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Class Information
Number: 216/96
Name: Etching a substrate: processes > Nongaseous phase etching of substrate > Etching inorganic substrate
Description: Process wherein at least one of layers of the substrate contains inorganic material.










Sub-classes under this class:

Class Number Class Name Patents
216/100 Substrate contains elemental metal, alloy thereof, or metal compound 617
216/99 Substrate contains silicon or silicon compound 754
216/97 Substrate is glass 367


Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
4076564 Roughened imaging surface for cleaning Feb. 28, 1978

1 2 3 4 5 6










 
 
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