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Class Information
Number: 216/72
Name: Etching a substrate: processes > Gas phase etching of substrate > Etching a multiple layered substrate where the etching condition used produces a different etching rate or characteristic between at least two of the layers of the substrate
Description: Process involving the etching of a multilayered substrate, using a single etching step, where the process parameters used causes a difference of the etching rate or characteristic in at least two different layers of the substrate.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8703003 Selective etching of semiconductor substrate(s) that preserves underlying dielectric layers Apr. 22, 2014
8679985 Dry etching method for silicon nitride film Mar. 25, 2014
8679358 Plasma etching method and computer-readable storage medium Mar. 25, 2014
8668837 Method for etching substrate Mar. 11, 2014
8652342 Semiconductor fabrication apparatuses to perform semiconductor etching and deposition processes and methods of forming semiconductor device using the same Feb. 18, 2014
8647981 Methods of forming patterns, and methods of forming integrated circuitry Feb. 11, 2014
8632687 Method for electron beam induced etching of layers contaminated with gallium Jan. 21, 2014
8628677 Forming curved features using a shadow mask Jan. 14, 2014
8617406 Device for the actively-controlled and localized deposition of at least one biological solution Dec. 31, 2013
8598043 Methods of forming semiconductor constructions Dec. 3, 2013
8591755 Methods for controlling plasma constituent flux and deposition during semiconductor fabrication and apparatus for implementing the same Nov. 26, 2013
8580131 Plasma etching method Nov. 12, 2013
8541313 Method for etching a sacrificial layer for a micro-machined structure Sep. 24, 2013
8512586 Gas cluster ion beam etching process for achieving target etch process metrics for multiple materials Aug. 20, 2013
8513138 Gas cluster ion beam etching process for Si-containing and Ge-containing materials Aug. 20, 2013
8513125 Manufacturing a microelectronic device comprising silicon and germanium nanowires integrated on a same substrate Aug. 20, 2013
8501630 Selective etch process for silicon nitride Aug. 6, 2013
8501626 Methods for high temperature etching a high-K material gate structure Aug. 6, 2013
8492280 Method for simultaneously forming features of different depths in a semiconductor substrate Jul. 23, 2013
8491799 Method for forming magnetic tunnel junction cell Jul. 23, 2013
8486288 Pattern forming method Jul. 16, 2013
8481427 Method for manufacturing a micromechanical component, and micromechanical component Jul. 9, 2013
8470716 Methods for forming semiconductor constructions, and methods for selectively etching silicon nitride relative to conductive material Jun. 25, 2013
8455364 Sidewall image transfer using the lithographic stack as the mandrel Jun. 4, 2013
8435419 Methods of processing substrates having metal materials May. 7, 2013
8394280 Resist pattern protection technique for double patterning application Mar. 12, 2013
8394722 Bi-layer, tri-layer mask CD control Mar. 12, 2013
8377323 Mold having nanometric features, method for realizing such a mold and corresponding use of it in a method for realizing an array of carbon nanotubes Feb. 19, 2013
8361336 Imprint method for imprinting a pattern of a mold onto a resin material of a substrate and related substrate processing method Jan. 29, 2013
8343364 Double hard-mask mill back method of fabricating a near field transducer for energy assisted magnetic recording Jan. 1, 2013
8334211 Process for improving critical dimension uniformity of integrated circuit arrays Dec. 18, 2012
8329591 Method of manufacturing a semiconductor device Dec. 11, 2012
8318030 Magnetic device definition with uniform biasing control Nov. 27, 2012
8298431 Manufacturing method of flexible display panel and manufacturing method of electro-optical apparatus Oct. 30, 2012
8293639 Method for controlling ADI-AEI CD difference ratio of openings having different sizes Oct. 23, 2012
8273666 Process to fabricate bottom electrode for MRAM device Sep. 25, 2012
8232215 Spacer linewidth control Jul. 31, 2012
8216481 Process for fabricating ultra-narrow dimension magnetic sensor Jul. 10, 2012
8211805 Method for forming via Jul. 3, 2012
8206605 Substrate processing method and substrate processing system Jun. 26, 2012
8182707 Method for etching a layer on a substrate May. 22, 2012
8178857 Method and apparatus for flattening solid surface May. 15, 2012
8138096 Plasma etching method Mar. 20, 2012
8133325 Dry cleaning method for plasma processing apparatus Mar. 13, 2012
8101092 Method for controlling ADI-AEI CD difference ratio of openings having different sizes Jan. 24, 2012
8076778 Method for preventing Al-Cu bottom damage using TiN liner Dec. 13, 2011
8048325 Method and apparatus for multilayer photoresist dry development Nov. 1, 2011
8029851 Nanowire fabrication Oct. 4, 2011
8021561 Optical component having features extending different depths into a light transmitting medium Sep. 20, 2011
8012395 Template having alignment marks formed of contrast material Sep. 6, 2011

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