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Class Information
Number: 204/298.38
Name: Chemistry: electrical and wave energy > Apparatus > Coating, forming or etching by sputtering > Etching > Microwave excitation
Description: Apparatus including means for generating plasma by excitation from a source of microwaves.










Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8653482 RF controlled freezing Feb. 18, 2014
8349156 Microwave-assisted rotatable PVD Jan. 8, 2013
7998307 Electron beam enhanced surface wave plasma source Aug. 16, 2011
7895971 Microwave plasma processing apparatus Mar. 1, 2011
7767926 Method and system for dry development of a multi-layer mask using sidewall passivation and mask passivation Aug. 3, 2010
7728251 Plasma processing apparatus with dielectric plates and fixing member wavelength dependent spacing Jun. 1, 2010
7723637 Plasma processing apparatus May. 25, 2010
7708859 Gas distribution system having fast gas switching capabilities May. 4, 2010
7491908 Plasma processing device and ashing method Feb. 17, 2009
7485827 Plasma generator Feb. 3, 2009
7432468 Plasma processing apparatus and plasma processing method Oct. 7, 2008
7399943 Apparatus for metal plasma vapor deposition and re-sputter with source and bias power frequencies applied through the workpiece Jul. 15, 2008
7400096 Large area plasma source Jul. 15, 2008
7354504 Dielectric profile controlled microwave sterilization system Apr. 8, 2008
7311796 Plasma processing apparatus Dec. 25, 2007
7189939 Portable microwave plasma discharge unit Mar. 13, 2007
7141756 Microwave plasma processing apparatus, plasma ignition method, plasma forming method, and plasma processing method Nov. 28, 2006
7071442 Plasma processing apparatus Jul. 4, 2006
6951821 Processing system and method for chemically treating a substrate Oct. 4, 2005
6891123 Plasma ignition method and apparatus May. 10, 2005
6870123 Microwave applicator, plasma processing apparatus having same, and plasma processing method Mar. 22, 2005
6847003 Plasma processing apparatus Jan. 25, 2005
6823816 Plasma processing system Nov. 30, 2004
6818852 Microwave plasma processing device, plasma processing method, and microwave radiating member Nov. 16, 2004
6805779 Plasma generation using multi-step ionization Oct. 19, 2004
6753496 Plasma processing apparatus Jun. 22, 2004
6696662 Methods and apparatus for plasma processing Feb. 24, 2004
6657151 Plasma processing device Dec. 2, 2003
6622650 Plasma processing apparatus Sep. 23, 2003
6429399 Discharge tube for a local etching apparatus and a local etching apparatus using the discharge tube Aug. 6, 2002
6422172 Plasma processing apparatus and plasma processing method Jul. 23, 2002
6375860 Controlled potential plasma source Apr. 23, 2002
6358361 Plasma processor Mar. 19, 2002
6355902 Plasma film forming method and plasma film forming apparatus Mar. 12, 2002
6332947 Plasma processing apparatus and plasma processing method using the same Dec. 25, 2001
6290807 Apparatus and method for microwave plasma process Sep. 18, 2001
6270618 Plasma processing apparatus Aug. 7, 2001
6228210 Surface wave coupled plasma etching apparatus May. 8, 2001
6198067 Plasma processing device for circuit supports Mar. 6, 2001
6189481 Microwave plasma processing apparatus Feb. 20, 2001
6172321 Method and apparatus for plasma processing apparatus Jan. 9, 2001
6158382 Method for forming a deposited film by plasma chemical vapor deposition and apparatus for forming a deposited film by plasma chemical vapor deposition Dec. 12, 2000
6152071 High-frequency introducing means, plasma treatment apparatus, and plasma treatment method Nov. 28, 2000
6109208 Plasma generating apparatus with multiple microwave introducing means Aug. 29, 2000
6091045 Plasma processing apparatus utilizing a microwave window having a thinner inner area Jul. 18, 2000
6076484 Apparatus and method for microwave plasma process Jun. 20, 2000
6039834 Apparatus and methods for upgraded substrate processing system with microwave plasma source Mar. 21, 2000
6034346 Method and apparatus for plasma processing apparatus Mar. 7, 2000
6024826 Plasma reactor with heated source of a polymer-hardening precursor material Feb. 15, 2000
5997686 Process for setting a working rate distribution in an etching or plasma CVD apparatus Dec. 7, 1999

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