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Class Information
Number: 216/77
Name: Etching a substrate: processes > Gas phase etching of substrate > Etching inorganic substrate > Substrate contains elemental metal, alloy thereof, or metal compound > Etching of substrate containing elemental aluminum, or an alloy or compound thereof
Description: Process wherein the material to be etched contains elemental aluminum or an alloy thereof, or a compound containing aluminum.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7575693 |
Method of aligning nanotubes and wires with an etched feature |
Aug. 18, 2009 |
| 7531102 |
Simultaneous selective polymer deposition and etch pitch doubling for sub 50nm line/space patterning |
May. 12, 2009 |
| 7517810 |
Reduced metal design rules for power devices |
Apr. 14, 2009 |
| 7479235 |
Method for etching a workpiece |
Jan. 20, 2009 |
| 7429337 |
Method for removing at least one area of a layer of a component consisting of metal or a metal compound |
Sep. 30, 2008 |
| 7285229 |
Etchant and replenishment solution therefor, and etching method and method for producing wiring board using the same |
Oct. 23, 2007 |
| 7270761 |
Fluorine free integrated process for etching aluminum including chamber dry clean |
Sep. 18, 2007 |
| 7264677 |
Process for treating solid surface and substrate surface |
Sep. 4, 2007 |
| 7195716 |
Etching process and patterning process |
Mar. 27, 2007 |
| 7189334 |
Printhead fabrication method |
Mar. 13, 2007 |
| 7141508 |
Magnetoresistive effect thin-film magnetic head and manufacturing method of magnetoresistive effect thin-film magnetic head |
Nov. 28, 2006 |
| 7138065 |
Method for removing at least one area of a layer of a component consisting of metal or a metal compound |
Nov. 21, 2006 |
| 7128846 |
Process for producing group III nitride compound semiconductor |
Oct. 31, 2006 |
| 7122125 |
Controlled polymerization on plasma reactor wall |
Oct. 17, 2006 |
| 7096873 |
Method for manufacturing a group III nitride compound semiconductor device |
Aug. 29, 2006 |
| 6960306 |
Low Cu percentages for reducing shorts in AlCu lines |
Nov. 1, 2005 |
| 6939472 |
Etching method in fabrications of microstructures |
Sep. 6, 2005 |
| 6921493 |
Method of processing substrates |
Jul. 26, 2005 |
| 6908562 |
Method of forming electrode for saw device |
Jun. 21, 2005 |
| 6840249 |
Method for cleaning a semiconductor device |
Jan. 11, 2005 |
| 6821447 |
Friction member and a method for its surface treatment |
Nov. 23, 2004 |
| 6806035 |
Wafer serialization manufacturing process for read/write heads using photolithography and selective reactive ion etching |
Oct. 19, 2004 |
| 6773616 |
Formation of nanoscale wires |
Aug. 10, 2004 |
| 6770214 |
Method of reducing aluminum fluoride deposits in plasma etch reactor |
Aug. 3, 2004 |
| 6764606 |
Method and apparatus for plasma processing |
Jul. 20, 2004 |
| 6736984 |
Non-mechanical fabrication of carbon-containing work pieces |
May. 18, 2004 |
| 6682659 |
Method for forming corrosion inhibited conductor layer |
Jan. 27, 2004 |
| 6536449 |
Downstream surface cleaning process |
Mar. 25, 2003 |
| 6533951 |
Method of manufacturing fluid pump |
Mar. 18, 2003 |
| 6526996 |
Dry clean method instead of traditional wet clean after metal etch |
Mar. 4, 2003 |
| 6500767 |
Method of etching semiconductor metallic layer |
Dec. 31, 2002 |
| 6498109 |
System and method for plasma etching |
Dec. 24, 2002 |
| 6471883 |
Method of manufacturing a vibrating structure gyroscope |
Oct. 29, 2002 |
| 6464889 |
Surface modification of medical implants |
Oct. 15, 2002 |
| 6432317 |
Method to produce masking |
Aug. 13, 2002 |
| 6428714 |
Protective layer for continuous GMR design |
Aug. 6, 2002 |
| 6426012 |
Wet chemical etch process for patterning MRAM magnetic layers |
Jul. 30, 2002 |
| 6423240 |
Process to tune the slider trailing edge profile |
Jul. 23, 2002 |
| 6419845 |
Method of etching magnetic layer, of forming magnetic pole of thin film magnetic head and of manufacturing thin film magnetic head |
Jul. 16, 2002 |
| 6413439 |
Method of manufacturing surface acoustic wave device |
Jul. 2, 2002 |
| 6383942 |
Dry etching method |
May. 7, 2002 |
| 6368977 |
Semiconductor device manufacturing method |
Apr. 9, 2002 |
| 6335290 |
Etching method, thin film transistor matrix substrate, and its manufacture |
Jan. 1, 2002 |
| 6306313 |
Selective etching of thin films |
Oct. 23, 2001 |
| 6296777 |
Structuring process |
Oct. 2, 2001 |
| 6248252 |
Method of fabricating sub-micron metal lines |
Jun. 19, 2001 |
| 6242107 |
Methods for etching an aluminum-containing layer |
Jun. 5, 2001 |
| 6171956 |
Method for improving the thermal conductivity of metal lines in integrated circuits |
Jan. 9, 2001 |
| 6165377 |
Plasma etching method and apparatus |
Dec. 26, 2000 |
| 6156243 |
Mold and method of producing the same |
Dec. 5, 2000 |
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