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Class Information
Number: 216/90
Name: Etching a substrate: processes > Nongaseous phase etching of substrate > Relative movement between the substrate and a confined pool of etchant
Description: Process including the step of causing a relative motion between a substrate being etched and an etchant which is confined in a container, (e.g., dipping, ultrasonic vibrating., etc.):

Sub-classes under this class:

Class Number Class Name Patents
216/91 Rotating, repeated dipping, or advancing movement of substrate 179

Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8703004 Method for chemical planarization and chemical planarization apparatus Apr. 22, 2014
8691695 CMP compositions and methods for suppressing polysilicon removal rates Apr. 8, 2014
8685864 Method and device for treating a substrate surface of a substrate Apr. 1, 2014
8673784 Method for producing silicon epitaxial wafer Mar. 18, 2014
8562855 Silicon etching liquid and etching method Oct. 22, 2013
8563440 Method for chemically treating a substrate Oct. 22, 2013
8557132 Inline monitoring of pad loading for CuCMP and developing an endpoint technique for cleaning Oct. 15, 2013
8557137 Polishing composition for nickel phosphorous memory disks Oct. 15, 2013
8546261 Slurry for polishing and planarization method of insulating layer using the same Oct. 1, 2013
8518297 Polishing composition and polishing method using the same Aug. 27, 2013
8512543 Method for fluid processing a workpiece Aug. 20, 2013
8501028 Method for grinding a semiconductor wafer Aug. 6, 2013
8496843 Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride Jul. 30, 2013
8491808 Method of polishing a substrate comprising polysilicon, silicon oxide and silicon nitride Jul. 23, 2013
8492277 Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride Jul. 23, 2013
8466071 Method for etching single wafer Jun. 18, 2013
8377825 Semiconductor wafer re-use using chemical mechanical polishing Feb. 19, 2013
8334210 Method and apparatus of manufacturing semiconductor device Dec. 18, 2012
8226841 Polishing composition for nickel-phosphorous memory disks Jul. 24, 2012
7964508 Dielectric trenches, nickel/tantalum oxide structures, and chemical mechanical polishing techniques Jun. 21, 2011
7887713 Method for producing an electronic component Feb. 15, 2011
7851375 Alkaline etchant for controlling surface roughness of semiconductor wafer Dec. 14, 2010
7833428 Processes and apparatuses for producing porous materials Nov. 16, 2010
7790052 Substrate receiving method Sep. 7, 2010
7686973 Silicon wafer etching method and apparatus, and impurity analysis method Mar. 30, 2010
7566404 Method of fabricating a thin film transistor Jul. 28, 2009
7527743 Apparatus and method for etching insulating film May. 5, 2009
7521373 Compositions for dissolution of low-k dielectric films, and methods of use Apr. 21, 2009
7513986 Method and device for locally removing coating from parts Apr. 7, 2009
7494597 Method and apparatus for etching disk-like member Feb. 24, 2009
7449124 Method of polishing a wafer Nov. 11, 2008
7425278 Process of etching a titanium/tungsten surface and etchant used therein Sep. 16, 2008
7387963 Semiconductor wafer and process for producing a semiconductor wafer Jun. 17, 2008
7364666 Flexible circuits and method of making same Apr. 29, 2008
7314575 Manufacturing method of glass substrate for magnetic disk, and manufacturing method of magnetic disk Jan. 1, 2008
7307023 Polishing method of Cu film and method for manufacturing semiconductor device Dec. 11, 2007
7291282 Method of fabricating a mold for imprinting a structure Nov. 6, 2007
7291283 Combined wet etching method for stacked films and wet etching system used for same Nov. 6, 2007
7288207 Etching liquid for controlling silicon wafer surface shape and method for manufacturing silicon wafer using the same Oct. 30, 2007
7279115 Method to reduce stacking fault nucleation sites and reduce V.sub.f drift in bipolar devices Oct. 9, 2007
7276449 Gas assisted method for applying resist stripper and gas-resist stripper combinations Oct. 2, 2007
7252782 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method Aug. 7, 2007
7182821 Substrate processing method and substrate processing apparatus Feb. 27, 2007
7122126 Wet processing using a fluid meniscus, apparatus and method Oct. 17, 2006
7094131 Microelectronic substrate having conductive material with blunt cornered apertures, and associated methods for removing conductive material Aug. 22, 2006
7090786 Aqueous dispersion for chemical/mechanical polishing Aug. 15, 2006
7063800 Methods of cleaning copper surfaces in the manufacture of printed circuit boards Jun. 20, 2006
7056447 Semiconductor processing methods Jun. 6, 2006
7022244 Method and apparatus for generation of fine particles Apr. 4, 2006
7018554 Method to reduce stacking fault nucleation sites and reduce forward voltage drift in bipolar devices Mar. 28, 2006

1 2 3 4

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