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Class Information
Number: 216/79
Name: Etching a substrate: processes > Gas phase etching of substrate > Etching inorganic substrate > Etching silicon containing substrate
Description: Process wherein the material to be etched contains silicon in either elemental or combined form.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7625603 |
Crack and residue free conformal deposited silicon oxide with predictable and uniform etching characteristics |
Dec. 1, 2009 |
| 7622050 |
Process for polishing glass substrate |
Nov. 24, 2009 |
| 7622051 |
Methods for critical dimension control during plasma etching |
Nov. 24, 2009 |
| 7618548 |
Silicon-containing structure with deep etched features, and method of manufacture |
Nov. 17, 2009 |
| 7608196 |
Method of forming high aspect ratio apertures |
Oct. 27, 2009 |
| 7601643 |
Arrangement and method for fabricating a semiconductor wafer |
Oct. 13, 2009 |
| 7597816 |
Wafer bevel polymer removal |
Oct. 6, 2009 |
| 7591958 |
Thin glass chip for an electronic component and manufacturing method |
Sep. 22, 2009 |
| 7585423 |
Liquid discharge head and producing method therefor |
Sep. 8, 2009 |
| 7560039 |
Methods of deep reactive ion etching |
Jul. 14, 2009 |
| 7556740 |
Method for producing a solar cell |
Jul. 7, 2009 |
| 7556741 |
Method for producing a solar cell |
Jul. 7, 2009 |
| 7547635 |
Process for etching dielectric films with improved resist and/or etch profile characteristics |
Jun. 16, 2009 |
| 7524430 |
Fluid ejection device structures and methods therefor |
Apr. 28, 2009 |
| 7514012 |
Pre-oxidization of deformable elements of microstructures |
Apr. 7, 2009 |
| 7514277 |
Etching method and apparatus |
Apr. 7, 2009 |
| 7514014 |
High density plasma chemical vapor deposition process |
Apr. 7, 2009 |
| 7497095 |
Method for producing quartz glass jig and quartz glass jig |
Mar. 3, 2009 |
| 7494598 |
Miniature optically transparent window |
Feb. 24, 2009 |
| 7494599 |
Method for fabricating fine pattern in semiconductor device |
Feb. 24, 2009 |
| 7481230 |
Plasma processing method and apparatus |
Jan. 27, 2009 |
| 7481943 |
Method suitable for etching hydrophillic trenches in a substrate |
Jan. 27, 2009 |
| 7473647 |
Method of forming pattern using fine pitch hard mask |
Jan. 6, 2009 |
| 7468323 |
Method of forming high aspect ratio structures |
Dec. 23, 2008 |
| 7465404 |
Ink-jet printhead and method for manufacturing the same |
Dec. 16, 2008 |
| 7462292 |
Silicon carbide imprint stamp |
Dec. 9, 2008 |
| 7442317 |
Method of forming a nozzle rim |
Oct. 28, 2008 |
| 7435354 |
Treatment method for surface of photoresist layer and method for forming patterned photoresist layer |
Oct. 14, 2008 |
| 7431853 |
Selective etching of oxides from substrates |
Oct. 7, 2008 |
| 7432205 |
Method for controlling polishing process |
Oct. 7, 2008 |
| 7425277 |
Method for hard mask CD trim |
Sep. 16, 2008 |
| 7413992 |
Tungsten silicide etch process with reduced etch rate micro-loading |
Aug. 19, 2008 |
| 7405161 |
Method for fabricating a semiconductor device |
Jul. 29, 2008 |
| 7396711 |
Method of fabricating a multi-cornered film |
Jul. 8, 2008 |
| 7393460 |
Plasma processing method and plasma processing apparatus |
Jul. 1, 2008 |
| 7393788 |
Method and system for selectively etching a dielectric material relative to silicon |
Jul. 1, 2008 |
| 7387743 |
Etching method and apparatus, computer program and computer readable storage medium |
Jun. 17, 2008 |
| 7381340 |
Ink jet printhead that incorporates an etch stop layer |
Jun. 3, 2008 |
| 7368063 |
Method for manufacturing ink-jet printhead |
May. 6, 2008 |
| 7368062 |
Method and apparatus for a low parasitic capacitance butt-joined passive waveguide connected to an active structure |
May. 6, 2008 |
| 7361287 |
Method for etching structures in an etching body by means of a plasma |
Apr. 22, 2008 |
| 7361605 |
System and method for removal of photoresist and residues following contact etch with a stop layer present |
Apr. 22, 2008 |
| 7361285 |
Method for fabricating cliche and method for forming pattern using the same |
Apr. 22, 2008 |
| 7358192 |
Method and apparatus for in-situ film stack processing |
Apr. 15, 2008 |
| 7354695 |
Producing a substrate having high surface-area texturing |
Apr. 8, 2008 |
| 7351347 |
Gallium-nitride deposition substrate, method of manufacturing gallium-nitride deposition substrate, and method of manufacturing gallium nitride substrate |
Apr. 1, 2008 |
| 7344652 |
Plasma etching method |
Mar. 18, 2008 |
| 7341672 |
Method of fabricating printhead for ejecting ink supplied under pulsed pressure |
Mar. 11, 2008 |
| 7341952 |
Multi-layer hard mask structure for etching deep trench in substrate |
Mar. 11, 2008 |
| 7338907 |
Selective etching processes of silicon nitride and indium oxide thin films for FeRAM device applications |
Mar. 4, 2008 |
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