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Class Information
Number: 216/90
Name: Etching a substrate: processes > Nongaseous phase etching of substrate > Relative movement between the substrate and a confined pool of etchant
Description: Process including the step of causing a relative motion between a substrate being etched and an etchant which is confined in a container, (e.g., dipping, ultrasonic vibrating., etc.):


Sub-classes under this class:

Class Number Class Name Patents
216/91 Rotating, repeated dipping, or advancing movement of substrate 140


Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
7387963 Semiconductor wafer and process for producing a semiconductor wafer Jun. 17, 2008
7364666 Flexible circuits and method of making same Apr. 29, 2008
7314575 Manufacturing method of glass substrate for magnetic disk, and manufacturing method of magnetic disk Jan. 1, 2008
7307023 Polishing method of Cu film and method for manufacturing semiconductor device Dec. 11, 2007
7291282 Method of fabricating a mold for imprinting a structure Nov. 6, 2007
7291283 Combined wet etching method for stacked films and wet etching system used for same Nov. 6, 2007
7288207 Etching liquid for controlling silicon wafer surface shape and method for manufacturing silicon wafer using the same Oct. 30, 2007
7279115 Method to reduce stacking fault nucleation sites and reduce V.sub.f drift in bipolar devices Oct. 9, 2007
7276449 Gas assisted method for applying resist stripper and gas-resist stripper combinations Oct. 2, 2007
7252782 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method Aug. 7, 2007
7182821 Substrate processing method and substrate processing apparatus Feb. 27, 2007
7122126 Wet processing using a fluid meniscus, apparatus and method Oct. 17, 2006
7094131 Microelectronic substrate having conductive material with blunt cornered apertures, and associated methods for removing conductive material Aug. 22, 2006
7090786 Aqueous dispersion for chemical/mechanical polishing Aug. 15, 2006
7063800 Methods of cleaning copper surfaces in the manufacture of printed circuit boards Jun. 20, 2006
7056447 Semiconductor processing methods Jun. 6, 2006
7022244 Method and apparatus for generation of fine particles Apr. 4, 2006
7018554 Method to reduce stacking fault nucleation sites and reduce forward voltage drift in bipolar devices Mar. 28, 2006
6936183 Etch process for etching microstructures Aug. 30, 2005
6884361 Method for making a mirror for photolithography Apr. 26, 2005
6869889 Etching metal carbide films Mar. 22, 2005
6861005 Generating nitride waveguides Mar. 1, 2005
6861007 Method for removing organic material from a substrate and for oxidizing oxidizable material thereon Mar. 1, 2005
6831307 Semiconductor mounting system Dec. 14, 2004
6802911 Method for cleaning damaged layers and polymer residue from semiconductor device Oct. 12, 2004
6798128 Cathode-ray tube cathode and alloy therefor Sep. 28, 2004
6730605 Redistribution of copper deposited films May. 4, 2004
6726847 Silver stain removal by chemical etching and sonication Apr. 27, 2004
6716365 Method for wet etching and wet etching apparatus Apr. 6, 2004
6699400 Etch process and apparatus therefor Mar. 2, 2004
6660640 Process for planarizing patterned metal structures for magnetic thin film heads Dec. 9, 2003
6648933 Powder composition and method for polishing stone Nov. 18, 2003
6624087 Etchant for patterning indium tin oxide and method of fabricating liquid crystal display device using the same Sep. 23, 2003
6616514 High selectivity CMP slurry Sep. 9, 2003
6586143 Accurate wafer patterning method for mass production Jul. 1, 2003
6579798 Processes for chemical-mechanical polishing of a semiconductor wafer Jun. 17, 2003
6566268 Method and apparatus for planarizing a wafer surface of a semiconductor wafer having an elevated portion extending therefrom May. 20, 2003
6547974 Method of producing fine-line circuit boards using chemical polishing Apr. 15, 2003
6497238 Method of manufacturing electronic devices and apparatus for carrying out such a method Dec. 24, 2002
6461470 Apparatus for etching glass substrate Oct. 8, 2002
6440320 Substrate processing method and apparatus Aug. 27, 2002
6409936 Composition and method of formation and use therefor in chemical-mechanical polishing Jun. 25, 2002
6402883 Polishing pad conditioning surface having integral conditioning points Jun. 11, 2002
6383332 Endpoint detection method and apparatus which utilize a chelating agent to detect a polishing endpoint May. 7, 2002
6361646 Method and apparatus for endpoint detection for chemical mechanical polishing Mar. 26, 2002
6361708 Method and apparatus for polishing a metal film Mar. 26, 2002
6351682 Semiconductor processing workpiece position sensing Feb. 26, 2002
6340434 Method and apparatus for chemical-mechanical polishing Jan. 22, 2002
6303041 Method and bath for tapering optical fibers Oct. 16, 2001
6264848 Method for providing track position and identification information for data storage devices Jul. 24, 2001

1 2 3 4


 
 
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