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Class Information
Number: 216/69
Name: Etching a substrate: processes > Gas phase etching of substrate > Application of energy to the gaseous etchant or to the substrate being etched > Using plasma > Using microwave to generate the plasma
Description: Process wherein the plasma is produced by the use of microwaves.

Sub-classes under this class:

Class Number Class Name Patents
216/70 Magnetically enhancing the plasma 135

Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8652342 Semiconductor fabrication apparatuses to perform semiconductor etching and deposition processes and methods of forming semiconductor device using the same Feb. 18, 2014
8641916 Plasma etching apparatus, plasma etching method and storage medium Feb. 4, 2014
8591755 Methods for controlling plasma constituent flux and deposition during semiconductor fabrication and apparatus for implementing the same Nov. 26, 2013
8545669 Sensor array for measuring plasma characteristics in plasma processing environments Oct. 1, 2013
8501020 Method for making three-dimensional nano-structure array Aug. 6, 2013
8492285 Method for plasma texturing Jul. 23, 2013
8480807 Method and an apparatus for cleaning and/or sterilization of an object provided in a sealed enclosure Jul. 9, 2013
8470095 Process and installation for surface preparation by dielectric barrier discharge Jun. 25, 2013
8465658 Method of forming main pole of thermally-assisted magnetic recording head Jun. 18, 2013
8308897 Plasma processing apparatus and plasma processing method Nov. 13, 2012
8252193 Plasma processing apparatus of substrate and plasma processing method thereof Aug. 28, 2012
8187485 Plasma processing apparatus including etching processing apparatus and ashing processing apparatus and plasma processing method using plasma processing apparatus May. 29, 2012
8133325 Dry cleaning method for plasma processing apparatus Mar. 13, 2012
7989034 Method for continuous atmospheric pressure plasma treatment of workpieces Aug. 2, 2011
7975646 Device for depositing a coating on an internal surface of a container Jul. 12, 2011
7887711 Method for etching chemically inert metal oxides Feb. 15, 2011
7855150 Plasma system and method for anisotropically etching structures into a substrate Dec. 21, 2010
7846347 Method for removing a halogen-containing residue Dec. 7, 2010
7807579 Hydrogen ashing enhanced with water vapor and diluent gas Oct. 5, 2010
7601619 Method and apparatus for plasma processing Oct. 13, 2009
7497964 Plasma igniting method and substrate processing method Mar. 3, 2009
7485580 Method for removing organic electroluminescent residues from a substrate Feb. 3, 2009
7465406 Method of exposing a substrate to a surface microwave plasma, etching method, deposition method, surface microwave plasma generating apparatus, semiconductor substrate etching apparatus, semic Dec. 16, 2008
7452660 Method for resist strip in presence of low K dielectric material and apparatus for performing the same Nov. 18, 2008
7393460 Plasma processing method and plasma processing apparatus Jul. 1, 2008
7374696 Method and apparatus for removing a halogen-containing residue May. 20, 2008
7375947 Method of feedback control of ESC voltage using wafer voltage measurement at the bias supply output May. 20, 2008
7341922 Dry etching method, fabrication method for semiconductor device, and dry etching apparatus Mar. 11, 2008
7322368 Plasma cleaning gas and plasma cleaning method Jan. 29, 2008
RE39895 Semiconductor integrated circuit arrangement fabrication method Oct. 23, 2007
7259104 Sample surface processing method Aug. 21, 2007
7232762 Method for forming an improved low power SRAM contact Jun. 19, 2007
7159536 Device and method for generating a local by micro-structure electrode dis-charges with microwaves Jan. 9, 2007
7111629 Method for cleaning substrate surface Sep. 26, 2006
7097779 Processing system and method for chemically treating a TERA layer Aug. 29, 2006
7097782 Method of exposing a substrate to a surface microwave plasma, etching method, deposition method, surface microwave plasma generating apparatus, semiconductor substrate etching apparatus, semic Aug. 29, 2006
7088047 Inductively coupled plasma generator having low aspect ratio Aug. 8, 2006
7048869 Plasma processing apparatus and a plasma processing method May. 23, 2006
7025895 Plasma processing apparatus and method Apr. 11, 2006
7014788 Surface treatment method and equipment Mar. 21, 2006
7001698 Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrica Feb. 21, 2006
6991739 Method of photoresist removal in the presence of a dielectric layer having a low k-value Jan. 31, 2006
6981508 On-site cleaning gas generation for process chamber cleaning Jan. 3, 2006
6967170 Methods of forming silicon nitride spacers, and methods of forming dielectric sidewall spacers Nov. 22, 2005
6905626 Notch-free etching of high aspect SOI structures using alternating deposition and etching and pulsed plasma Jun. 14, 2005
6860275 Post etching treatment process for high density oxide etcher Mar. 1, 2005
6852243 Confinement device for use in dry etching of substrate surface and method of dry etching a wafer surface Feb. 8, 2005
6843258 On-site cleaning gas generation for process chamber cleaning Jan. 18, 2005
6841201 Apparatus and method for treating a workpiece using plasma generated from microwave radiation Jan. 11, 2005
6824699 Method of treating an insulting layer Nov. 30, 2004

1 2 3 4

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