose desired exposure units of a reticle pattern Aug. 13, 2002
6433495 Device for fitting of a target in isotope production Aug. 13, 2002
6429441 Charged-particle-beam microlithography apparatus and methods exhibiting variable beam velocity, and device-manufacturing methods using same Aug. 6, 2002
6429442 Ion implanter Aug. 6, 2002
6423968 Method for structured energy transmission using electron beams Jul. 23, 2002
6410923 Magnetic lens apparatus for use in high-resolution scanning electron microscopes and lithographic processes Jun. 25, 2002
6410924 Energy filtered focused ion beam column Jun. 25, 2002
6407399 Uniformity correction for large area electron source Jun. 18, 2002
6403969 Ion implantation system and ion implantation method Jun. 11, 2002
6403972 Methods and apparatus for alignment of ion beam systems using beam current sensors Jun. 11, 2002
6394109 Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system May. 28, 2002
6392243 Electron beam exposure apparatus and device manufacturing method May. 21, 2002
6388261 Charged-particle-beam microlithography apparatus and methods exhibiting reduced astigmatisms and linear distortion May. 14, 2002
6380545 Uniform raster pattern generating system Apr. 30, 2002
6376842 Optical system for charged-particle-beam microlithography apparatus exhibiting reduced third- and fifth-order aberrations Apr. 23, 2002
6376848 Apparatus and methods for charged-particle-beam microlithography exhibiting reduced aberrations caused by beam deflection to correct errors in stage-position control Apr. 23, 2002
6369396 Calibration target for electron beams Apr. 9, 2002
6362486 Magnetic lens for focusing a charged particle beam Mar. 26, 2002
6350992 Charged particle beam exposure method and charged particle beam exposure device Feb. 26, 2002
6351483 Laser optical axis correcting method Feb. 26, 2002
6337485 Electron beam exposure apparatus and its control method Jan. 8, 2002
6335532 Convergent charged particle beam apparatus and inspection method using same Jan. 1, 2002
6329659 Correction device for correcting the lens defects in particle-optical apparatus Dec. 11, 2001
6326630 Ion implanter Dec. 4, 2001
6323498 Charged particle beam irradiation apparatus and irradiation method using the apparatus Nov. 27, 2001
6323499 Electron beam exposure apparatus and method, and device manufacturing method Nov. 27, 2001
6323500 Electron-beam exposure system Nov. 27, 2001
6271531 Charged beam drawing apparatus and method thereof Aug. 7, 2001
6268610 Charged-particle beam irradiation apparatus, charged-particle beam rotary irradiation system, and charged-particle beam irradiation method Jul. 31, 2001

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