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Class Information
Number: 250/309
Name: Radiant energy > Inspection of solids or liquids by charged particles > Positive ion probe or microscope type
Description: Subject matter wherein the charged particles are positively charged.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6107629 |
Method to determine depth profiles in an area of thin coating |
Aug. 22, 2000 |
| 6080991 |
Method for milling a transmission electron microscope test slice |
Jun. 27, 2000 |
| 6080986 |
Secondary ion mass spectrometer with aperture mask |
Jun. 27, 2000 |
| 6078045 |
Process for analysis of a sample |
Jun. 20, 2000 |
| 6043489 |
Positron source |
Mar. 28, 2000 |
| 6039000 |
Focused particle beam systems and methods using a tilt column |
Mar. 21, 2000 |
| 6037588 |
Method for testing semiconductor device |
Mar. 14, 2000 |
| 6031229 |
Automatic sequencing of FIB operations |
Feb. 29, 2000 |
| 6008491 |
Time-of-flight SIMS/MSRI reflectron mass analyzer and method |
Dec. 28, 1999 |
| 5969355 |
Focused ion beam optical axis adjustment method and focused ion beam apparatus |
Oct. 19, 1999 |
| 5952658 |
Method and system for judging milling end point for use in charged particle beam milling system |
Sep. 14, 1999 |
| 5943548 |
Method of analyzing a wafer in a semiconductor device fabrication process |
Aug. 24, 1999 |
| 5920068 |
Analysis of semiconductor surfaces by secondary ion mass spectrometry |
Jul. 6, 1999 |
| 5917186 |
Focused ion beam optical axis adjustment method and focused ion beam apparatus |
Jun. 29, 1999 |
| 5877891 |
Scanning probe microscope having a single viewing device for on-axis and oblique optical views |
Mar. 2, 1999 |
| 5854488 |
Ion beam machining method and device thereof |
Dec. 29, 1998 |
| 5852297 |
Focused ion beam apparatus and method for irradiating focused ion beam |
Dec. 22, 1998 |
| 5821549 |
Through-the-substrate investigation of flip-chip IC's |
Oct. 13, 1998 |
| 5801472 |
Micro-fabricated device with integrated electrostatic actuator |
Sep. 1, 1998 |
| 5798529 |
Focused ion beam metrology |
Aug. 25, 1998 |
| 5753914 |
Method and apparatus for investigating the physical properties of material surface layer |
May. 19, 1998 |
| 5714757 |
Surface analyzing method and its apparatus |
Feb. 3, 1998 |
| 5689112 |
Apparatus for detection of surface contaminations on silicon wafers |
Nov. 18, 1997 |
| 5656811 |
Method for making specimen and apparatus thereof |
Aug. 12, 1997 |
| 5637870 |
Method of analysis of distribution of concentration of substrate |
Jun. 10, 1997 |
| 5637879 |
Focused ion beam column with electrically variable blanking aperture |
Jun. 10, 1997 |
| 5633495 |
Process for operating a time-of-flight secondary-ion mass spectrometer |
May. 27, 1997 |
| 5619034 |
Differentiating mass spectrometer |
Apr. 8, 1997 |
| 5616921 |
Self-masking FIB milling |
Apr. 1, 1997 |
| 5602390 |
Electrostatic repulsion ion microscope |
Feb. 11, 1997 |
| 5601982 |
Method and apparatus for determining the sequence of polynucleotides |
Feb. 11, 1997 |
| 5591970 |
Charged beam apparatus |
Jan. 7, 1997 |
| 5578822 |
Particle-optical apparatus comprising a detector for secondary electrons |
Nov. 26, 1996 |
| 5576542 |
Substrate cross-section observing apparatus |
Nov. 19, 1996 |
| 5574280 |
Focused ion beam apparatus and method |
Nov. 12, 1996 |
| 5569919 |
X-ray analytical apparatus |
Oct. 29, 1996 |
| 5541411 |
Image-to-image registration focused ion beam system |
Jul. 30, 1996 |
| 5539203 |
Single ion implantation system |
Jul. 23, 1996 |
| 5532494 |
Treatment and observation apparatus using scanning probe |
Jul. 2, 1996 |
| 5528034 |
Method of ultra high sensitivity hydrogen detection with slow multiply-charged ions |
Jun. 18, 1996 |
| 5521377 |
Measurement of trace element concentration distribution, and evaluation of carriers, in semiconductors, and preparation of standard samples |
May. 28, 1996 |
| 5504340 |
Process method and apparatus using focused ion beam generating means |
Apr. 2, 1996 |
| 5502305 |
Measurement of trace element concentration distribution, and evaluation of carriers, in semiconductors, and preparation of standard samples |
Mar. 26, 1996 |
| 5495110 |
Observation method and apparatus for removing an oxidation layer and forming an image from a sample |
Feb. 27, 1996 |
| 5442174 |
Measurement of trace element concentration distribution, and evaluation of carriers, in semiconductors, and preparation of standard samples |
Aug. 15, 1995 |
| 5440124 |
High mass resolution local-electrode atom probe |
Aug. 8, 1995 |
| 5438197 |
Focused ion beam apparatus |
Aug. 1, 1995 |
| 5434422 |
Sample position controller in focused ion beam system |
Jul. 18, 1995 |
| 5406080 |
Process for monitoring ion-assisted processing procedures on wafers and an apparatus for carrying out the same |
Apr. 11, 1995 |
| 5401965 |
Secondary ion mass spectrometer for analyzing positive and negative ions |
Mar. 28, 1995 |
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