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Class Information
Number: 204/298.39
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Etching > Plural parallel plates (e.g., desmearing reactor, etc.)
Description: Apparatus including a plurality of spaced apart, parallel electrode plates or workpiece holders (e.g., desmearing reactor, etc.).
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6929712 |
Plasma processing apparatus capable of evaluating process performance |
Aug. 16, 2005 |
| 6406540 |
Process and apparatus for the growth of nitride materials |
Jun. 18, 2002 |
| 6231727 |
Process for stripping the surface of a substrate and apparatus for implementing this process |
May. 15, 2001 |
| 5795452 |
Dry process system |
Aug. 18, 1998 |
| 5527394 |
Apparatus for plasma enhanced processing of substrates |
Jun. 18, 1996 |
| 5292394 |
Apparatus for large-area ionic etching |
Mar. 8, 1994 |
| 5082547 |
Plasma etching reactor |
Jan. 21, 1992 |
| 5061359 |
Plasma processing apparatus including three bus structures |
Oct. 29, 1991 |
| 5039376 |
Method and apparatus for the plasma etching, substrate cleaning, or deposition of materials by D.C. glow discharge |
Aug. 13, 1991 |
| 4915807 |
Method and apparatus for processing a semiconductor wafer |
Apr. 10, 1990 |
| 4806225 |
Desmearing and plated-through-hole apparatus |
Feb. 21, 1989 |
| 4676865 |
Plasma desmear/etchback system and method of use |
Jun. 30, 1987 |
| 4623441 |
Paired electrodes for plasma chambers |
Nov. 18, 1986 |
| 4618477 |
Uniform plasma for drill smear removal reactor |
Oct. 21, 1986 |
| 4613403 |
Method for treating golf ball surface with glow discharge plasma and apparatus therefor |
Sep. 23, 1986 |
| 4610748 |
Apparatus for processing semiconductor wafers or the like |
Sep. 9, 1986 |
| 4601807 |
Reactor for plasma desmear of high aspect ratio hole |
Jul. 22, 1986 |
| 4585516 |
Variable duty cycle, multiple frequency, plasma reactor |
Apr. 29, 1986 |
| 4496420 |
Process for plasma desmear etching of printed circuit boards and apparatus used therein |
Jan. 29, 1985 |
| 4474659 |
Plated-through-hole method |
Oct. 2, 1984 |
| 4425210 |
Plasma desmearing apparatus and method |
Jan. 10, 1984 |
| 4424096 |
R-F Electrode type workholder and methods of supporting workpieces during R-F powered reactive treatment |
Jan. 3, 1984 |
| 4399014 |
Plasma reactor and method therefor |
Aug. 16, 1983 |
| 4381965 |
Multi-planar electrode plasma etching |
May. 3, 1983 |
| 4371412 |
Dry etching apparatus |
Feb. 1, 1983 |
| 4328081 |
Plasma desmearing apparatus and method |
May. 4, 1982 |
| 4292153 |
Method for processing substrate materials by means of plasma treatment |
Sep. 29, 1981 |
| 4289598 |
Plasma reactor and method therefor |
Sep. 15, 1981 |
| 4287851 |
Mounting and excitation system for reaction in the plasma state |
Sep. 8, 1981 |
| 4285800 |
Gas plasma reactor for circuit boards and the like |
Aug. 25, 1981 |
| 4282077 |
Uniform plasma etching system |
Aug. 4, 1981 |
| 4264393 |
Reactor apparatus for plasma etching or deposition |
Apr. 28, 1981 |
| 4233109 |
Dry etching method |
Nov. 11, 1980 |
| 4223048 |
Plasma enhanced chemical vapor processing of semiconductive wafers |
Sep. 16, 1980 |
| 4178877 |
Apparatus for plasma treatment of semiconductor materials |
Dec. 18, 1979 |
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