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Class Information
Number: 216/73
Name: Etching a substrate: processes > Gas phase etching of substrate > Etching vapor produced by evaporation, boiling, or sublimation
Description: Process wherein the etching process includes the formation of the etchant vapor by the evaporating or boiling of a liquid, or is directly produced from a solid without the formation of a liquid phase.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7374696 |
Method and apparatus for removing a halogen-containing residue |
May. 20, 2008 |
| 7365016 |
Anhydrous HF release of process for MEMS devices |
Apr. 29, 2008 |
| 7291559 |
Etching method, gate etching method, and method of manufacturing semiconductor devices |
Nov. 6, 2007 |
| 7279431 |
Vapor phase etching MEMS devices |
Oct. 9, 2007 |
| 7189332 |
Apparatus and method for detecting an endpoint in a vapor phase etch |
Mar. 13, 2007 |
| 7153443 |
Microelectromechanical structure and a method for making the same |
Dec. 26, 2006 |
| 7052622 |
Method for measuring etch rates during a release process |
May. 30, 2006 |
| 7041224 |
Method for vapor phase etching of silicon |
May. 9, 2006 |
| 6932915 |
System and method for integrated oxide removal and processing of a semiconductor wafer |
Aug. 23, 2005 |
| RE38760 |
Controlled etching of oxides via gas phase reactions |
Jul. 19, 2005 |
| 6887337 |
Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto |
May. 3, 2005 |
| 6740247 |
HF vapor phase wafer cleaning and oxide etching |
May. 25, 2004 |
| 6620335 |
Plasma etch reactor and method |
Sep. 16, 2003 |
| 6602433 |
Gas delivery system |
Aug. 5, 2003 |
| 6558559 |
Method of manufacturing micromechanical surface structures by vapor-phase etching |
May. 6, 2003 |
| 6333268 |
Method and apparatus for removing post-etch residues and other adherent matrices |
Dec. 25, 2001 |
| 6290864 |
Fluoride gas etching of silicon with improved selectivity |
Sep. 18, 2001 |
| 6290863 |
Method and apparatus for etch of a specific subarea of a semiconductor work object |
Sep. 18, 2001 |
| 6228563 |
Method and apparatus for removing post-etch residues and other adherent matrices |
May. 8, 2001 |
| 6218022 |
Resin etching solution and process for etching polyimide resins |
Apr. 17, 2001 |
| 6095158 |
Anhydrous HF in-situ cleaning process of semiconductor processing chambers |
Aug. 1, 2000 |
| 6065481 |
Direct vapor delivery of enabling chemical for enhanced HF etch process performance |
May. 23, 2000 |
| 6024888 |
Vapor selective etching method and apparatus |
Feb. 15, 2000 |
| 5869400 |
Method for dry-etching using gaseous bismuth halide compound |
Feb. 9, 1999 |
| 5500081 |
Dynamic semiconductor wafer processing using homogeneous chemical vapors |
Mar. 19, 1996 |
| 5413671 |
Apparatus and method for removing deposits from an APCVD system |
May. 9, 1995 |
| 5395482 |
Ultra high purity vapor phase treatment |
Mar. 7, 1995 |
| 5268069 |
Safe method for etching silicon dioxide |
Dec. 7, 1993 |
| 5073232 |
Method of anhydrous hydrogen fluoride etching |
Dec. 17, 1991 |
| 4919749 |
Method for making high resolution silicon shadow masks |
Apr. 24, 1990 |
| 4855018 |
Process for etching polytetrafluoroethylene |
Aug. 8, 1989 |
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