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Class Information
Number: 219/121.4
Name: Electric heating > Metal heating (e.g., resistance heating) > By arc > Using plasma > Cutting > Etching
Description: Subject matter wherein eroding or abrading is accomplished with a plasma torch.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7554054 |
High-frequency heating device, semiconductor manufacturing device, and light source device |
Jun. 30, 2009 |
| 7491908 |
Plasma processing device and ashing method |
Feb. 17, 2009 |
| 7371992 |
Method for non-contact cleaning of a surface |
May. 13, 2008 |
| 7335851 |
Gap measurement apparatus |
Feb. 26, 2008 |
| 7304264 |
Micro thermal chamber having proximity control temperature management for devices under test |
Dec. 4, 2007 |
| 7297894 |
Method for multi-step temperature control of a substrate |
Nov. 20, 2007 |
| 7256134 |
Selective etching of carbon-doped low-k dielectrics |
Aug. 14, 2007 |
| 7199327 |
Method and system for arc suppression in a plasma processing system |
Apr. 3, 2007 |
| 7189940 |
Plasma-assisted melting |
Mar. 13, 2007 |
| 7176402 |
Method and apparatus for processing electronic parts |
Feb. 13, 2007 |
| 7161111 |
Plasma torch having a quick-connect retaining cup |
Jan. 9, 2007 |
| 7141757 |
Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent |
Nov. 28, 2006 |
| 7071442 |
Plasma processing apparatus |
Jul. 4, 2006 |
| 7067761 |
Semiconductor device manufacturing system for etching a semiconductor by plasma discharge |
Jun. 27, 2006 |
| 7015416 |
Plasma cutting torch speed modulation |
Mar. 21, 2006 |
| 6943316 |
Arrangement for generating an active gas jet |
Sep. 13, 2005 |
| 6894245 |
Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression |
May. 17, 2005 |
| 6870123 |
Microwave applicator, plasma processing apparatus having same, and plasma processing method |
Mar. 22, 2005 |
| 6855908 |
Glass substrate and leveling thereof |
Feb. 15, 2005 |
| 6847003 |
Plasma processing apparatus |
Jan. 25, 2005 |
| 6838635 |
Plasma reactor with overhead RF electrode tuned to the plasma |
Jan. 4, 2005 |
| 6806437 |
Inductively coupled plasma generating apparatus incorporating double-layered coil antenna |
Oct. 19, 2004 |
| 6774335 |
Plasma reactor and gas modification method |
Aug. 10, 2004 |
| 6770836 |
Impedance matching circuit for inductively coupled plasma source |
Aug. 3, 2004 |
| 6756559 |
Plasma etching apparatus |
Jun. 29, 2004 |
| 6717368 |
Plasma generator using microwave |
Apr. 6, 2004 |
| 6700089 |
Plasma processing device, its maintenance method, and its installation method |
Mar. 2, 2004 |
| 6680455 |
Plasma resistant quartz glass jig |
Jan. 20, 2004 |
| 6659110 |
Method and apparatus for cleaning drums or belts |
Dec. 9, 2003 |
| 6616767 |
High temperature ceramic heater assembly with RF capability |
Sep. 9, 2003 |
| 6603091 |
Cleaning device with deeply reaching plasma and assisting electrodes |
Aug. 5, 2003 |
| 6504126 |
Plasma reactor with coil antenna of concentrically spiral conductors with ends in common regions |
Jan. 7, 2003 |
| 6455806 |
Arrangement for shaping and marking a target |
Sep. 24, 2002 |
| 6433298 |
Plasma processing apparatus |
Aug. 13, 2002 |
| 6429399 |
Discharge tube for a local etching apparatus and a local etching apparatus using the discharge tube |
Aug. 6, 2002 |
| 6423924 |
Method for treating the surface of a material or an object and implementing device |
Jul. 23, 2002 |
| 6396024 |
Permanent magnet ECR plasma source with integrated multipolar magnetic confinement |
May. 28, 2002 |
| 6376795 |
Direct current dechucking system |
Apr. 23, 2002 |
| 6373022 |
Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry |
Apr. 16, 2002 |
| 6369349 |
Plasma reactor with coil antenna of interleaved conductors |
Apr. 9, 2002 |
| 6369348 |
Plasma reactor with coil antenna of plural helical conductors with equally spaced ends |
Apr. 9, 2002 |
| 6348669 |
RF/microwave energized plasma light source |
Feb. 19, 2002 |
| 6339206 |
Apparatus and method for adjusting density distribution of a plasma |
Jan. 15, 2002 |
| 6326574 |
Sleeve for an adapter flange of the gasonics L3510 etcher |
Dec. 4, 2001 |
| 6320157 |
Corona station for the preliminary processing of a strip material |
Nov. 20, 2001 |
| 6303895 |
Method and apparatus for controlling a temperature of a wafer |
Oct. 16, 2001 |
| 6297468 |
Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal |
Oct. 2, 2001 |
| 6277659 |
Substrate removal using thermal analysis |
Aug. 21, 2001 |
| 6268582 |
ECR plasma CVD apparatus |
Jul. 31, 2001 |
| 6252239 |
Substrate removal from a semiconductor chip structure having buried insulator (BIN) |
Jun. 26, 2001 |
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