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Class Information
Number: 216/99
Name: Etching a substrate: processes > Nongaseous phase etching of substrate > Etching inorganic substrate > Substrate contains silicon or silicon compound
Description: Process wherein the substrate contains silicon in either elemental form or combined form.


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13

Patent Number Title Of Patent Date Issued
7591959 Etchants and etchant systems with plural etch selectivities Sep. 22, 2009
7591958 Thin glass chip for an electronic component and manufacturing method Sep. 22, 2009
7581645 Method for manufacturing carbon nanotubes with desired length Sep. 1, 2009
7582219 Method of fabricating reflective mirror by wet-etch using improved mask pattern and reflective mirror fabricated using the same Sep. 1, 2009
7582221 Wafer manufacturing method, polishing apparatus, and wafer Sep. 1, 2009
7578889 Methodology for cleaning of surface metal contamination from electrode assemblies Aug. 25, 2009
7578943 Liquid discharge head and producing method therefor Aug. 25, 2009
7572661 Method for manufacturing a micromechanical sensor element Aug. 11, 2009
7569412 Method for manufacturing a diaphragm sensor Aug. 4, 2009
7569491 Method for enlarging a nano-structure Aug. 4, 2009
7560036 System and method for drug delivery and microfluidic applications using microneedles Jul. 14, 2009
7540968 Micro movable device and method of making the same using wet etching Jun. 2, 2009
7524767 Method for manufacturing a micro-electro-mechanical structure Apr. 28, 2009
7524430 Fluid ejection device structures and methods therefor Apr. 28, 2009
7501072 Etching solution comprising hydrofluoric acid Mar. 10, 2009
7479232 Method for producing a semiconductor component and a semiconductor component produced according to the method Jan. 20, 2009
7479461 Method of etching silicon anisotropically Jan. 20, 2009
7468323 Method of forming high aspect ratio structures Dec. 23, 2008
7456113 Cleaning method and solution for cleaning a wafer in a single wafer process Nov. 25, 2008
7442319 Poly etch without separate oxide decap Oct. 28, 2008
7442317 Method of forming a nozzle rim Oct. 28, 2008
7439183 Method of manufacturing a semiconductor device, and a semiconductor substrate Oct. 21, 2008
7416984 Method of producing a MEMS device Aug. 26, 2008
7416674 Method for fabricating micro optical elements using CMP Aug. 26, 2008
7405165 Dual-tank etch method for oxide thickness control Jul. 29, 2008
7399430 Method for manufacturing phosphor, phosphor and plasma display panel Jul. 15, 2008
7396483 Uniform chemical etching method Jul. 8, 2008
7396484 Methods of fabricating complex blade geometries from silicon wafers and strengthening blade geometries Jul. 8, 2008
7390745 Pattern enhancement by crystallographic etching Jun. 24, 2008
7387742 Silicon blades for surgical and non-surgical use Jun. 17, 2008
7384486 Chamber cleaning method Jun. 10, 2008
7381340 Ink jet printhead that incorporates an etch stop layer Jun. 3, 2008
7365012 Etching method, a method of forming a trench isolation structure, a semiconductor substrate and a semiconductor apparatus Apr. 29, 2008
7362488 Tiltable-body apparatus, and method of fabricating the same Apr. 22, 2008
7354523 Methods for sidewall etching and etching during filling of a trench Apr. 8, 2008
7344652 Plasma etching method Mar. 18, 2008
7338610 Etching method for manufacturing semiconductor device Mar. 4, 2008
7322104 Method for producing an ink jet head Jan. 29, 2008
7316981 Method of removing silicon from a substrate Jan. 8, 2008
7306637 Anionic abrasive particles treated with positively charged polyelectrolytes for CMP Dec. 11, 2007
7306744 Method of manufacturing a nozzle plate Dec. 11, 2007
7300598 Substrate processing method and apparatus Nov. 27, 2007
7294279 Method for releasing a micromechanical structure Nov. 13, 2007
7279424 Method for fabricating thin film magnetic heads using CMP with polishing stop layer Oct. 9, 2007
7277214 Tiltable-body apparatus, and method of fabricating the same Oct. 2, 2007
7270763 Anisotropic wet etching of silicon Sep. 18, 2007
7255800 Wet etching process Aug. 14, 2007
7255801 Deep submicron CMOS compatible suspending inductor Aug. 14, 2007
7247248 Method of forming atomic force microscope tips Jul. 24, 2007
7247247 Selective etching method Jul. 24, 2007

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