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Class Information
Number: 216/71
Name: Etching a substrate: processes > Gas phase etching of substrate > Application of energy to the gaseous etchant or to the substrate being etched > Using plasma > Specific configuration of electrodes to generate the plasma
Description: Process wherein the plasma is produced using electrodes which are in a specific enumerated configuration in relation to each other.

Patents under this class:
1 2 3 4 5 6 7

Patent Number Title Of Patent Date Issued
8709270 Masking method and apparatus Apr. 29, 2014
8702902 Device for generating a plasma discharge for patterning the surface of a substrate Apr. 22, 2014
8685267 Substrate processing method Apr. 1, 2014
8652342 Semiconductor fabrication apparatuses to perform semiconductor etching and deposition processes and methods of forming semiconductor device using the same Feb. 18, 2014
8642481 Dry-etch for silicon-and-nitrogen-containing films Feb. 4, 2014
8623471 Plasma treatment system Jan. 7, 2014
8592319 Substrate processing method and substrate processing apparatus Nov. 26, 2013
8591755 Methods for controlling plasma constituent flux and deposition during semiconductor fabrication and apparatus for implementing the same Nov. 26, 2013
8591754 Plasma processing apparatus and plasma processing method Nov. 26, 2013
8591660 Method for the plasma cleaning of the surface of a material coated with an organic substance Nov. 26, 2013
8574445 Method for generating hollow cathode plasma and method for treating large area substrate using hollow cathode plasma Nov. 5, 2013
8522716 Protective coating for a plasma processing chamber part and a method of use Sep. 3, 2013
8518284 Plasma treatment apparatus and method for plasma-assisted treatment of substrates Aug. 27, 2013
8518830 Plasma etching method and storage medium Aug. 27, 2013
8501630 Selective etch process for silicon nitride Aug. 6, 2013
8486798 Variable capacitance chamber component incorporating a semiconductor junction and methods of manufacturing and using thereof Jul. 16, 2013
8480807 Method and an apparatus for cleaning and/or sterilization of an object provided in a sealed enclosure Jul. 9, 2013
8470095 Process and installation for surface preparation by dielectric barrier discharge Jun. 25, 2013
8465658 Method of forming main pole of thermally-assisted magnetic recording head Jun. 18, 2013
8460508 Synchronous pulse plasma etching equipment and method of fabricating a semiconductor device Jun. 11, 2013
8460568 Method for making nanostructured surfaces Jun. 11, 2013
8449731 Method and apparatus for increasing local plasma density in magnetically confined plasma May. 28, 2013
8444870 Inductive plasma source with high coupling efficiency May. 21, 2013
8431035 Plasma processing apparatus and method Apr. 30, 2013
8426318 Method of setting thickness of dielectric and substrate processing apparatus having dielectric disposed in electrode Apr. 23, 2013
8425791 In-chamber member temperature control method, in-chamber member, substrate mounting table and plasma processing apparatus including same Apr. 23, 2013
8420547 Plasma processing method Apr. 16, 2013
8404596 Plasma ashing method Mar. 26, 2013
8398875 Method of orienting an upper electrode relative to a lower electrode for bevel edge processing Mar. 19, 2013
8343371 Apparatus and method for improving photoresist properties using a quasi-neutral beam Jan. 1, 2013
8344482 Etching apparatus and etching method for substrate bevel Jan. 1, 2013
8329055 Plasma uniformity control using biased array Dec. 11, 2012
8319141 Cooling block forming electrode Nov. 27, 2012
8308969 Plasma system for improved process capability Nov. 13, 2012
8298381 Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering Oct. 30, 2012
8299390 Apparatus and method for controlling plasma density profile Oct. 30, 2012
8287967 Method and apparatus for processing workpiece Oct. 16, 2012
8282850 Apparatus and method for controlling relative particle concentrations in a plasma Oct. 9, 2012
8241514 Plasma etching method and computer readable storage medium Aug. 14, 2012
8231798 Plasma processing apparatus and plasma processing method Jul. 31, 2012
8231800 Plasma processing apparatus and method Jul. 31, 2012
8211324 Methods and arrangements for controlling plasma processing parameters Jul. 3, 2012
8206604 Methods and arrangements for managing plasma confinement Jun. 26, 2012
8163652 Plasma processing method and plasma processing device Apr. 24, 2012
8138096 Plasma etching method Mar. 20, 2012
8133325 Dry cleaning method for plasma processing apparatus Mar. 13, 2012
8124539 Plasma processing apparatus, focus ring, and susceptor Feb. 28, 2012
8105953 Method of manufacturing a semiconductor device Jan. 31, 2012
8075790 Film removal method and apparatus Dec. 13, 2011
8076247 Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes Dec. 13, 2011

1 2 3 4 5 6 7

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