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Class Information
Number: 216/84
Name: Etching a substrate: processes > Nongaseous phase etching of substrate > With measuring, testing, or inspecting
Description: Process including the step of visually, chemically, or physically determining or measuring a variable condition or property of the substrate or the etching process.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7395611 |
System processing a substrate using dynamic liquid meniscus |
Jul. 8, 2008 |
| 7393790 |
Method of manufacturing carrier wafer and resulting carrier wafer structures |
Jul. 1, 2008 |
| 7384569 |
Imprint lithography mask trimming for imprint mask using etch |
Jun. 10, 2008 |
| 7371686 |
Method and apparatus for polishing a semiconductor device |
May. 13, 2008 |
| 7361286 |
Method of detecting etching end-point |
Apr. 22, 2008 |
| 7361600 |
Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus |
Apr. 22, 2008 |
| 7354733 |
Method for sorting and separating living cells |
Apr. 8, 2008 |
| 7340372 |
Apparatus and method for investigating parameters of layers deposited on semiconductor wafers |
Mar. 4, 2008 |
| 7312154 |
Method of polishing a semiconductor-on-insulator structure |
Dec. 25, 2007 |
| 7300598 |
Substrate processing method and apparatus |
Nov. 27, 2007 |
| 7291282 |
Method of fabricating a mold for imprinting a structure |
Nov. 6, 2007 |
| 7291565 |
Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid |
Nov. 6, 2007 |
| 7252778 |
Etching method and etching device |
Aug. 7, 2007 |
| 7199053 |
Method for detecting end-point of chemical mechanical polishing process |
Apr. 3, 2007 |
| 7165560 |
Etching method, etching apparatus, and method for manufacturing semiconductor device |
Jan. 23, 2007 |
| 7160479 |
Method and apparatus for evaluating panel drip tests |
Jan. 9, 2007 |
| 7141179 |
Monitoring semiconductor wafer defects below one nanometer |
Nov. 28, 2006 |
| 7127831 |
Methods and systems for processing a substrate using a dynamic liquid meniscus |
Oct. 31, 2006 |
| 7097783 |
Method for inspecting a titanium-based component |
Aug. 29, 2006 |
| 7097784 |
Etching method and apparatus for semiconductor wafers |
Aug. 29, 2006 |
| 7077974 |
Fine-dimension masks and related processes |
Jul. 18, 2006 |
| 7052624 |
Manufacturing method for an electronic device, and the electronic device |
May. 30, 2006 |
| 7026255 |
Method and device for photo-electrochemically etching a semiconductor sample, especially gallium nitride |
Apr. 11, 2006 |
| 7020577 |
Apparatus and method for investigating semiconductors wafer |
Mar. 28, 2006 |
| 7011762 |
Metal bridging monitor for etch and CMP endpoint detection |
Mar. 14, 2006 |
| 6995091 |
Process for chemically mechanically polishing wafers |
Feb. 7, 2006 |
| 6988327 |
Methods and systems for processing a substrate using a dynamic liquid meniscus |
Jan. 24, 2006 |
| 6955987 |
Comparison of chemical-mechanical polishing processes |
Oct. 18, 2005 |
| 6952014 |
End-point detection for FIB circuit modification |
Oct. 4, 2005 |
| 6939476 |
Method for real time metal ETCH critical dimension control |
Sep. 6, 2005 |
| 6936480 |
Method of controlling the chemical mechanical polishing of stacked layers having a surface topology |
Aug. 30, 2005 |
| 6923918 |
Method for implementing an efficient and economical cathode process |
Aug. 2, 2005 |
| 6878303 |
Substrate processing apparatus and substrate processing method |
Apr. 12, 2005 |
| 6864181 |
Method and apparatus to form a planarized Cu interconnect layer using electroless membrane deposition |
Mar. 8, 2005 |
| 6852390 |
Ultraphobic surface for high pressure liquids |
Feb. 8, 2005 |
| 6852643 |
Method for using ammonium fluoride solution in a photoelectrochemical etching process of a silicon wafer |
Feb. 8, 2005 |
| 6843927 |
Method and apparatus for endpoint detection in electron beam assisted etching |
Jan. 18, 2005 |
| 6821792 |
Method and apparatus for determining a sampling plan based on process and equipment state information |
Nov. 23, 2004 |
| 6821794 |
Flexible snapshot in endpoint detection |
Nov. 23, 2004 |
| 6800214 |
Method for correcting characteristics of attenuated phase-shift mask |
Oct. 5, 2004 |
| 6790376 |
Process control based upon weight or mass measurements, and systems for accomplishing same |
Sep. 14, 2004 |
| 6770213 |
Method of inspecting an anisotropic etch in a microstructure |
Aug. 3, 2004 |
| 6764868 |
Use of slurry waste composition to determine the amount of metal removed during chemical mechanical polishing, and system for accomplishing same |
Jul. 20, 2004 |
| 6723650 |
TEM sample preparation using transparent defect protective coating |
Apr. 20, 2004 |
| 6716364 |
Method and apparatus for detecting presence of residual polishing slurry subsequent to polishing of a semiconductor wafer |
Apr. 6, 2004 |
| 6709605 |
Etching method |
Mar. 23, 2004 |
| 6706121 |
Device and method for the treatment of semiconductor wafers |
Mar. 16, 2004 |
| 6686130 |
Pattern forming method using photolithography |
Feb. 3, 2004 |
| 6646711 |
Method for manufacturing display panel having reduced wall thickness and display panel having reduced wall thickness |
Nov. 11, 2003 |
| 6638357 |
Method for revealing agglomerated intrinsic point defects in semiconductor crystals |
Oct. 28, 2003 |
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