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Class Information
Number: 219/121.42
Name: Electric heating > Metal heating (e.g., resistance heating) > By arc > Using plasma > Cutting > Etching > Rate control
Description: Subject matter wherein the speed of removal of material from a workpiece by a plasma torch is regulated (e.g., by controlling gas flow or power to the torch).
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7297892 |
Systems and methods for laser-assisted plasma processing |
Nov. 20, 2007 |
| 6888094 |
Plasma processing method and plasma processing apparatus |
May. 3, 2005 |
| 6747239 |
Plasma processing apparatus and method |
Jun. 8, 2004 |
| 6700090 |
Plasma processing method and plasma processing apparatus |
Mar. 2, 2004 |
| 6552296 |
Toroidal low-field reactive gas source |
Apr. 22, 2003 |
| 6392187 |
Apparatus and method for utilizing a plasma density gradient to produce a flow of particles |
May. 21, 2002 |
| 6288357 |
Ion milling planarization of semiconductor workpieces |
Sep. 11, 2001 |
| 6215087 |
Plasma film forming method and plasma film forming apparatus |
Apr. 10, 2001 |
| 6153849 |
Method and apparatus for preventing etch rate drop after machine idle in plasma etch chamber |
Nov. 28, 2000 |
| 5928532 |
Method of detecting end point of plasma processing and apparatus for the same |
Jul. 27, 1999 |
| 5895586 |
Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum |
Apr. 20, 1999 |
| 5780803 |
Process for the stabilization of plasma generation by means of electron beam vaporizer |
Jul. 14, 1998 |
| 5726412 |
Linear microwave source for plasma surface treatment |
Mar. 10, 1998 |
| 5449880 |
Process and apparatus for forming a deposited film using microwave-plasma CVD |
Sep. 12, 1995 |
| 5444207 |
Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field |
Aug. 22, 1995 |
| 5399830 |
Plasma treatment apparatus |
Mar. 21, 1995 |
| 5245157 |
Microwave plasma processing or semiconductor devices |
Sep. 14, 1993 |
| 5225651 |
Device for low-temperature plasma surface treatment of a plate or a sheet of a metallic material |
Jul. 6, 1993 |
| 5218179 |
Plasma source arrangement for ion implantation |
Jun. 8, 1993 |
| 5153406 |
Microwave source |
Oct. 6, 1992 |
| 5061838 |
Toroidal electron cyclotron resonance reactor |
Oct. 29, 1991 |
| 4987284 |
Downstream microwave plasma processing apparatus having an improved coupling structure between microwave plasma |
Jan. 22, 1991 |
| 4894510 |
Apparatus for uniformly distributing plasma over a substrate |
Jan. 16, 1990 |
| 4891488 |
Processing apparatus and method |
Jan. 2, 1990 |
| 4698481 |
Method for preventing decomposition of silicon carbide articles during high temperature plasma furnace sintering |
Oct. 6, 1987 |
| 4695700 |
Dual detector system for determining endpoint of plasma etch process |
Sep. 22, 1987 |
| 4612432 |
Etching plasma generator diffusor and cap |
Sep. 16, 1986 |
| 4611110 |
Method and apparatus for connecting a plasma generator to a reactor |
Sep. 9, 1986 |
| 4578559 |
Plasma etching method |
Mar. 25, 1986 |
| 4574177 |
Plasma etch method for TiO.sub.2 |
Mar. 4, 1986 |
| 4529860 |
Plasma etching of organic materials |
Jul. 16, 1985 |
| 4431898 |
Inductively coupled discharge for plasma etching and resist stripping |
Feb. 14, 1984 |
| 4412119 |
Method for dry-etching |
Oct. 25, 1983 |
| 4388140 |
Apparatus for wet treatment of wafer materials |
Jun. 14, 1983 |
| 4377734 |
Method for forming patterns by plasma etching |
Mar. 22, 1983 |
| 4361749 |
Uniformly cooled plasma etching electrode |
Nov. 30, 1982 |
| 4357195 |
Apparatus for controlling a plasma reaction |
Nov. 2, 1982 |
| 4352974 |
Plasma etcher having isotropic subchamber with gas outlet for producing uniform etching |
Oct. 5, 1982 |
| 4348577 |
High selectivity plasma etching method |
Sep. 7, 1982 |
| 4342901 |
Plasma etching electrode |
Aug. 3, 1982 |
| 4307283 |
Plasma etching apparatus II-conical-shaped projection |
Dec. 22, 1981 |
| 4253907 |
Anisotropic plasma etching |
Mar. 3, 1981 |
| 4138306 |
Apparatus for the treatment of semiconductors |
Feb. 6, 1979 |
| 4062102 |
Process for manufacturing a solar cell from a reject semiconductor wafer |
Dec. 13, 1977 |
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