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Class Information
Number: 216/63
Name: Etching a substrate: processes > Gas phase etching of substrate > Application of energy to the gaseous etchant or to the substrate being etched
Description: Process directed to the application of energy to the gaseous etchant or to the substrate being etched, e.g., Ultrasonic substrate heating, radiation, plasma, ion beam, etc.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7615163 |
Film formation apparatus and method of using the same |
Nov. 10, 2009 |
| 7585420 |
Carbon nanotube substrates and catalyzed hot stamp for polishing and patterning the substrates |
Sep. 8, 2009 |
| 7563380 |
Electrode assembly for the removal of surface oxides by electron attachment |
Jul. 21, 2009 |
| 7559130 |
Method for fabricating quartz-based nanoresonators |
Jul. 14, 2009 |
| 7550394 |
Semiconductor device and fabrication process thereof |
Jun. 23, 2009 |
| 7514012 |
Pre-oxidization of deformable elements of microstructures |
Apr. 7, 2009 |
| 7514015 |
Method for surface cleaning |
Apr. 7, 2009 |
| 7510666 |
Time continuous ion-ion plasma |
Mar. 31, 2009 |
| 7497095 |
Method for producing quartz glass jig and quartz glass jig |
Mar. 3, 2009 |
| 7465946 |
Alternative fuels for EUV light source |
Dec. 16, 2008 |
| 7452477 |
Procedure for etching of materials at the surface with focussed electron beam induced chemical reaction at said surface |
Nov. 18, 2008 |
| 7445725 |
Surface bonding in halogenated polymeric components |
Nov. 4, 2008 |
| 7427519 |
Method of detecting end point of plasma etching process |
Sep. 23, 2008 |
| 7420189 |
Ultra precise polishing method and ultra precise polishing apparatus |
Sep. 2, 2008 |
| 7387738 |
Removal of surface oxides by electron attachment for wafer bumping applications |
Jun. 17, 2008 |
| 7361605 |
System and method for removal of photoresist and residues following contact etch with a stop layer present |
Apr. 22, 2008 |
| 7325299 |
Method of making a circuitized substrate |
Feb. 5, 2008 |
| 7322368 |
Plasma cleaning gas and plasma cleaning method |
Jan. 29, 2008 |
| 7311851 |
Apparatus and method for reactive atom plasma processing for material deposition |
Dec. 25, 2007 |
| 7306744 |
Method of manufacturing a nozzle plate |
Dec. 11, 2007 |
| 7303690 |
Microlens forming method |
Dec. 4, 2007 |
| 7301159 |
Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same |
Nov. 27, 2007 |
| 7284307 |
Method for manufacturing wiring board |
Oct. 23, 2007 |
| 7262139 |
Method suitable for batch ion etching of copper |
Aug. 28, 2007 |
| 7237315 |
Method for fabricating a resonator |
Jul. 3, 2007 |
| 7238294 |
Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface |
Jul. 3, 2007 |
| 7214325 |
Method of fabricating ohmic contact on n-type gallium nitride (GaN) of room temperature by plasma surface treatment |
May. 8, 2007 |
| 7205237 |
Apparatus and method for selected site backside unlayering of si, GaAs, Ga.sub.xAl.sub.yAs.sub.zof SOI technologies for scanning probe microscopy and atomic force probing characterization |
Apr. 17, 2007 |
| 7201852 |
Method for removing defects from silicon bodies by a selective etching process |
Apr. 10, 2007 |
| 7169440 |
Method for removing photoresist and etch residues |
Jan. 30, 2007 |
| 7166233 |
Pulsed plasma processing method and apparatus |
Jan. 23, 2007 |
| 7148151 |
Dry etching method, fabrication method for semiconductor device, and dry etching apparatus |
Dec. 12, 2006 |
| 7144521 |
High aspect ratio etch using modulation of RF powers of various frequencies |
Dec. 5, 2006 |
| 7135123 |
Method and system for integrated circuit backside navigation |
Nov. 14, 2006 |
| 7128842 |
Polyimide as a mask in vapor hydrogen fluoride etching |
Oct. 31, 2006 |
| 7122125 |
Controlled polymerization on plasma reactor wall |
Oct. 17, 2006 |
| 7096873 |
Method for manufacturing a group III nitride compound semiconductor device |
Aug. 29, 2006 |
| 7060196 |
FIB milling of copper over organic dielectrics |
Jun. 13, 2006 |
| 7026252 |
Etching aftertreatment method |
Apr. 11, 2006 |
| 7007374 |
Method of making a magnetic head |
Mar. 7, 2006 |
| 7005081 |
Base material cutting method, base material cutting apparatus, ingot cutting method, ingot cutting apparatus and wafer producing method |
Feb. 28, 2006 |
| 7001698 |
Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrica |
Feb. 21, 2006 |
| 6998221 |
Method for forming a via in a substrate |
Feb. 14, 2006 |
| 6981508 |
On-site cleaning gas generation for process chamber cleaning |
Jan. 3, 2006 |
| 6949202 |
Apparatus and method for flow of process gas in an ultra-clean environment |
Sep. 27, 2005 |
| 6944939 |
Method for forming a GMR sensor having improved longitudinal biasing |
Sep. 20, 2005 |
| 6942813 |
Method of etching magnetic and ferroelectric materials using a pulsed bias source |
Sep. 13, 2005 |
| 6942892 |
Hot element CVD apparatus and a method for removing a deposited film |
Sep. 13, 2005 |
| 6902629 |
Method for cleaning a process chamber |
Jun. 7, 2005 |
| 6902683 |
Plasma processing apparatus and plasma processing method |
Jun. 7, 2005 |
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