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Class Information
Number: 216/70
Name: Etching a substrate: processes > Gas phase etching of substrate > Application of energy to the gaseous etchant or to the substrate being etched > Using plasma > Using microwave to generate the plasma > Magnetically enhancing the plasma
Description: Process where the plasma is intensified by the use of a magnetic field.










Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8709270 Masking method and apparatus Apr. 29, 2014
8580689 Plasma processing method Nov. 12, 2013
8480807 Method and an apparatus for cleaning and/or sterilization of an object provided in a sealed enclosure Jul. 9, 2013
8475672 Plasma processing device, plasma processing method and method of manufacturing element including substrate to be processed Jul. 2, 2013
8470095 Process and installation for surface preparation by dielectric barrier discharge Jun. 25, 2013
8465658 Method of forming main pole of thermally-assisted magnetic recording head Jun. 18, 2013
8444870 Inductive plasma source with high coupling efficiency May. 21, 2013
8298381 Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering Oct. 30, 2012
8282850 Apparatus and method for controlling relative particle concentrations in a plasma Oct. 9, 2012
8222156 Method and apparatus for processing a substrate using plasma Jul. 17, 2012
8138096 Plasma etching method Mar. 20, 2012
8133325 Dry cleaning method for plasma processing apparatus Mar. 13, 2012
8048328 Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor Nov. 1, 2011
8048329 Methods for implementing highly efficient plasma traps Nov. 1, 2011
8003000 Plasma processing, deposition and ALD methods Aug. 23, 2011
7989034 Method for continuous atmospheric pressure plasma treatment of workpieces Aug. 2, 2011
7975646 Device for depositing a coating on an internal surface of a container Jul. 12, 2011
7955515 Method of plasma etching transition metal oxides Jun. 7, 2011
7897516 Use of ultra-high magnetic fields in resputter and plasma etching Mar. 1, 2011
7883633 Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor Feb. 8, 2011
7569154 Plasma processing method, plasma processing apparatus and computer storage medium Aug. 4, 2009
7432209 Plasma dielectric etch process including in-situ backside polymer removal for low-dielectric constant material Oct. 7, 2008
7341922 Dry etching method, fabrication method for semiconductor device, and dry etching apparatus Mar. 11, 2008
7291559 Etching method, gate etching method, and method of manufacturing semiconductor devices Nov. 6, 2007
RE39895 Semiconductor integrated circuit arrangement fabrication method Oct. 23, 2007
7256134 Selective etching of carbon-doped low-k dielectrics Aug. 14, 2007
7232762 Method for forming an improved low power SRAM contact Jun. 19, 2007
7170027 Microwave plasma processing method Jan. 30, 2007
7048869 Plasma processing apparatus and a plasma processing method May. 23, 2006
7033514 Method and apparatus for micromachining using a magnetic field and plasma etching Apr. 25, 2006
7001698 Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrica Feb. 21, 2006
6899817 Device and method for etching a substrate using an inductively coupled plasma May. 31, 2005
6809019 Method for producing a semiconductor structure, and use of the method Oct. 26, 2004
6673722 Microwave enhanced CVD system under magnetic field Jan. 6, 2004
6652763 Method and apparatus for large-scale diamond polishing Nov. 25, 2003
6573190 Dry etching device and dry etching method Jun. 3, 2003
6561198 Method and installation for treating a metal part surface May. 13, 2003
6531069 Reactive Ion Etching chamber design for flip chip interconnections Mar. 11, 2003
6526996 Dry clean method instead of traditional wet clean after metal etch Mar. 4, 2003
6527968 Two-stage self-cleaning silicon etch process Mar. 4, 2003
6506686 Plasma processing apparatus and plasma processing method Jan. 14, 2003
6506687 Dry etching device and method of producing semiconductor devices Jan. 14, 2003
6436304 Plasma processing method Aug. 20, 2002
6402974 Method for etching polysilicon to have a smooth surface Jun. 11, 2002
6383403 Dry etching method May. 7, 2002
6375860 Controlled potential plasma source Apr. 23, 2002
6376388 Dry etching with reduced damage to MOS device Apr. 23, 2002
6350701 Etching system Feb. 26, 2002
6248252 Method of fabricating sub-micron metal lines Jun. 19, 2001
6228229 Method and apparatus for generating a plasma May. 8, 2001

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