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Class Information
Number: 250/398
Name: Radiant energy > With charged particle beam deflection or focussing > With target means
Description: Subject matter having means to hold, position or accommodate an object to be irradiated by the beam, or such an object itself in combination with the lens.










Sub-classes under this class:

Class Number Class Name Patents
250/399 Secondary emissive type 110
250/400 With means to convey or guide the target 118


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 Next

Patent Number Title Of Patent Date Issued
6774373 Adjustable implantation angle workpiece support structure for an ion beam implanter Aug. 10, 2004
6774379 Electron beam exposure apparatus and deflection amount correction method Aug. 10, 2004
6770889 Method of controlling electrostatic lens and ion implantation apparatus Aug. 3, 2004
6768117 Immersion lens with magnetic shield for charged particle beam system Jul. 27, 2004
6765202 Microscope having an electron beam for illumination Jul. 20, 2004
6763316 Method for measurement of beam emittance in a charged particle transport system Jul. 13, 2004
6753534 Positioning stage with stationary and movable magnet tracks Jun. 22, 2004
6750462 Ion implanting method and apparatus Jun. 15, 2004
6747279 Objective lens for a charged particle beam device Jun. 8, 2004
6744057 Convergent charged particle beam apparatus and inspection method using same Jun. 1, 2004
6740888 Electron beam apparatus May. 25, 2004
6740894 Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor May. 25, 2004
6737647 Array for achromatic imaging of a pulsed particle beam May. 18, 2004
6734447 Electron filter for current implanter May. 11, 2004
6727507 Electron beam proximity exposure apparatus and method Apr. 27, 2004
6724001 Electron beam lithography apparatus with self actuated vacuum bypass valve Apr. 20, 2004
6717141 Reduction of aberrations produced by Wien filter in a scanning electron microscope and the like Apr. 6, 2004
6710338 Focused ion beam system Mar. 23, 2004
6703613 Energy spectrum measuring apparatus, electron energy loss spectrometer, electron microscope provided therewith, and electron energy loss spectrum measuring method Mar. 9, 2004
6703623 Electron beam proximity exposure apparatus Mar. 9, 2004
6693282 Particle-optical apparatus including a particle source that can be switched between high brightness and large beam current Feb. 17, 2004
6693283 Beam scanning system for a heavy ion gantry Feb. 17, 2004
6693288 Charged particle beam irradiation apparatus and irradiation method using the apparatus Feb. 17, 2004
6683319 System and method for irradiation with improved dosage uniformity Jan. 27, 2004
6680480 Laser accelerator produced colliding ion beams fusion device Jan. 20, 2004
6677599 System and method for uniformly implanting a wafer with an ion beam Jan. 13, 2004
6674073 Scattering target-holding mechanism and an electron spin analyzer Jan. 6, 2004
6670620 Electron gun, illumination apparatus using the electron gun, and electron beam exposure apparatus using the illumination apparatus Dec. 30, 2003
6670625 Method and apparatus for correcting multipole aberrations of an electron beam in an EBT scanner Dec. 30, 2003
6667483 Apparatus using charged particle beam Dec. 23, 2003
6667486 Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the same Dec. 23, 2003
6664545 Gate for modulating beam of charged particles and method for making same Dec. 16, 2003
6657203 Misalignment inspection method, charge beam exposure method, and substrate for pattern observation Dec. 2, 2003
6657204 Cooling of voice coil motors in lithographic projection apparatus Dec. 2, 2003
6645823 Reticle and method of fabricating semiconductor device Nov. 11, 2003
6646261 SEM provided with a secondary electron detector having a central electrode Nov. 11, 2003
6646267 Method for eliminating first, second and third-order axial image deformations during correction of the third-order spherical aberration in electron optical systems Nov. 11, 2003
6646275 Charged particle beam exposure system and method Nov. 11, 2003
6646276 Ion implantation beam monitor Nov. 11, 2003
6642529 Methods for the automated testing of reticle feature geometries Nov. 4, 2003
6639218 Electron spin analyzer Oct. 28, 2003
6639221 Annular illumination method for charged particle projection optics Oct. 28, 2003
6639225 Six-axis positioning system having a zero-magnetic-field space Oct. 28, 2003
6635873 Scanning electron microscope with voltage applied to the sample Oct. 21, 2003
6635881 Charged-particle-beam projection-lens system exhibiting reduced blur and geometric distortion, and microlithography apparatus including same Oct. 21, 2003
6635882 Gantry system and method for operating same Oct. 21, 2003
6635890 Slit double gap buncher and method for improved ion bunching in an ion implantation system Oct. 21, 2003
6633046 Method and apparatus for detecting that two moveable members are correctly positioned relatively to one another Oct. 14, 2003
6627874 Pressure measurement using ion beam current in a mass spectrometer Sep. 30, 2003
6627887 System and method for constructing a profile of a structure in an integrated circuit Sep. 30, 2003

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