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Class Information
Number: 250/398
Name: Radiant energy > With charged particle beam deflection or focussing > With target means
Description: Subject matter having means to hold, position or accommodate an object to be irradiated by the beam, or such an object itself in combination with the lens.










Sub-classes under this class:

Class Number Class Name Patents
250/399 Secondary emissive type 110
250/400 With means to convey or guide the target 118


Patents under this class:
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Patent Number Title Of Patent Date Issued
6627890 Particle beam apparatus for tilted observation of a specimen Sep. 30, 2003
6624412 Energy filter Sep. 23, 2003
6617586 Beam delivery system Sep. 9, 2003
6617587 Electron optics for multi-beam electron beam lithography tool Sep. 9, 2003
6617595 Multi-lens type electrostatic lens, electron beam exposure apparatus and charged beam applied apparatus using the lens, and device manufacturing method using these apparatuses Sep. 9, 2003
6617598 Charged particle beam irradiation apparatus Sep. 9, 2003
6614026 Charged particle beam column Sep. 2, 2003
6614027 Method of controlling electrostatic lens and ion implantation apparatus Sep. 2, 2003
6614033 Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes Sep. 2, 2003
6614038 Method for monitoring the irradiation control unit of an ion-beam therapy system Sep. 2, 2003
6610987 Apparatus and method of ion beam processing Aug. 26, 2003
6608316 Ion implantation beam monitor Aug. 19, 2003
6603131 Charged-particle-beam optical systems and microlithography apparatus comprising a non-absorbing shaping aperture Aug. 5, 2003
6596999 High performance source for electron beam projection lithography Jul. 22, 2003
6586746 Multipole electrostatic e-beam deflector Jul. 1, 2003
6586753 Electron beam apparatus and electron beam adjusting method Jul. 1, 2003
6583430 Electron beam exposure method and apparatus Jun. 24, 2003
6580072 Method for performing failure analysis on copper metallization Jun. 17, 2003
6580075 Charged particle beam scanning type automatic inspecting apparatus Jun. 17, 2003
6580083 High efficiency scanning in ion implanters Jun. 17, 2003
6576902 Correction method of scanning electron microscope Jun. 10, 2003
6573501 Holography transmission electron microscope Jun. 3, 2003
6570155 Bi-directional electron beam scanning apparatus May. 27, 2003
6570171 Ion implanter May. 27, 2003
6566658 Charged particle beam control element, method of fabricating charged particle beam control element, and charged beam apparatus May. 20, 2003
6566662 Charged beam exposure system May. 20, 2003
6563124 Electron beam apparatus having traversing circuit boards May. 13, 2003
6559457 System and method for facilitating detection of defects on a wafer May. 6, 2003
6559459 Convergent charged particle beam apparatus and inspection method using same May. 6, 2003
6559461 Wafer scanning support unit of ion implantation apparatus May. 6, 2003
6559463 Mask pattern transfer method, mask pattern transfer apparatus using the method, and device manufacturing method May. 6, 2003
6555818 Transmission electron microscope Apr. 29, 2003
6555825 Ion implanter Apr. 29, 2003
6555832 Determining beam alignment in ion implantation using Rutherford Back Scattering Apr. 29, 2003
6545282 Apparatus and methods for reducing Coulombic blur in charged-particle-beam microlithography Apr. 8, 2003
6541784 Electron beam exposure system and exposing method using an electron beam Apr. 1, 2003
6538248 Charged particle beam scanning type automatic inspecting apparatus Mar. 25, 2003
6538255 Electron gun and electron-beam optical systems and methods including detecting and adjusting transverse beam-intensity profile, and device manufacturing methods including same Mar. 25, 2003
6534775 Electrostatic trap for particles entrained in an ion beam Mar. 18, 2003
6528787 Scanning electron microscope Mar. 4, 2003
6528799 Device and method for suppressing space charge induced aberrations in charged-particle projection lithography systems Mar. 4, 2003
6528804 Method and apparatus for low energy ion implantation Mar. 4, 2003
6525324 Charged-particle-beam projection optical system Feb. 25, 2003
6525326 System and method for removing particles entrained in an ion beam Feb. 25, 2003
6525327 Ion implanter and beam stop therefor Feb. 25, 2003
6525328 Electron beam lithography system and pattern writing method Feb. 25, 2003
6521896 Blanker assembly employing dielectric material Feb. 18, 2003
6521903 Deflection noise reduction in charged particle beam lithography Feb. 18, 2003
6515287 Sectored magnetic lens and method of use Feb. 4, 2003
6515409 Charged-particle beam exposure apparatus, exposure system, control method therefor, and device manufacturing method Feb. 4, 2003

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