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Class Information
Number: 216/67
Name: Etching a substrate: processes > Gas phase etching of substrate > Application of energy to the gaseous etchant or to the substrate being etched > Using plasma
Description: Process wherein the energy source is a plasma.










Sub-classes under this class:

Class Number Class Name Patents
216/71 Specific configuration of electrodes to generate the plasma 327
216/68 Using coil to generate the plasma 230
216/69 Using microwave to generate the plasma 189


Patents under this class:

Patent Number Title Of Patent Date Issued
8709953 Pulsed plasma with low wafer temperature for ultra thin layer etches Apr. 29, 2014
8709952 Etching method, etching apparatus, and computer-readable recording medium Apr. 29, 2014
8709270 Masking method and apparatus Apr. 29, 2014
8703617 Method for planarizing interlayer dielectric layer Apr. 22, 2014
8703002 Plasma processing apparatus, plasma processing method and storage medium Apr. 22, 2014
8703001 Grid assemblies for use in ion beam etching systems and methods of utilizing the grid assemblies Apr. 22, 2014
8703000 Slimming method of carbon-containing thin film and oxidation apparatus Apr. 22, 2014
8691701 Strip with reduced low-K dielectric damage Apr. 8, 2014
8691698 Controlled gas mixing for smooth sidewall rapid alternating etch process Apr. 8, 2014
8691104 Nanotextured surfaces and related methods, systems, and uses Apr. 8, 2014
8691100 Concave and convex micromirrors and methods of making the same Apr. 8, 2014
8685855 Tray for CVD and method for forming film using same Apr. 1, 2014
8685268 Method of forming textured silicon substrate by maskless cryognic etching Apr. 1, 2014
8685267 Substrate processing method Apr. 1, 2014
8685266 Monocyclic high aspect ratio titanium inductively coupled plasma deep etching processes and products so produced Apr. 1, 2014
8679983 Selective suppression of dry-etch rate of materials containing both silicon and nitrogen Mar. 25, 2014
8679982 Selective suppression of dry-etch rate of materials containing both silicon and oxygen Mar. 25, 2014
8679517 Implantable materials having engineered surfaces made by vacuum deposition and method of making same Mar. 25, 2014
8679359 Low temperature metal etching and patterning Mar. 25, 2014
8679358 Plasma etching method and computer-readable storage medium Mar. 25, 2014
8679357 Nanoimprinting method and method for producing substrates utilizing the nanoimprinting method Mar. 25, 2014
8679288 Showerhead electrode assemblies for plasma processing apparatuses Mar. 25, 2014
8673787 Method to reduce charge buildup during high aspect ratio contact etch Mar. 18, 2014
8673781 Plasma etching method Mar. 18, 2014
8673406 Method and device for the plasma treatment of surfaces containing alkali and alkaline-earth metals Mar. 18, 2014
8673166 Plasma processing apparatus and plasma processing method Mar. 18, 2014
8673162 Methods for substrate surface planarization during magnetic patterning by plasma immersion ion implantation Mar. 18, 2014
8668837 Method for etching substrate Mar. 11, 2014
8668836 Plasma processing device and method of monitoring plasma discharge state in plasma processing device Mar. 11, 2014
8664124 Method for etching organic hardmasks Mar. 4, 2014
8663484 Method for manufacturing a printed circuit board and a printed circuit board obtained by the manufacturing method Mar. 4, 2014
8658050 Method to transfer lithographic patterns into inorganic substrates Feb. 25, 2014
8658048 Method of manufacturing magnetic recording medium Feb. 25, 2014
8652343 Method for selectively removing material from the surface of a substrate, masking material for a wafer, and wafer with masking material Feb. 18, 2014
8652342 Semiconductor fabrication apparatuses to perform semiconductor etching and deposition processes and methods of forming semiconductor device using the same Feb. 18, 2014
8652341 Method and apparatus for structuring components made of a material composed of silicon oxide Feb. 18, 2014
8647521 Method of forming micro pattern of semiconductor device Feb. 11, 2014
8647439 Method of epitaxial germanium tin alloy surface preparation Feb. 11, 2014
8643280 Method for controlling ion energy in radio frequency plasmas Feb. 4, 2014
8642480 Adjusting substrate temperature to improve CD uniformity Feb. 4, 2014
8642477 Method for clearing native oxide Feb. 4, 2014
8642473 Methods for contact clean Feb. 4, 2014
8641916 Plasma etching apparatus, plasma etching method and storage medium Feb. 4, 2014
8636911 Process for MEMS scanning mirror with mass remove from mirror backside Jan. 28, 2014
8635971 Tunable uniformity in a plasma processing system Jan. 28, 2014
8628676 Plasma etching method Jan. 14, 2014
8628675 Method for reduction of voltage potential spike during dechucking Jan. 14, 2014
8628673 Resin composition for pattern formation, pattern formation method and process for producing light-emitting element Jan. 14, 2014
8628672 Process for manufacturing a perpendicular magnetic recording writer pole with nonmagnetic bevel Jan. 14, 2014
8623471 Plasma treatment system Jan. 7, 2014











 
 
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