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Class Information
Number: 216/68
Name: Etching a substrate: processes > Gas phase etching of substrate > Application of energy to the gaseous etchant or to the substrate being etched > Using plasma > Using coil to generate the plasma
Description: Process wherein a plasma is produced by the use of a coil, e.g., external induction coil, etc.

Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8709270 Masking method and apparatus Apr. 29, 2014
8685267 Substrate processing method Apr. 1, 2014
8652343 Method for selectively removing material from the surface of a substrate, masking material for a wafer, and wafer with masking material Feb. 18, 2014
8598040 ETCH process for 3D flash structures Dec. 3, 2013
8546266 Plasma processing method and plasma processing apparatus Oct. 1, 2013
8480914 Multiple gas plasma forming method and ICP source Jul. 9, 2013
8480807 Method and an apparatus for cleaning and/or sterilization of an object provided in a sealed enclosure Jul. 9, 2013
8470095 Process and installation for surface preparation by dielectric barrier discharge Jun. 25, 2013
8460508 Synchronous pulse plasma etching equipment and method of fabricating a semiconductor device Jun. 11, 2013
8444806 Plasma generator, plasma control method and method of producing substrate May. 21, 2013
8444870 Inductive plasma source with high coupling efficiency May. 21, 2013
8419894 Plasma generator, plasma control method and method of producing substrate Apr. 16, 2013
8419960 Plasma processing apparatus and method Apr. 16, 2013
8404598 Synchronized radio frequency pulsing for plasma etching Mar. 26, 2013
8336193 Process for making magnetic recording medium and magnetic recording-reproducing apparatus Dec. 25, 2012
8282850 Apparatus and method for controlling relative particle concentrations in a plasma Oct. 9, 2012
8202441 Process for etching a metal layer suitable for use in photomask fabrication Jun. 19, 2012
8177992 Plasma etching apparatus May. 15, 2012
8163191 Apparatus and methods for using high frequency chokes in a substrate deposition apparatus Apr. 24, 2012
8143175 Dry etching method Mar. 27, 2012
8133325 Dry cleaning method for plasma processing apparatus Mar. 13, 2012
8119532 Inductively coupled dual zone processing chamber with single planar antenna Feb. 21, 2012
8080479 Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator Dec. 20, 2011
7988874 Method of fabricating semiconductor device and synchronous pulse plasma etching equipment for the same Aug. 2, 2011
7989034 Method for continuous atmospheric pressure plasma treatment of workpieces Aug. 2, 2011
7955516 Etching of nano-imprint templates using an etch reactor Jun. 7, 2011
7955512 Medical devices having textured surfaces Jun. 7, 2011
7932181 Edge gas injection for critical dimension uniformity improvement Apr. 26, 2011
7906033 Plasma etching method and apparatus Mar. 15, 2011
7875199 Radical generating method, etching method and apparatus for use in these methods Jan. 25, 2011
7862682 Showerhead electrode assemblies for plasma processing apparatuses Jan. 4, 2011
7846347 Method for removing a halogen-containing residue Dec. 7, 2010
7810449 Plasma processing system with locally-efficient inductive plasma coupling Oct. 12, 2010
7811941 Device and method for etching a substrate using an inductively coupled plasma Oct. 12, 2010
7780866 Method of plasma confinement for enhancing magnetic control of plasma radial distribution Aug. 24, 2010
7777178 Plasma generating apparatus and method using neutral beam Aug. 17, 2010
7695633 Independent control of ion density, ion energy distribution and ion dissociation in a plasma reactor Apr. 13, 2010
7682518 Process for etching a metal layer suitable for use in photomask fabrication Mar. 23, 2010
7632419 Apparatus and method for monitoring processing of a substrate Dec. 15, 2009
7591957 Method for atmospheric pressure reactive atom plasma processing for surface modification Sep. 22, 2009
7585423 Liquid discharge head and producing method therefor Sep. 8, 2009
7578946 Plasma processing system and plasma processing method Aug. 25, 2009
7572737 Apparatus and methods for adjusting an edge ring potential substrate processing Aug. 11, 2009
7569154 Plasma processing method, plasma processing apparatus and computer storage medium Aug. 4, 2009
7547636 Pulsed ultra-high aspect ratio dielectric etch Jun. 16, 2009
7541289 Process for removing high stressed film using LF or HF bias power and capacitively coupled VHF source power with enhanced residue capture Jun. 2, 2009
7521000 Process for etching photomasks Apr. 21, 2009
7510664 Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces Mar. 31, 2009
7504041 Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator Mar. 17, 2009
7485580 Method for removing organic electroluminescent residues from a substrate Feb. 3, 2009

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